KR101671367B1 - 멀티-칩 모듈 및 이를 제조하는 방법 - Google Patents
멀티-칩 모듈 및 이를 제조하는 방법 Download PDFInfo
- Publication number
- KR101671367B1 KR101671367B1 KR1020157010779A KR20157010779A KR101671367B1 KR 101671367 B1 KR101671367 B1 KR 101671367B1 KR 1020157010779 A KR1020157010779 A KR 1020157010779A KR 20157010779 A KR20157010779 A KR 20157010779A KR 101671367 B1 KR101671367 B1 KR 101671367B1
- Authority
- KR
- South Korea
- Prior art keywords
- die
- fuse
- chip module
- node
- esd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
- H01L23/5256—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising fuses, i.e. connections having their state changed from conductive to non-conductive
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/60—Protection against electrostatic charges or discharges, e.g. Faraday shields
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
- H01L25/0657—Stacked arrangements of devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/50—Multistep manufacturing processes of assemblies consisting of devices, the devices being individual devices of subclass H10D or integrated devices of class H10
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16135—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/16145—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73257—Bump and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06513—Bump or bump-like direct electrical connections between devices, e.g. flip-chip connection, solder bumps
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06527—Special adaptation of electrical connections, e.g. rewiring, engineering changes, pressure contacts, layout
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06541—Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06555—Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
- H01L2225/06565—Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking the devices having the same size and there being no auxiliary carrier between the devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
- H01L23/3128—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/646,109 | 2012-10-05 | ||
| US13/646,109 US9184130B2 (en) | 2012-10-05 | 2012-10-05 | Electrostatic protection for stacked multi-chip integrated circuits |
| PCT/US2013/063297 WO2014055777A1 (en) | 2012-10-05 | 2013-10-03 | Electrostatic protection for stacked multi-chip integrated circuits |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20150064117A KR20150064117A (ko) | 2015-06-10 |
| KR101671367B1 true KR101671367B1 (ko) | 2016-11-01 |
Family
ID=49448293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020157010779A Active KR101671367B1 (ko) | 2012-10-05 | 2013-10-03 | 멀티-칩 모듈 및 이를 제조하는 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9184130B2 (enExample) |
| EP (1) | EP2904638B1 (enExample) |
| JP (1) | JP5972473B2 (enExample) |
| KR (1) | KR101671367B1 (enExample) |
| CN (1) | CN104737288B (enExample) |
| WO (1) | WO2014055777A1 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9184130B2 (en) * | 2012-10-05 | 2015-11-10 | Qualcomm Incorporated | Electrostatic protection for stacked multi-chip integrated circuits |
| JP5543567B2 (ja) * | 2012-10-22 | 2014-07-09 | 誠 雫石 | 半導体素子の製造方法 |
| KR102341750B1 (ko) | 2015-06-30 | 2021-12-23 | 삼성전자주식회사 | 반도체 패키지 및 이의 제조 방법 |
| KR102482023B1 (ko) * | 2016-01-28 | 2022-12-28 | 삼성전자주식회사 | 적층 메모리 칩 전기적 단락 검출 장치 및 방법 |
| US10147688B2 (en) | 2016-02-25 | 2018-12-04 | Allegro Microsystems, Llc | Integrated circuit device with overvoltage discharge protection |
| CN107622999B (zh) * | 2016-07-15 | 2020-06-02 | 中芯国际集成电路制造(上海)有限公司 | 静电放电保护电路 |
| US10145904B2 (en) * | 2016-08-24 | 2018-12-04 | Allegro Microsystems, Llc | Multi-die integrated circuit device with overvoltage protection |
| US9941224B2 (en) | 2016-08-24 | 2018-04-10 | Allegro Microsystems, Llc | Multi-die integrated circuit device with capacitive overvoltage protection |
| CN107799502B (zh) * | 2016-09-05 | 2020-03-10 | 中芯国际集成电路制造(上海)有限公司 | 保护电路和集成电路 |
| US10325906B2 (en) * | 2016-09-23 | 2019-06-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | ESD testing structure, method of using same and method of forming same |
| JP2018133503A (ja) | 2017-02-16 | 2018-08-23 | 東芝メモリ株式会社 | 半導体記憶装置 |
