JP2015528753A - 基材フィルム及び加熱焼成方法 - Google Patents
基材フィルム及び加熱焼成方法 Download PDFInfo
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- JP2015528753A JP2015528753A JP2015515596A JP2015515596A JP2015528753A JP 2015528753 A JP2015528753 A JP 2015528753A JP 2015515596 A JP2015515596 A JP 2015515596A JP 2015515596 A JP2015515596 A JP 2015515596A JP 2015528753 A JP2015528753 A JP 2015528753A
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- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000728 polyester Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
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- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/006—Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles
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- B32—LAYERED PRODUCTS
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
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- B32B27/00—Layered products comprising a layer of synthetic resin
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- B32B27/10—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of paper or cardboard
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G13/00—Electrographic processes using a charge pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/036—Multilayers with layers of different types
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
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- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
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Abstract
Description
コーティング層(耐熱層)用コーティング液の調製
KAYARAD UX−5000(5官能ウレタンアクリレート、日本化薬(株)製)40部、KAYARAD DPHA(ジペンタエリスリトールペンタアクリレートとジペンタエリスリトールヘキサアクリレートの混合物、日本化薬(株)製) 60部、Irgacure184(1−ヒドロキシ−シクロヘキシル−フェニル−ケトン、チバジャパン(株)製)2部を混合して、コーティング液とした。
3’,4’−エポキシシクロヘキシルメチル3,4−エポキシシクロヘキサンカルボキシレート(ダイセル化学工業(株)製、セロキサイド2021P)10部とCPI−100P(サンアプロ(株)製光カチオン硬化剤)0.2部を混合して、コーティング液とした。
リポキシVR−77(昭和電工(株)製ビニルエステル樹脂)7部とシクロヘキシルメタクリレート2部とKAYARAD DPHA(ジペンタエリスリトールペンタアクリレートとジペンタエリスリトールヘキサアクリレートの混合物、日本化薬(株)製)1部とメチルエチルケトン20部、Irgacure184(1−ヒドロキシ−シクロヘキシル−フェニル−ケトン、チバジャパン(株)製)0.2部を混合して、コーティング液とした。
アクリペットVH 10部(三菱レイヨン(株)製ポリメチルメタクリレート)をメチルエチルケトン50部に溶解して、コーティング液とした。
<ガラス転移温度(Tg)>
熱機械測定(TMA)により測定した。エスアイアイ・ナノテクノロジー株式会社製TMA/SS6100熱機械的分析装置を使用し、温度範囲−10〜300℃、昇温速度5℃/min、荷重20.0mNの条件で9×9×3mmの試験片を用いて測定を行った。得られた膨張曲線における転移に基づく変曲点前後の直線領域で各々引いた2本の直線の外挿線の交点の温度をガラス転移温度とした。
還元剤としてエチレングルコール、グリセリン(関東化学株式会社製の試薬)の混合水溶液(質量比 エチレングリコール:グリセリン:水=70:15:15)に、バインダーとしてポリビニルピロリドン(日本触媒株式会社製)を溶解して、40質量%のバインダー溶液を調製した。この溶液1.5gと上記混合水溶液0.5gとを混合し、酸化銅粒子としてシーアイ化成株式会社製NanoTek CuO(球形、D50=270nm)6.0gとを混合し、自転・公転真空ミキサー あわとり練太郎 ARV−310(株式会社シンキー製)を用いて良く混合し、印刷用のペースト(導電膜形成用組成物)を作製した。
参考例1で調製したコーティング液を、ベースフィルムであるルミラー125U98(株)東レ製ポリエチレンテレフタレートフィルム)にコーティングし、高圧水銀UVランプにより100mj/cm2を照射し硬化後5μmの厚みの耐熱層を形成した。この耐熱層上に参考例5で得られたペーストを用いて2cm×2cm角のパターンをスクリーン印刷した。得られたサンプルのペースト印刷面側からXenone社製Sinteron3300を用いてパルス光照射を行った。照射条件は、パルス幅2000マイクロ秒、電圧3000V、照射距離20cmから単発照射した。その際のパルスエネルギーは2070Jであった。以上により形成した導電膜の厚さは25μmであった。なお、上記一連の作業は大気下で実施した。
