JP2017199606A5 - - Google Patents

Download PDF

Info

Publication number
JP2017199606A5
JP2017199606A5 JP2016090682A JP2016090682A JP2017199606A5 JP 2017199606 A5 JP2017199606 A5 JP 2017199606A5 JP 2016090682 A JP2016090682 A JP 2016090682A JP 2016090682 A JP2016090682 A JP 2016090682A JP 2017199606 A5 JP2017199606 A5 JP 2017199606A5
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
beam apparatus
detectors
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016090682A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017199606A (ja
JP6727024B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2016090682A priority Critical patent/JP6727024B2/ja
Priority claimed from JP2016090682A external-priority patent/JP6727024B2/ja
Priority to US15/487,561 priority patent/US10121632B2/en
Publication of JP2017199606A publication Critical patent/JP2017199606A/ja
Publication of JP2017199606A5 publication Critical patent/JP2017199606A5/ja
Application granted granted Critical
Publication of JP6727024B2 publication Critical patent/JP6727024B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2016090682A 2016-04-28 2016-04-28 荷電粒子線装置 Active JP6727024B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016090682A JP6727024B2 (ja) 2016-04-28 2016-04-28 荷電粒子線装置
US15/487,561 US10121632B2 (en) 2016-04-28 2017-04-14 Charged particle beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016090682A JP6727024B2 (ja) 2016-04-28 2016-04-28 荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2017199606A JP2017199606A (ja) 2017-11-02
JP2017199606A5 true JP2017199606A5 (enExample) 2019-02-07
JP6727024B2 JP6727024B2 (ja) 2020-07-22

Family

ID=60156937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016090682A Active JP6727024B2 (ja) 2016-04-28 2016-04-28 荷電粒子線装置

Country Status (2)

Country Link
US (1) US10121632B2 (enExample)
JP (1) JP6727024B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017216941A1 (ja) * 2016-06-17 2017-12-21 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
WO2019100600A1 (en) * 2017-11-21 2019-05-31 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
WO2019207707A1 (ja) * 2018-04-26 2019-10-31 株式会社日立ハイテクノロジーズ 荷電粒子線装置
CN112005277A (zh) * 2018-04-27 2020-11-27 惠普发展公司，有限责任合伙企业 三维体积成像
WO2020136710A1 (ja) * 2018-12-25 2020-07-02 株式会社日立ハイテク 荷電粒子線装置
DE112019007399T5 (de) * 2019-07-02 2022-02-24 Hitachi High-Tech Corporation Ladungsteilchenstrahleinrichtung
US20230112447A1 (en) * 2020-03-11 2023-04-13 Asml Netherlands B.V. Systems and methods for signal electron detection
JP7364540B2 (ja) * 2020-08-05 2023-10-18 株式会社日立ハイテク 画像処理システム
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
US12339241B2 (en) * 2021-05-11 2025-06-24 Nuflare Technology, Inc. Multiple secondary electron beam alignment method, multiple secondary electron beam alignment apparatus, and electron beam inspection apparatus
JP7307768B2 (ja) 2021-07-08 2023-07-12 日本電子株式会社 走査電子顕微鏡および対物レンズ
US20250087442A1 (en) * 2023-09-07 2025-03-13 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam apparatus, foil or grid lens, and method of operating an electron beam apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5644132A (en) 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
JP3723260B2 (ja) 1994-12-19 2005-12-07 アプライド マテリアルズ イスラエル リミティド 粒子ビーム・コラム
JP2001110351A (ja) 1999-10-05 2001-04-20 Hitachi Ltd 走査電子顕微鏡
JP2001124713A (ja) * 1999-10-27 2001-05-11 Hitachi Ltd 回路パターン検査装置、および回路パターン検査方法
JP5033310B2 (ja) * 2005-02-18 2012-09-26 株式会社日立ハイテクノロジーズ 検査装置
JP4913854B2 (ja) * 2008-10-08 2012-04-11 アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー 荷電粒子検出装置及び検出方法
US7947953B2 (en) * 2008-10-08 2011-05-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle detection apparatus and detection method
US8629395B2 (en) * 2010-01-20 2014-01-14 Hitachi High-Technologies Corporation Charged particle beam apparatus
JP5530980B2 (ja) 2011-06-14 2014-06-25 株式会社アドバンテスト パターン測定装置及びパターン測定方法
WO2014132757A1 (ja) * 2013-02-26 2014-09-04 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
US20160336143A1 (en) * 2015-05-15 2016-11-17 Kabushiki Kaisha Toshiba Charged particle beam apparatus and method of calibrating sample position

Similar Documents

Publication Publication Date Title
JP2017199606A5 (enExample)
JP6386679B2 (ja) 荷電粒子線装置及び走査電子顕微鏡
EP2722867A3 (en) Configurable charged-particle beam apparatus
JP2017520315A5 (enExample)
WO2004027808A3 (en) Particle-optical device and detection means
CN104122278B (zh) X射线出射装置
JP2013191571A5 (enExample)
EP2508903A3 (en) Inspection device using secondary charged particle detection
WO2012112894A3 (en) Focusing a charged particle imaging system
JP2013154225A5 (enExample)
WO2015131170A3 (en) Charged particle tomography scanner for real-time volumetric radiation dose monitoring and control
JP2012221942A5 (enExample)
JP6820352B2 (ja) 中性子発生装置のためのイオンビームフィルタ
JP2015058225A5 (enExample)
JP2016143513A (ja) 荷電粒子線装置
CN103681187A (zh) 对配备有相位板的tem中的样本进行成像
JP2013143197A5 (enExample)
JP2009252854A5 (enExample)
CN106463322A (zh) 利用双维恩过滤器单色器的电子束成像
EP2706553A3 (en) Particle beam device and method for operating a particle beam device
JP5909547B2 (ja) 走査型荷電粒子線装置
JP4732917B2 (ja) 走査型電子顕微鏡及び欠陥検出装置
JPWO2016047538A1 (ja) エネルギー弁別電子検出器及びそれを用いた走査電子顕微鏡
JP2016534537A5 (enExample)
JP2014524111A5 (enExample)