JP2014002835A5 - - Google Patents
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- Publication number
- JP2014002835A5 JP2014002835A5 JP2012135297A JP2012135297A JP2014002835A5 JP 2014002835 A5 JP2014002835 A5 JP 2014002835A5 JP 2012135297 A JP2012135297 A JP 2012135297A JP 2012135297 A JP2012135297 A JP 2012135297A JP 2014002835 A5 JP2014002835 A5 JP 2014002835A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- voltage
- primary electron
- electron beam
- voltage applied
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims 7
- 239000002245 particle Substances 0.000 claims 6
- 238000005259 measurement Methods 0.000 claims 2
- 230000000007 visual effect Effects 0.000 claims 2
- 230000005684 electric field Effects 0.000 claims 1
- 230000000979 retarding effect Effects 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012135297A JP5851352B2 (ja) | 2012-06-15 | 2012-06-15 | 荷電粒子線装置 |
| US14/407,117 US9324540B2 (en) | 2012-06-15 | 2013-04-12 | Charged particle beam device |
| PCT/JP2013/061010 WO2013187115A1 (ja) | 2012-06-15 | 2013-04-12 | 荷電粒子線装置 |
| KR1020147030888A KR101685274B1 (ko) | 2012-06-15 | 2013-04-12 | 하전 입자선 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012135297A JP5851352B2 (ja) | 2012-06-15 | 2012-06-15 | 荷電粒子線装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014002835A JP2014002835A (ja) | 2014-01-09 |
| JP2014002835A5 true JP2014002835A5 (enExample) | 2015-03-19 |
| JP5851352B2 JP5851352B2 (ja) | 2016-02-03 |
Family
ID=49757953
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012135297A Active JP5851352B2 (ja) | 2012-06-15 | 2012-06-15 | 荷電粒子線装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9324540B2 (enExample) |
| JP (1) | JP5851352B2 (enExample) |
| KR (1) | KR101685274B1 (enExample) |
| WO (1) | WO2013187115A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9564291B1 (en) * | 2014-01-27 | 2017-02-07 | Mochii, Inc. | Hybrid charged-particle beam and light beam microscopy |
| US9881764B2 (en) * | 2016-01-09 | 2018-01-30 | Kla-Tencor Corporation | Heat-spreading blanking system for high throughput electron beam apparatus |
| WO2018096610A1 (ja) * | 2016-11-24 | 2018-05-31 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| WO2018131102A1 (ja) * | 2017-01-12 | 2018-07-19 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
| CN106920723A (zh) * | 2017-03-06 | 2017-07-04 | 聚束科技（北京）有限公司 | 一种扫描聚焦系统及电子束控制方法 |
| WO2019038883A1 (ja) * | 2017-08-24 | 2019-02-28 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置およびそれを用いた観察方法、元素分析方法 |
| US11342155B2 (en) * | 2018-05-22 | 2022-05-24 | Hitachi High-Tech Corporation | Charged particle beam device and method for adjusting position of detector of charged particle beam device |
| WO2019224895A1 (ja) * | 2018-05-22 | 2019-11-28 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及びその軸調整方法 |
| US11355304B2 (en) | 2018-06-14 | 2022-06-07 | Hitachi High-Tech Corporation | Electronic microscope device |
| WO2020095531A1 (ja) * | 2018-11-08 | 2020-05-14 | 株式会社日立ハイテク | 荷電粒子線装置の調整方法及び荷電粒子線装置システム |
| JP7161053B2 (ja) * | 2019-07-02 | 2022-10-25 | 株式会社日立ハイテク | 荷電粒子線装置 |
| US12437965B1 (en) * | 2022-08-01 | 2025-10-07 | Mochil, Inc. | Charged-particle beam microscope with differential vacuum pressures |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04302316A (ja) | 1991-03-29 | 1992-10-26 | Omron Corp | メモリ管理装置 |
| US6667476B2 (en) | 1998-03-09 | 2003-12-23 | Hitachi, Ltd. | Scanning electron microscope |
| JP4093662B2 (ja) * | 1999-01-04 | 2008-06-04 | 株式会社日立製作所 | 走査形電子顕微鏡 |
| JP3494208B2 (ja) * | 1999-03-19 | 2004-02-09 | 株式会社日立製作所 | 走査電子顕微鏡 |
| US6998611B2 (en) | 2001-09-06 | 2006-02-14 | Ebara Corporation | Electron beam apparatus and device manufacturing method using same |
| JP2003151484A (ja) | 2001-11-15 | 2003-05-23 | Jeol Ltd | 走査型荷電粒子ビーム装置 |
| JP4469727B2 (ja) | 2002-12-27 | 2010-05-26 | 株式会社アドバンテスト | 試料観察装置、及び試料観察方法 |
| JP2006216396A (ja) * | 2005-02-04 | 2006-08-17 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
| JP4616180B2 (ja) | 2006-01-20 | 2011-01-19 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
| JP2006294627A (ja) | 2006-04-27 | 2006-10-26 | Ebara Corp | 電子線装置及び該装置を用いたデバイス製造方法 |
| JP5075431B2 (ja) * | 2007-02-28 | 2012-11-21 | 株式会社日立ハイテクノロジーズ | 帯電測定方法、焦点調整方法、及び走査電子顕微鏡 |
| US7888640B2 (en) * | 2007-06-18 | 2011-02-15 | Hitachi High-Technologies Corporation | Scanning electron microscope and method of imaging an object by using the scanning electron microscope |
| JP5227643B2 (ja) * | 2008-04-14 | 2013-07-03 | 株式会社日立ハイテクノロジーズ | 高分解能でかつ高コントラストな観察が可能な電子線応用装置 |
| WO2011007517A1 (ja) * | 2009-07-15 | 2011-01-20 | 株式会社 日立ハイテクノロジーズ | 試料電位測定方法、及び荷電粒子線装置 |
-
2012
- 2012-06-15 JP JP2012135297A patent/JP5851352B2/ja active Active
-
2013
- 2013-04-12 WO PCT/JP2013/061010 patent/WO2013187115A1/ja not_active Ceased
- 2013-04-12 KR KR1020147030888A patent/KR101685274B1/ko active Active
- 2013-04-12 US US14/407,117 patent/US9324540B2/en active Active