コーティング液を参考例2で調製したものに代えた以外が実施例1と同様の操作で行った。得られた導電膜の厚さは22μmで、体積抵抗は9.6×10−5Ω・cmであった。
コーティング液を参考例3で調製したものに代え、ベースフィルムをコスモシャインA4300(東洋紡(株)製ポリエチレンテレフタレートフィルム)に代えた以外が実施例1と同様の操作で行った。得られた導電膜の厚さは23μmで、体積抵抗は4.2×10−5Ω・cmであった。
ルミラー125U98((株)東レ製ポリエチレンテレフタレートフィルム)にコーティング層を形成せず直接参考例2で得られたペーストを用いてスクリーン印刷した以外は実施例1と同様の操作を行った。
コーティング液を参考例4で調製したものに代えた以外は実施例1と同様の操作で行った。その結果印刷したパターンが一部吹き飛ぶとともに、ベースフィルム(PETフィルム)が一部溶融した。
実施例1同様に参考例1で調製したコーティング液を、ベースフィルムであるルミラー125U98((株)東レ製ポリエチレンテレフタレートフィルム)にコーティングし、高圧水銀UVランプにより100mj/cm2を照射し硬化後5μmの厚みの耐熱層を形成した。この耐熱層上にスパッタリング法によりシリコンを200nmの厚みとなるように蒸着させた。
ルミラー125U98((株)東レ製ポリエチレンテレフタレートフィルム)にコーティング層を形成せずシリコンを蒸着した以外は前記実施例4と同様の操作を行った。
Claims (16)
- ベースフィルムと、
前記ベースフィルム上に、ベースフィルムより高いガラス転移温度を有する耐熱性樹脂により形成され、光照射により加熱焼成される機能性薄膜を表面に形成するためのコーティング層と、
を備えることを特徴とする基材フィルム。 - 前記耐熱性樹脂のガラス転移温度が120℃以上の樹脂であることを特徴とする請求項1に記載の基材フィルム。
- 前記コーティング層を形成する耐熱性樹脂が3次元架橋樹脂であることを特徴とする請求項1または2に記載の基材フィルム。
- 前記コーティング層を形成する耐熱性樹脂のガラス転移温度が200℃より高いことを特徴とする請求項2に記載の基材フィルム。
- 前記コーティング層を形成する耐熱性樹脂に、動的光散乱法で測定した平均粒子径D50が500nm以下のシリカおよび/またはアルミナおよび/またはチタニアおよび/またはジルコニアを5〜80質量%含むことを特徴とする請求項1〜4のいずれかに記載の基材フィルム。
- 前記ベースフィルムが、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリカーボネート、ポリアクリレート、ポリオレフィン、ポリシクロオレフィン、ポリイミドフィルム又は紙であることを特徴とする請求項1〜5のいずれかに記載の基材フィルム。
- 前記コーティング層が0.1〜10μmであることを特徴とする請求項1〜6のいずれかに記載の基材フィルム。
- 前記ベースフィルムの厚さが、10μm〜3mmであることを特徴とする請求項1〜7のいずれかに記載の基材フィルム。
- 請求項1から請求項8のいずれか一項に記載の基材フィルム上に光照射により加熱焼成された機能性薄膜を備える基板。
- 前記機能性薄膜が、金、銀、銅、アルミニウム、ニッケル、コバルト、およびこれらの酸化物、グラファイト、グラフェン、カーボンナノチューブ、酸化亜鉛、酸化スズ、酸化インジウムスズ、ポリシランの少なくとも1種を含んでいるインク層であることを特徴とする請求項9に記載の基板。
- 前記機能性薄膜が、硅素、ホウ素がドープされた硅素、燐がドープされた硅素、ルテニウム、パラジウム、ニッケル、コバルト、酸化亜鉛または酸化錫よりなる膜であることを特徴とする請求項9に記載の基板。
- 前記機能性薄膜が、インジウム、スズ、亜鉛、硅素、ホウ素、アルミニウム、チタンまたはニオブをターゲットとし、反応性ガスを導入混合してスパッタリングを行う反応性スパッタリング法により形成された膜であることを特徴とする請求項9に記載の基板。
- 請求項1から請求項8のいずれか一項に記載の基材フィルムを準備し、
前記コーティング層の表面に機能性薄膜を形成し、
前記機能性薄膜を光照射により加熱焼成することを特徴とする加熱焼成方法。 - 前記照射する光は、200〜3000nmの波長のパルス光であることを特徴とする請求項13に記載の加熱焼成方法
- 前記機能性薄膜が、金、銀、銅、アルミニウム、ニッケル、コバルト、およびこれらの酸化物、グラファイト、グラフェン、カーボンナノチューブ、酸化亜鉛、酸化スズ、酸化インジウムスズ、ポリシランの少なくとも1種を含んでいるインク組成物を印刷して作製することを特徴とする請求項13または14に記載の加熱焼成方法。
- 前記機能性薄膜が、シリコン、ゲルマニウム、錫、鉛、砒素、アンチモン、ビスマス、ガリウム、インジウム、タリウム、亜鉛、カドミウム、セレン、テルル、それらの酸化物及び複合酸化物をターゲットとするスパッタリング法により形成されたことを特徴とする請求項13または14に記載の加熱焼成方法。
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---|---|---|---|---|
WO2017110618A1 (ja) * | 2015-12-24 | 2017-06-29 | 株式会社村田製作所 | 樹脂シート、樹脂シートの製造方法および樹脂多層基板の製造方法 |
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Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011000892A (ja) * | 2003-09-10 | 2011-01-06 | Nippon Zeon Co Ltd | 樹脂複合フィルム |
WO2012011491A1 (ja) * | 2010-07-22 | 2012-01-26 | パナソニック電工株式会社 | 導電性フィルム |
JP2012060084A (ja) * | 2010-09-13 | 2012-03-22 | Toshiba Tec Corp | 導電パターンの形成方法および印刷物 |
