JP2014522545A - 印刷可能な媒体で金属粒子を含みかつエッチングをもたらし、より具体的には太陽電池の生産中にシリコンと接点を作り出す、印刷可能な媒体 - Google Patents
印刷可能な媒体で金属粒子を含みかつエッチングをもたらし、より具体的には太陽電池の生産中にシリコンと接点を作り出す、印刷可能な媒体 Download PDFInfo
- Publication number
- JP2014522545A JP2014522545A JP2014503034A JP2014503034A JP2014522545A JP 2014522545 A JP2014522545 A JP 2014522545A JP 2014503034 A JP2014503034 A JP 2014503034A JP 2014503034 A JP2014503034 A JP 2014503034A JP 2014522545 A JP2014522545 A JP 2014522545A
- Authority
- JP
- Japan
- Prior art keywords
- protective layer
- printable
- medium
- printable medium
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/033—Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/02—Etching, surface-brightening or pickling compositions containing an alkali metal hydroxide
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/014—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group IV materials
- H10H20/0145—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group IV materials comprising polycrystalline, amorphous or porous Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Conductive Materials (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Weting (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011016335A DE102011016335B4 (de) | 2011-04-07 | 2011-04-07 | Nickelhaltige und ätzende druckbare Paste sowie Verfahren zur Bildung von elektrischen Kontakten beim Herstellen einer Solarzelle |
| DE102011016335.2 | 2011-04-07 | ||
| PCT/EP2012/001608 WO2012136387A2 (de) | 2011-04-07 | 2012-04-05 | Metallpartikelhaltiges und ätzendes druckbares medium insbesondere zur kontaktbildung mit silizium beim herstellen einer solarzelle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014522545A true JP2014522545A (ja) | 2014-09-04 |
| JP2014522545A5 JP2014522545A5 (enExample) | 2016-03-17 |
Family
ID=46025597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014503034A Pending JP2014522545A (ja) | 2011-04-07 | 2012-04-05 | 印刷可能な媒体で金属粒子を含みかつエッチングをもたらし、より具体的には太陽電池の生産中にシリコンと接点を作り出す、印刷可能な媒体 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20140021472A1 (enExample) |
| JP (1) | JP2014522545A (enExample) |
| KR (1) | KR20140038954A (enExample) |
| CN (1) | CN103493146A (enExample) |
| DE (1) | DE102011016335B4 (enExample) |
| WO (1) | WO2012136387A2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014229904A (ja) * | 2013-05-20 | 2014-12-08 | エルジー エレクトロニクス インコーポレイティド | 太陽電池及びその製造方法 |
| JP2020092267A (ja) * | 2018-12-05 | 2020-06-11 | エルジー エレクトロニクス インコーポレイティド | 太陽電池とその製造方法及び太陽電池パネル |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012213077A1 (de) * | 2012-07-25 | 2014-01-30 | Robert Bosch Gmbh | Verfahren zum Kontaktieren eines Halbleitermaterials mit einer Kontaktlage |
| CN104241402A (zh) * | 2013-06-20 | 2014-12-24 | 晶科能源有限公司 | 太阳能电池减反射膜及其制备方法 |
| JP6425927B2 (ja) * | 2014-07-03 | 2018-11-21 | 国立研究開発法人産業技術総合研究所 | シリコン窒化膜用エッチング剤、エッチング方法 |
| DE102014221584B4 (de) * | 2014-10-23 | 2018-10-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Elektrochemisches Sintern von Metallpartikelschichten |
| WO2016144359A1 (en) | 2015-03-12 | 2016-09-15 | Hewlett-Packard Development Company, L.P. | Printhead structure |
| CN106373792B (zh) * | 2016-08-30 | 2021-06-08 | 南通万德科技有限公司 | 一种高分子材料和金属的复合材料及其制备工艺 |
| KR102212224B1 (ko) * | 2019-09-11 | 2021-02-04 | 울산과학기술원 | 다공성 강유전체 박막을 포함하는 광전소자 및 이의 제조방법 |
| CN119630123A (zh) * | 2024-11-22 | 2025-03-14 | 隆基绿能科技股份有限公司 | 太阳能电池片、太阳能电池片的制备方法及光伏组件 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0715022A (ja) * | 1993-06-16 | 1995-01-17 | Hokuriku Toryo Kk | 太陽電池用電極 |
