JP2014516094A - ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー - Google Patents

ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー Download PDF

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Publication number
JP2014516094A
JP2014516094A JP2014510346A JP2014510346A JP2014516094A JP 2014516094 A JP2014516094 A JP 2014516094A JP 2014510346 A JP2014510346 A JP 2014510346A JP 2014510346 A JP2014510346 A JP 2014510346A JP 2014516094 A JP2014516094 A JP 2014516094A
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Japan
Prior art keywords
optical film
meth
acrylate
monomer
polymerizable resin
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Pending
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JP2014510346A
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English (en)
Japanese (ja)
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JP2014516094A5 (esLanguage
Inventor
ブイ．ハント ブライアン
ジェイ．リンドストローム カイル
シー．ネルソン モーリーン
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3M Innovative Properties Co
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3M Innovative Properties Co
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Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2014516094A publication Critical patent/JP2014516094A/ja
Publication of JP2014516094A5 publication Critical patent/JP2014516094A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1812—C12-(meth)acrylate, e.g. lauryl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2244—Oxides; Hydroxides of metals of zirconium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Graft Or Block Polymers (AREA)
JP2014510346A 2011-05-13 2012-04-25 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー Pending JP2014516094A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161485853P 2011-05-13 2011-05-13
US61/485,853 2011-05-13
PCT/US2012/034872 WO2012158317A2 (en) 2011-05-13 2012-04-25 Benzyl (meth)acrylate monomers suitable for microstructured optical films

Related Child Applications (1)

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JP2017032995A Division JP6556773B2 (ja) 2011-05-13 2017-02-24 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー

Publications (2)

Publication Number Publication Date
JP2014516094A true JP2014516094A (ja) 2014-07-07
JP2014516094A5 JP2014516094A5 (esLanguage) 2015-05-14

Family

ID=47177549

Family Applications (4)

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JP2014510346A Pending JP2014516094A (ja) 2011-05-13 2012-04-25 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー
JP2017032995A Active JP6556773B2 (ja) 2011-05-13 2017-02-24 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー
JP2019128426A Active JP6944976B2 (ja) 2011-05-13 2019-07-10 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー
JP2021116789A Active JP7228628B2 (ja) 2011-05-13 2021-07-15 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー

Family Applications After (3)

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JP2017032995A Active JP6556773B2 (ja) 2011-05-13 2017-02-24 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー
JP2019128426A Active JP6944976B2 (ja) 2011-05-13 2019-07-10 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー
JP2021116789A Active JP7228628B2 (ja) 2011-05-13 2021-07-15 ミクロ構造化光学フィルムに適したベンジル（メタ）アクリレートモノマー

Country Status (8)

Country Link
US (4) US9880322B2 (esLanguage)
EP (2) EP2707424B1 (esLanguage)
JP (4) JP2014516094A (esLanguage)
KR (1) KR102040799B1 (esLanguage)
CN (2) CN106397658B (esLanguage)
SG (1) SG194729A1 (esLanguage)
TW (2) TWI644935B (esLanguage)
WO (1) WO2012158317A2 (esLanguage)

Cited By (10)

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JP2015067796A (ja) * 2013-09-30 2015-04-13 新日鉄住金化学株式会社 アクリレート化合物、アクリル樹脂組成物及びその硬化物並びに光学材料
JP2017095556A (ja) * 2015-11-19 2017-06-01 協立化学産業株式会社 光硬化性樹脂組成物及び高屈折性樹脂硬化体
JP2017105894A (ja) * 2015-12-08 2017-06-15 協立化学産業株式会社 光硬化性樹脂組成物を用いた凹凸膜付き基材の製造方法
JP2017128688A (ja) * 2016-01-22 2017-07-27 共栄社化学株式会社 活性エネルギー線硬化型樹脂組成物、その硬化物及びレンズシート
WO2017131048A1 (ja) * 2016-01-27 2017-08-03 旭硝子株式会社 硬化性組成物、硬化物、その製造方法および物品
WO2019026889A1 (ja) * 2017-08-01 2019-02-07 大阪ガスケミカル株式会社 単官能性（メタ）アクリレート及び硬化性組成物
JP2019123881A (ja) * 2019-03-18 2019-07-25 協立化学産業株式会社 光硬化性樹脂組成物及び高屈折性樹脂硬化体
JP2019532163A (ja) * 2016-08-30 2019-11-07 ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング 高屈折率を有する光安定性接着剤組成物、及びそのアセンブリ、物品、発光素子
JP2020514464A (ja) * 2016-12-29 2020-05-21 スリーエム イノベイティブ プロパティズ カンパニー 可撓性ナノ粒子光学コーティング組成物
WO2025069524A1 (ja) * 2023-09-28 2025-04-03 日東電工株式会社 光学フィルタ及び光学フィルタの製造方法、光学モジュール、並びに転写用光学フィルタ

