JP2015516690A5 - - Google Patents

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Publication number
JP2015516690A5
JP2015516690A5 JP2015512032A JP2015512032A JP2015516690A5 JP 2015516690 A5 JP2015516690 A5 JP 2015516690A5 JP 2015512032 A JP2015512032 A JP 2015512032A JP 2015512032 A JP2015512032 A JP 2015512032A JP 2015516690 A5 JP2015516690 A5 JP 2015516690A5
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Japan
Prior art keywords
charged particle
particle beam
cavity
beam generator
lithography system
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JP2015512032A
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Japanese (ja)
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JP2015516690A (ja
JP6239596B2 (ja
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Priority claimed from PCT/EP2013/059945 external-priority patent/WO2013171214A1/en
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Publication of JP2015516690A5 publication Critical patent/JP2015516690A5/ja
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JP2015512032A 2012-05-14 2013-05-14 荷電粒子リソグラフィシステムおよびビーム発生器 Active JP6239596B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261646839P 2012-05-14 2012-05-14
US61/646,839 2012-05-14
PCT/EP2013/059945 WO2013171214A1 (en) 2012-05-14 2013-05-14 Charged particle lithography system and beam generator

Publications (3)

Publication Number Publication Date
JP2015516690A JP2015516690A (ja) 2015-06-11
JP2015516690A5 true JP2015516690A5 (cg-RX-API-DMAC7.html) 2016-07-07
JP6239596B2 JP6239596B2 (ja) 2017-11-29

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JP2015512032A Active JP6239596B2 (ja) 2012-05-14 2013-05-14 荷電粒子リソグラフィシステムおよびビーム発生器
JP2015512040A Active JP6219374B2 (ja) 2012-05-14 2013-05-14 荷電粒子リソグラフィシステムおよびビーム発生器
JP2017184957A Active JP6430606B2 (ja) 2012-05-14 2017-09-26 荷電粒子ビーム発生器の高電圧シールド及び冷却

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JP2015512040A Active JP6219374B2 (ja) 2012-05-14 2013-05-14 荷電粒子リソグラフィシステムおよびビーム発生器
JP2017184957A Active JP6430606B2 (ja) 2012-05-14 2017-09-26 荷電粒子ビーム発生器の高電圧シールド及び冷却

Country Status (8)

Country Link
US (2) US9653261B2 (cg-RX-API-DMAC7.html)
EP (1) EP2852966A1 (cg-RX-API-DMAC7.html)
JP (3) JP6239596B2 (cg-RX-API-DMAC7.html)
KR (2) KR102023056B1 (cg-RX-API-DMAC7.html)
CN (3) CN107359101B (cg-RX-API-DMAC7.html)
NL (4) NL2010797C2 (cg-RX-API-DMAC7.html)
TW (2) TW201401330A (cg-RX-API-DMAC7.html)
WO (2) WO2013171229A1 (cg-RX-API-DMAC7.html)

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