| JPH08279649A (ja) * | 1995-04-05 | 1996-10-22 | Mitsubishi Electric Corp | 半導体レーザの製造方法,及び半導体レーザ |
| JP2002246378A (ja) * | 2000-12-15 | 2002-08-30 | Toshiba Corp | 半導体装置の製造方法 |
| JP2005146181A (ja) * | 2003-11-18 | 2005-06-09 | Merck Patent Gmbh | 機能性塗料 |
| JP2005217131A (ja) * | 2004-01-29 | 2005-08-11 | Kyocera Corp | 太陽電池およびこれを用いた太陽電池モジュール |
| JP2005243500A (ja) * | 2004-02-27 | 2005-09-08 | Kyocera Chemical Corp | 導電性ペースト、太陽電池及び太陽電池の製造方法 |
| JP2011503910A (ja) * | 2007-11-19 | 2011-01-27 | アプライド マテリアルズ インコーポレイテッド | パターン付きエッチング剤を用いた太陽電池コンタクト形成プロセス |
| JP2011060752A (ja) * | 2009-08-12 | 2011-03-24 | Nippon Kineki Kk | 導電性ペースト組成物 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4183136A (en) * | 1977-08-03 | 1980-01-15 | Johnson Controls, Inc. | Temperature sensing resistance device |
| US4968354A (en) * | 1987-11-09 | 1990-11-06 | Fuji Electric Co., Ltd. | Thin film solar cell array |
| DE69121449T2 (de) * | 1990-04-12 | 1997-02-27 | Matsushita Electric Ind Co Ltd | Leitende Tintenzusammensetzung und Verfahren zum Herstellen eines dickschichtigen Musters |
| WO1995005008A2 (de) * | 1993-07-29 | 1995-02-16 | Gerhard Willeke | Flaches bauelement mit einem gitternetz von durchgangslöchern |
| DE10150040A1 (de) * | 2001-10-10 | 2003-04-17 | Merck Patent Gmbh | Kombinierte Ätz- und Dotiermedien |
| EP1378948A1 (en) * | 2002-07-01 | 2004-01-07 | Interuniversitair Microelektronica Centrum Vzw | Semiconductor etching paste and the use thereof for localised etching of semiconductor substrates |
| JP4799881B2 (ja) * | 2004-12-27 | 2011-10-26 | 三井金属鉱業株式会社 | 導電性インク |
| DE102005007743A1 (de) * | 2005-01-11 | 2006-07-20 | Merck Patent Gmbh | Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten |
| CN101098833A (zh) * | 2005-01-11 | 2008-01-02 | 默克专利股份有限公司 | 用于二氧化硅和氮化硅层的蚀刻的可印刷介质 |
| DE102005033724A1 (de) * | 2005-07-15 | 2007-01-18 | Merck Patent Gmbh | Druckfähige Ätzmedien für Siliziumdioxid-und Siliziumnitridschichten |
| JP2007146117A (ja) * | 2005-11-04 | 2007-06-14 | Mitsui Mining & Smelting Co Ltd | ニッケルインク及びそのニッケルインクで形成した導体膜 |
| DE102006030822A1 (de) * | 2006-06-30 | 2008-01-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Herstellen einer metallischen Kontaktstruktur einer Solarzelle |
| US8101231B2 (en) * | 2007-12-07 | 2012-01-24 | Cabot Corporation | Processes for forming photovoltaic conductive features from multiple inks |
| US7820540B2 (en) * | 2007-12-21 | 2010-10-26 | Palo Alto Research Center Incorporated | Metallization contact structures and methods for forming multiple-layer electrode structures for silicon solar cells |
| US8506849B2 (en) * | 2008-03-05 | 2013-08-13 | Applied Nanotech Holdings, Inc. | Additives and modifiers for solvent- and water-based metallic conductive inks |
| TWI470041B (zh) * | 2008-06-09 | 2015-01-21 | Basf Se | 用於施加金屬層之分散液 |
| DE102009009840A1 (de) * | 2008-10-31 | 2010-05-27 | Bosch Solar Energy Ag | Verfahren, Vorrichtung und Drucksubstanz zur Herstellung einer metallischen Kontaktstruktur |
| JP2012508812A (ja) * | 2008-11-14 | 2012-04-12 | アプライド・ナノテック・ホールディングス・インコーポレーテッド | 太陽電池製造用インク及びペースト |
| DE102008037613A1 (de) * | 2008-11-28 | 2010-06-02 | Schott Solar Ag | Verfahren zur Herstellung eines Metallkontakts |
| CN101562217A (zh) * | 2009-05-22 | 2009-10-21 | 中国科学院电工研究所 | 一种太阳电池前电极制备方法 |
| US20120142140A1 (en) * | 2010-12-02 | 2012-06-07 | Applied Nanotech Holdings, Inc. | Nanoparticle inks for solar cells |
-
2011
- 2011-04-07 DE DE102011016335A patent/DE102011016335B4/de not_active Expired - Fee Related
-
2012
- 2012-04-05 WO PCT/EP2012/001608 patent/WO2012136387A2/de not_active Ceased
