JP2013507733A5 - - Google Patents
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- Publication number
- JP2013507733A5 JP2013507733A5 JP2012533101A JP2012533101A JP2013507733A5 JP 2013507733 A5 JP2013507733 A5 JP 2013507733A5 JP 2012533101 A JP2012533101 A JP 2012533101A JP 2012533101 A JP2012533101 A JP 2012533101A JP 2013507733 A5 JP2013507733 A5 JP 2013507733A5
- Authority
- JP
- Japan
- Prior art keywords
- projection lens
- metal part
- charged particle
- lithography system
- particle lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims description 45
- 238000001459 lithography Methods 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 239000012212 insulator Substances 0.000 claims description 9
- 230000005684 electric field Effects 0.000 claims description 5
- 230000015556 catabolic process Effects 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims 2
- 239000000615 nonconductor Substances 0.000 claims 1
- 239000012799 electrically-conductive coating Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US25033809P | 2009-10-09 | 2009-10-09 | |
| US61/250,338 | 2009-10-09 | ||
| PCT/NL2010/050649 WO2011043657A2 (en) | 2009-10-09 | 2010-10-05 | High voltage shielding arrangement |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013507733A JP2013507733A (ja) | 2013-03-04 |
| JP2013507733A5 true JP2013507733A5 (cg-RX-API-DMAC7.html) | 2013-11-28 |
| JP5599889B2 JP5599889B2 (ja) | 2014-10-01 |
Family
ID=43618185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012533101A Active JP5599889B2 (ja) | 2009-10-09 | 2010-10-05 | 高電圧遮蔽配置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8624478B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2486580A2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5599889B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20120093943A (cg-RX-API-DMAC7.html) |
| CN (1) | CN102687231A (cg-RX-API-DMAC7.html) |
| TW (1) | TW201135792A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2011043657A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2006868C2 (en) | 2011-05-30 | 2012-12-03 | Mapper Lithography Ip Bv | Charged particle multi-beamlet apparatus. |
| US11348756B2 (en) | 2012-05-14 | 2022-05-31 | Asml Netherlands B.V. | Aberration correction in charged particle system |
| TW201401330A (zh) * | 2012-05-14 | 2014-01-01 | Mapper Lithography Ip Bv | 帶電粒子微影系統和射束產生器 |
| US10586625B2 (en) | 2012-05-14 | 2020-03-10 | Asml Netherlands B.V. | Vacuum chamber arrangement for charged particle beam generator |
| CN107484322B (zh) * | 2017-07-10 | 2023-11-10 | 中国原子能科学研究院 | 一种高压屏蔽仓 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3416207A (en) * | 1965-10-22 | 1968-12-17 | Maida Dev Company | Method of manufacturing a capacitor |
| DE2238594A1 (de) * | 1972-08-05 | 1974-02-21 | Stettner & Co | Keramischer mehrfach-durchfuehrungskondensator |
| JPS54788A (en) | 1977-06-05 | 1979-01-06 | Kouenerugii Butsurigaku Kenkiy | Heatable vacuum terminal pin device |
| JPS5485389A (en) | 1977-12-21 | 1979-07-06 | Kouenerugii Butsurigaku Kenkiy | Insulated coaxial vacuum terminal |
| US4459430A (en) * | 1982-07-13 | 1984-07-10 | The United States Of America As Represented By The United States Department Of Energy | High voltage variable diameter insulator |
| CN86105432A (zh) * | 1985-09-27 | 1987-05-27 | 美国电话电报公司 | 带电粒子束曝光 |
| KR910004957B1 (ko) * | 1987-10-29 | 1991-07-18 | 가부시끼가이샤 도시바 | 고주파 회로장치 |
| JPH0636346B2 (ja) * | 1988-03-09 | 1994-05-11 | セイコー電子工業株式会社 | 荷電粒子線装置及びこれによる試料観察方法 |
| US4929839A (en) * | 1988-10-11 | 1990-05-29 | Microbeam Inc. | Focused ion beam column |
| JP2886277B2 (ja) | 1990-06-20 | 1999-04-26 | 富士通株式会社 | 電子ビーム露光装置 |
| FR2717981B1 (fr) * | 1994-03-24 | 1996-06-28 | Egide Sa | Procédé de fixation hermétique et électriquement isolante d'un conducteur électrique traversant une paroi métallique . |
| JPH10149948A (ja) * | 1996-11-19 | 1998-06-02 | Tdk Corp | 高電圧貫通形コンデンサ |
| US6340497B2 (en) * | 1997-07-02 | 2002-01-22 | The Regents Of The University Of California | Method for improving performance of highly stressed electrical insulating structures |
| WO2001078105A1 (de) * | 2000-04-12 | 2001-10-18 | Aixtron Ag | Reaktionskammer mit wenigstens einer hf-durchführung |
| JP2003045789A (ja) * | 2001-08-02 | 2003-02-14 | Canon Inc | 描画装置及び描画方法 |
| US7045794B1 (en) | 2004-06-18 | 2006-05-16 | Novelx, Inc. | Stacked lens structure and method of use thereof for preventing electrical breakdown |
| JP5243793B2 (ja) | 2004-07-05 | 2013-07-24 | シーイービーティー・カンパニー・リミティッド | マルチマイクロコラムにおける電子ビームの制御方法及びこの方法を利用したマルチマイクロコラム |
| US8890095B2 (en) | 2005-07-25 | 2014-11-18 | Mapper Lithography Ip B.V. | Reliability in a maskless lithography system |
| JP2007242359A (ja) * | 2006-03-07 | 2007-09-20 | Sony Corp | 電極リング、電子顕微鏡、電極リングの製造方法及び電子顕微鏡の製造方法 |
| JP2007266525A (ja) | 2006-03-30 | 2007-10-11 | Canon Inc | 荷電粒子線レンズアレイ、該荷電粒子線レンズアレイを用いた荷電粒子線露光装置 |
| NL2003619C2 (en) | 2009-10-09 | 2011-04-12 | Mapper Lithography Ip Bv | Projection lens assembly. |
-
2010
- 2010-10-05 JP JP2012533101A patent/JP5599889B2/ja active Active
- 2010-10-05 CN CN2010800551470A patent/CN102687231A/zh active Pending
- 2010-10-05 US US12/898,665 patent/US8624478B2/en active Active
- 2010-10-05 KR KR1020127011941A patent/KR20120093943A/ko not_active Withdrawn
- 2010-10-05 EP EP10763472A patent/EP2486580A2/en not_active Withdrawn
- 2010-10-05 WO PCT/NL2010/050649 patent/WO2011043657A2/en not_active Ceased
- 2010-10-08 TW TW099134286A patent/TW201135792A/zh unknown
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