| US10552564B1 (en) * | 2018-06-19 | 2020-02-04 | Cadence Design Systems, Inc. | Determining worst potential failure instances using full chip ESD analysis |
| US11437708B2 (en) * | 2020-03-31 | 2022-09-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Antenna effect protection and electrostatic discharge protection for three-dimensional integrated circuit |
| DE102021101251A1 (de) * | 2020-03-31 | 2021-09-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Schutz vor antenneneffekten und schutz vor elektrostatischen entladungen für dreidimensionale integrierte schaltkreise |
| FR3109666A1 (fr) * | 2020-04-27 | 2021-10-29 | 3D Plus | Procédé de fabrication d’un module électronique compatible hautes fréquences |
| CN112349655B (zh) * | 2020-10-21 | 2021-10-19 | 长江存储科技有限责任公司 | 一种半导体器件及其安装结构、封装模具和制作方法 |
| US11973057B2 (en) | 2020-12-15 | 2024-04-30 | Analog Devices, Inc. | Through-silicon transmission lines and other structures enabled by same |
| FR3120160B1 (fr) * | 2021-02-23 | 2023-11-03 | Commissariat Energie Atomique | Procédé de protection d’un étage supérieur de composants électroniques d’un circuit intégré contre l’effet d’antenne |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6243283B1 (en) | 1999-04-30 | 2001-06-05 | International Business Machines Corporation | Impedance control using fuses |
| US6556409B1 (en) | 2000-08-31 | 2003-04-29 | Agere Systems Inc. | Integrated circuit including ESD circuits for a multi-chip module and a method therefor |
| JP2010129958A (ja) | 2008-12-01 | 2010-06-10 | Seiko Epson Corp | 半導体装置及び半導体装置の製造方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5913354A (ja) | 1982-07-13 | 1984-01-24 | Toshiba Corp | 半導体装置 |
| JPS59134863A (ja) * | 1982-12-28 | 1984-08-02 | Fujitsu Ltd | 静電破壊防止回路 |
| JPH02146762A (ja) * | 1988-11-28 | 1990-06-05 | Nec Corp | 半導体集積回路装置 |
| US5807791A (en) | 1995-02-22 | 1998-09-15 | International Business Machines Corporation | Methods for fabricating multichip semiconductor structures with consolidated circuitry and programmable ESD protection for input/output nodes |
| US6327125B1 (en) | 1999-12-22 | 2001-12-04 | Philips Electronics North America Corporation | Integrated circuit with removable ESD protection |
| JP2003324151A (ja) | 2002-04-26 | 2003-11-14 | Toshiba Microelectronics Corp | 半導体集積回路装置、実装基板装置、及び実装基板装置の配線切断方法 |
| WO2006028231A1 (en) * | 2004-09-10 | 2006-03-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| KR100948520B1 (ko) * | 2006-08-30 | 2010-03-23 | 삼성전자주식회사 | 정전기 특성을 개선한 증폭기 |
| US7772124B2 (en) * | 2008-06-17 | 2010-08-10 | International Business Machines Corporation | Method of manufacturing a through-silicon-via on-chip passive MMW bandpass filter |
| US8698139B2 (en) * | 2008-11-25 | 2014-04-15 | Qualcomm Incorporated | Die-to-die power consumption optimization |
| US9184130B2 (en) * | 2012-10-05 | 2015-11-10 | Qualcomm Incorporated | Electrostatic protection for stacked multi-chip integrated circuits |
-
2012
- 2012-10-05 US US13/646,109 patent/US9184130B2/en active Active
-
2013
- 2013-10-03 CN CN201380052136.0A patent/CN104737288B/zh active Active
- 2013-10-03 WO PCT/US2013/063297 patent/WO2014055777A1/en not_active Ceased
- 2013-10-03 EP EP13779997.9A patent/EP2904638B1/en active Active
- 2013-10-03 JP JP2015535786A patent/JP5972473B2/ja active Active
- 2013-10-03 KR KR1020157010779A patent/KR101671367B1/ko active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6243283B1 (en) | 1999-04-30 | 2001-06-05 | International Business Machines Corporation | Impedance control using fuses |
| US6556409B1 (en) | 2000-08-31 | 2003-04-29 | Agere Systems Inc. | Integrated circuit including ESD circuits for a multi-chip module and a method therefor |
| JP2010129958A (ja) | 2008-12-01 | 2010-06-10 | Seiko Epson Corp | 半導体装置及び半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015532534A (ja) | 2015-11-09 |
| WO2014055777A1 (en) | 2014-04-10 |
| US9184130B2 (en) | 2015-11-10 |
| EP2904638B1 (en) | 2020-05-27 |
| CN104737288B (zh) | 2017-09-26 |
| CN104737288A (zh) | 2015-06-24 |
| KR20150064117A (ko) | 2015-06-10 |
| EP2904638A1 (en) | 2015-08-12 |
| US20140098448A1 (en) | 2014-04-10 |
| JP5972473B2 (ja) | 2016-08-17 |
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