- 2012-04-05 JP JP2014503034A patent/JP2014522545A/ja active Pending
- 2012-04-05 CN CN201280017487.3A patent/CN103493146A/zh active Pending
- 2012-04-05 KR KR1020137027432A patent/KR20140038954A/ko not_active Withdrawn
- 2012-04-05 US US14/110,065 patent/US20140021472A1/en not_active Abandoned
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0715022A (ja) * | 1993-06-16 | 1995-01-17 | Hokuriku Toryo Kk | 太陽電池用電極 |
| JPH08279649A (ja) * | 1995-04-05 | 1996-10-22 | Mitsubishi Electric Corp | 半導体レーザの製造方法,及び半導体レーザ |
| JP2002246378A (ja) * | 2000-12-15 | 2002-08-30 | Toshiba Corp | 半導体装置の製造方法 |
| JP2005146181A (ja) * | 2003-11-18 | 2005-06-09 | Merck Patent Gmbh | 機能性塗料 |
| JP2005217131A (ja) * | 2004-01-29 | 2005-08-11 | Kyocera Corp | 太陽電池およびこれを用いた太陽電池モジュール |
| JP2005243500A (ja) * | 2004-02-27 | 2005-09-08 | Kyocera Chemical Corp | 導電性ペースト、太陽電池及び太陽電池の製造方法 |
| JP2011503910A (ja) * | 2007-11-19 | 2011-01-27 | アプライド マテリアルズ インコーポレイテッド | パターン付きエッチング剤を用いた太陽電池コンタクト形成プロセス |
| JP2011060752A (ja) * | 2009-08-12 | 2011-03-24 | Nippon Kineki Kk | 導電性ペースト組成物 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014229904A (ja) * | 2013-05-20 | 2014-12-08 | エルジー エレクトロニクス インコーポレイティド | 太陽電池及びその製造方法 |
| US11004988B2 (en) | 2013-05-20 | 2021-05-11 | Lg Electronics Inc. | Solar cell and method for manufacturing the same |
| JP2020092267A (ja) * | 2018-12-05 | 2020-06-11 | エルジー エレクトロニクス インコーポレイティド | 太陽電池とその製造方法及び太陽電池パネル |
| JP7455564B2 (ja) | 2018-12-05 | 2024-03-26 | シャンラオ シンユエン ユエドン テクノロジー デベロップメント シーオー.,エルティーディー | 太陽電池の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20140021472A1 (en) | 2014-01-23 |
| WO2012136387A2 (de) | 2012-10-11 |
| WO2012136387A4 (de) | 2013-02-21 |
| CN103493146A (zh) | 2014-01-01 |
| WO2012136387A3 (de) | 2012-11-29 |
| KR20140038954A (ko) | 2014-03-31 |
| DE102011016335A1 (de) | 2012-10-11 |
| DE102011016335B4 (de) | 2013-10-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2014522545A (ja) | 印刷可能な媒体で金属粒子を含みかつエッチングをもたらし、より具体的には太陽電池の生産中にシリコンと接点を作り出す、印刷可能な媒体 | |
| JP5325349B1 (ja) | 太陽電池およびその製造方法、ならびに太陽電池モジュール | |
| CN103155159B (zh) | 太阳能电池元件及其制造方法 | |
| JP5759639B2 (ja) | 太陽電池およびその製造方法、ならびに太陽電池モジュールおよびその製造方法 | |
| TWI496312B (zh) | 用於矽太陽能電池的改良式金屬化方法 | |
| JP6114630B2 (ja) | 結晶シリコン系太陽電池の製造方法 | |
| JP2009533864A (ja) | 太陽電池およびそれを製造するための方法 | |
| JP5606454B2 (ja) | シリコン太陽電池 | |
| KR20110123663A (ko) | 솔루션 기반의 프로세스에 의한 광전지 그리드 스택 방법 및 구조 | |
| JP2016500476A (ja) | 太陽電池金属被覆の無電解導電率向上の方法 | |
| TW201104907A (en) | Surface treatment of silicon | |
| CN110021681B (zh) | 太阳能电池表面的化学抛光及所得的结构 | |
| JP6139261B2 (ja) | 太陽電池およびその製造方法、ならびに太陽電池モジュール | |
| US20110186116A1 (en) | Method for producing a solar cell having a two-stage doping | |
| JP6120680B2 (ja) | 太陽電池およびその製造方法、ならびに太陽電池モジュール | |
| JP5376752B2 (ja) | 太陽電池の製造方法及び太陽電池 | |
| JP6096054B2 (ja) | 太陽電池の製造方法 | |
| JP2010093194A (ja) | 太陽電池の製造方法 | |
| JP2012094739A (ja) | 製膜方法および半導体装置の製造方法 | |
| KR20120047287A (ko) | 결정질 실리콘 솔라셀을 위한 이미터 전극의 제조 방법 및 상응하는 실리콘 솔라셀 | |
| WO2019163784A1 (ja) | 太陽電池の製造方法 | |
| KR100971747B1 (ko) | 함몰전극형 태양전지 및 그 제조방법 | |
| CN117673193A (zh) | 异质结太阳电池、电极及其制备方法 | |
| JP6178621B2 (ja) | 太陽電池およびその製造方法、ならびに太陽電池モジュール | |
| KR20070009160A (ko) | 함몰전극형 태양전지 및 그 제조방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150129 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20150930 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151027 |
|
| A524 | Written submission of copy of amendment under article 19 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20160126 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20160628 |