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US9880322B2 (en) 2011-05-13 2018-01-30 3M Innovative Properties Co. Benzyl (meth)acrylate monomers suitable for microstructured optical films
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CN103553920A (zh) * 2013-09-26 2014-02-05 上海维凯化学品有限公司 苯氧基苄基丙烯酸酯的制备方法
EP3115380B1 (en) * 2013-12-12 2021-01-20 Nagase ChemteX Corporation Composite resin composition and same resin composition production method
WO2016160252A1 (en) 2015-03-30 2016-10-06 3M Innovative Properties Company Microstructured optical film comprising low refractive index layer disposed on base film substrate
US11034845B2 (en) 2016-02-04 2021-06-15 Pixelligent Technologies, Llc Nanocomposite formulations for optical applications
EP3413102B1 (en) * 2016-02-05 2022-04-06 Mitsubishi Gas Chemical Company, Inc. Light diffusing agent, light diffusing resin composition and molded body
EP3562895B1 (en) * 2016-12-29 2021-08-18 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions
WO2019046403A1 (en) 2017-08-29 2019-03-07 Avery Dennison Corporation RETROREFLECTIVE SHEET FOR A PROJECTOR-BASED DISPLAY SYSTEM
CN111902442B (zh) 2018-04-02 2023-04-04 住友电气工业株式会社 树脂组合物、光纤用二次被覆材料及光纤
KR102669759B1 (ko) 2018-04-16 2024-05-27 스미토모 덴키 고교 가부시키가이샤 광섬유
WO2020012329A2 (en) 2018-07-12 2020-01-16 3M Innovative Properties Company Composition comprising styrene isobutylene block copolymer and ethylenically unsaturated monomer
US20200339828A1 (en) * 2019-04-26 2020-10-29 Canon Kabushiki Kaisha Photocurable composition
EP3973020B1 (en) 2019-05-22 2024-01-17 3M Innovative Properties Company Composition comprising styrene isoprene block copolymer and ethylenically unsaturated monomer
KR102794145B1 (ko) * 2019-06-04 2025-04-11 주식회사 동진쎄미켐 광중합성 조성물 및 이를 이용한 경화막, 표시장치
US11766822B2 (en) 2019-08-20 2023-09-26 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
US12434427B2 (en) 2019-08-20 2025-10-07 Solventum Intellectual Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
CN110951047B (zh) * 2019-11-22 2022-06-10 张家港康得新光电材料有限公司 改性环氧丙烯酸酯树脂及其制备方法
KR102872801B1 (ko) * 2020-08-27 2025-10-20 엘지이노텍 주식회사 광 경로 제어 부재 및 이를 포함하는 디스플레이 장치
US12419177B2 (en) 2020-08-25 2025-09-16 Lg Innotek Co., Ltd. Optical path control member and display device comprising same
JP2023553925A (ja) 2020-12-11 2023-12-26 スリーエム イノベイティブ プロパティズ カンパニー 構造化表面を有するフィルムを熱成形する方法及び物品
JP7857725B2 (ja) * 2021-05-10 2026-05-13 株式会社松風 不透明化する積層造形用歯科用硬化性組成物
CN113583539B (zh) * 2021-08-11 2022-05-10 武汉工程大学 一种光学树脂组合物及其制备方法和应用
TWI815191B (zh) * 2021-09-30 2023-09-11 新應材股份有限公司 樹脂組成物以及硬化膜
CN114736628B (zh) * 2022-05-07 2024-01-26 山东国瓷功能材料股份有限公司 氧化锆树脂型分散液、uv固化胶水及其制备方法和应用

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