JP2013164941A (ja) * | 2012-02-10 | 2013-08-22 | Konica Minolta Inc | 透明電極の製造方法、透明電極及びそれを用いた有機電子素子 |
JP2013218857A (ja) * | 2012-04-09 | 2013-10-24 | Konica Minolta Inc | 透明電極、透明電極の製造方法、及び該透明電極を用いた有機電子素子 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4147639B2 (ja) | 1998-09-29 | 2008-09-10 | 宇部興産株式会社 | フレキシブル金属箔積層体 |
US7394663B2 (en) | 2003-02-18 | 2008-07-01 | Matsushita Electric Industrial Co., Ltd. | Electronic component built-in module and method of manufacturing the same |
JP2005203396A (ja) | 2004-01-13 | 2005-07-28 | Toshiba Corp | 電子部品の製造装置、電子部品の製造方法および電子部品 |
EP2913722A1 (en) | 2004-11-24 | 2015-09-02 | NovaCentrix Corp. | Electrical, plating and catalytic uses of metal nanomaterial compositions |
US8945686B2 (en) | 2007-05-24 | 2015-02-03 | Ncc | Method for reducing thin films on low temperature substrates |
JP5272730B2 (ja) | 2007-02-14 | 2013-08-28 | 東レ株式会社 | 易接着性積層熱可塑性樹脂フィルム |
US10231344B2 (en) | 2007-05-18 | 2019-03-12 | Applied Nanotech Holdings, Inc. | Metallic ink |
KR20100035651A (ko) | 2007-07-31 | 2010-04-05 | 테크노 폴리머 가부시키가이샤 | 적층체 |
US7833683B2 (en) | 2007-08-14 | 2010-11-16 | Xerox Corporation | Photosensitive member having an overcoat |
US8410712B2 (en) | 2008-07-09 | 2013-04-02 | Ncc Nano, Llc | Method and apparatus for curing thin films on low-temperature substrates at high speeds |
KR100999506B1 (ko) * | 2008-09-09 | 2010-12-09 | 삼성전기주식회사 | 인쇄회로기판 및 그 제조 방법 |
KR100999921B1 (ko) | 2008-09-26 | 2010-12-13 | 삼성전기주식회사 | 기판의 이중 표면 처리 방법 및 상기 방법에 의해 표면 처리된 기판 |
KR101600559B1 (ko) * | 2008-10-17 | 2016-03-08 | 엔씨씨 나노, 엘엘씨 | 저온 기판상에서의 박막 환원 방법 |
-
2013
- 2013-05-31 KR KR1020177004747A patent/KR20170023202A/ko active Search and Examination
- 2013-05-31 EP EP13799914.0A patent/EP2855148B1/en active Active
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- 2013-05-31 KR KR1020197017474A patent/KR102122749B1/ko active IP Right Grant
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011000892A (ja) * | 2003-09-10 | 2011-01-06 | Nippon Zeon Co Ltd | 樹脂複合フィルム |
WO2012011491A1 (ja) * | 2010-07-22 | 2012-01-26 | パナソニック電工株式会社 | 導電性フィルム |
JP2012060084A (ja) * | 2010-09-13 | 2012-03-22 | Toshiba Tec Corp | 導電パターンの形成方法および印刷物 |
JP2013164941A (ja) * | 2012-02-10 | 2013-08-22 | Konica Minolta Inc | 透明電極の製造方法、透明電極及びそれを用いた有機電子素子 |
JP2013218857A (ja) * | 2012-04-09 | 2013-10-24 | Konica Minolta Inc | 透明電極、透明電極の製造方法、及び該透明電極を用いた有機電子素子 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017110618A1 (ja) * | 2015-12-24 | 2017-06-29 | 株式会社村田製作所 | 樹脂シート、樹脂シートの製造方法および樹脂多層基板の製造方法 |
JP2017216303A (ja) * | 2016-05-30 | 2017-12-07 | 株式会社リコー | 回路部材用基材、回路部材、回路部材用基材の製造方法、及び回路部材の製造方法 |
WO2021044986A1 (ja) * | 2019-09-05 | 2021-03-11 | 株式会社Adeka | 重合性組成物、被覆構造体の製造方法、被覆構造体及び被覆材 |
CN114051501A (zh) * | 2019-09-05 | 2022-02-15 | 株式会社艾迪科 | 聚合性组合物、被覆结构体的制造方法、被覆结构体及被覆材 |
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