DE3231036A1 - Kombinierte elektrostatische objektiv- und emissionslinse - Google Patents
Kombinierte elektrostatische objektiv- und emissionslinseInfo
- Publication number
- DE3231036A1 DE3231036A1 DE3231036A DE3231036A DE3231036A1 DE 3231036 A1 DE3231036 A1 DE 3231036A1 DE 3231036 A DE3231036 A DE 3231036A DE 3231036 A DE3231036 A DE 3231036A DE 3231036 A1 DE3231036 A1 DE 3231036A1
- Authority
- DE
- Germany
- Prior art keywords
- lens
- emission
- combined electrostatic
- combined
- electrostatic lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Tubes For Measurement (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3231036A DE3231036A1 (de) | 1982-08-20 | 1982-08-20 | Kombinierte elektrostatische objektiv- und emissionslinse |
GB08322328A GB2128396B (en) | 1982-08-20 | 1983-08-19 | Combined electrostatic objective and emission lens |
FR8313484A FR2532111B1 (fr) | 1982-08-20 | 1983-08-19 | Lentille d'emission et d'objectif electrostatique combinee |
JP58152371A JPS5958749A (ja) | 1982-08-20 | 1983-08-19 | 複合対物および放射レンズ |
US06/525,413 US4551599A (en) | 1982-08-20 | 1983-08-22 | Combined electrostatic objective and emission lens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3231036A DE3231036A1 (de) | 1982-08-20 | 1982-08-20 | Kombinierte elektrostatische objektiv- und emissionslinse |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3231036A1 true DE3231036A1 (de) | 1984-02-23 |
DE3231036C2 DE3231036C2 (de) | 1992-09-17 |
Family
ID=6171340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3231036A Granted DE3231036A1 (de) | 1982-08-20 | 1982-08-20 | Kombinierte elektrostatische objektiv- und emissionslinse |
Country Status (5)
Country | Link |
---|---|
US (1) | US4551599A (de) |
JP (1) | JPS5958749A (de) |
DE (1) | DE3231036A1 (de) |
FR (1) | FR2532111B1 (de) |
GB (1) | GB2128396B (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3477710D1 (en) * | 1984-02-18 | 1989-05-18 | Leybold Ag | Device for measuring the angular distribution of charged particles diffracted on a sample surface |
FR2575597B1 (fr) * | 1984-12-28 | 1987-03-20 | Onera (Off Nat Aerospatiale) | Appareil pour la micro-analyse ionique a tres haute resolution d'un echantillon solide |
US4889987A (en) * | 1986-06-04 | 1989-12-26 | Arch Development Corporation | Photo ion spectrometer |
US4864130A (en) * | 1986-06-04 | 1989-09-05 | Arch Development Corporation | Photo ion spectrometer |
US4855596A (en) * | 1986-06-04 | 1989-08-08 | Arch Development Corp. | Photo ion spectrometer |
DE3831940A1 (de) * | 1988-09-20 | 1990-04-05 | Siemens Ag | Elektronenstrahlerzeuger |
JPH071681B2 (ja) * | 1990-04-19 | 1995-01-11 | 株式会社日立製作所 | 荷電粒子線装置 |
US6586736B1 (en) * | 1999-09-10 | 2003-07-01 | Kla-Tencor, Corporation | Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample |
US6664546B1 (en) | 2000-02-10 | 2003-12-16 | Kla-Tencor | In-situ probe for optimizing electron beam inspection and metrology based on surface potential |
FR2806527B1 (fr) * | 2000-03-20 | 2002-10-25 | Schlumberger Technologies Inc | Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique |
GB2406704B (en) * | 2003-09-30 | 2007-02-07 | Ims Nanofabrication Gmbh | Particle-optic electrostatic lens |
US20070221862A1 (en) * | 2006-03-22 | 2007-09-27 | Wayne State University | Coupled Electrostatic Ion and Electron Traps for Electron Capture Dissociation - Tandem Mass Spectrometry |
JP4283843B2 (ja) * | 2006-11-24 | 2009-06-24 | 株式会社荏原製作所 | 幾何収差と空間電荷効果を低減した写像型電子顕微鏡 |
US10586625B2 (en) | 2012-05-14 | 2020-03-10 | Asml Netherlands B.V. | Vacuum chamber arrangement for charged particle beam generator |
CN107359101B (zh) | 2012-05-14 | 2019-07-12 | Asml荷兰有限公司 | 带电粒子射束产生器中的高电压屏蔽和冷却 |
US11348756B2 (en) | 2012-05-14 | 2022-05-31 | Asml Netherlands B.V. | Aberration correction in charged particle system |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2223367B2 (de) * | 1972-05-12 | 1978-03-30 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen | Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen |
US4277679A (en) * | 1979-01-26 | 1981-07-07 | Siemens Aktiengesellschaft | Apparatus and method for contact-free potential measurements of an electronic composition |
DE2842527C3 (de) * | 1978-09-29 | 1981-12-17 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen | Elektrostatische Emissionslinse |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5336292A (en) * | 1976-09-16 | 1978-04-04 | Hitachi Ltd | Analyzer for charged particles |
-
1982
- 1982-08-20 DE DE3231036A patent/DE3231036A1/de active Granted
-
1983
- 1983-08-19 JP JP58152371A patent/JPS5958749A/ja active Granted
- 1983-08-19 FR FR8313484A patent/FR2532111B1/fr not_active Expired
- 1983-08-19 GB GB08322328A patent/GB2128396B/en not_active Expired
- 1983-08-22 US US06/525,413 patent/US4551599A/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2223367B2 (de) * | 1972-05-12 | 1978-03-30 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen | Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen |
DE2223367C3 (de) * | 1972-05-12 | 1978-11-30 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen | Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen |
DE2842527C3 (de) * | 1978-09-29 | 1981-12-17 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen | Elektrostatische Emissionslinse |
US4277679A (en) * | 1979-01-26 | 1981-07-07 | Siemens Aktiengesellschaft | Apparatus and method for contact-free potential measurements of an electronic composition |
Non-Patent Citations (3)
Title |
---|
NL-Z: Nuclear Instruments and Methods, 187, 1981, S.143-151 * |
NL-Z: Nuclear Instruments and Methods, 191, 1981, S.183-188 * |
Z.F. Naturforschung, Bd. 10a, 1955, S. 593-602 * |
Also Published As
Publication number | Publication date |
---|---|
JPS5958749A (ja) | 1984-04-04 |
GB8322328D0 (en) | 1983-09-21 |
US4551599A (en) | 1985-11-05 |
JPH0441462B2 (de) | 1992-07-08 |
FR2532111B1 (fr) | 1986-12-26 |
DE3231036C2 (de) | 1992-09-17 |
GB2128396B (en) | 1986-04-03 |
GB2128396A (en) | 1984-04-26 |
FR2532111A1 (fr) | 1984-02-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OM8 | Search report available as to paragraph 43 lit. 1 sentence 1 patent law | ||
8110 | Request for examination paragraph 44 | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |