JP2012221942A5 - - Google Patents

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Publication number
JP2012221942A5
JP2012221942A5 JP2011183390A JP2011183390A JP2012221942A5 JP 2012221942 A5 JP2012221942 A5 JP 2012221942A5 JP 2011183390 A JP2011183390 A JP 2011183390A JP 2011183390 A JP2011183390 A JP 2011183390A JP 2012221942 A5 JP2012221942 A5 JP 2012221942A5
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JP
Japan
Prior art keywords
particle beam
charged particle
secondary charged
particles
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011183390A
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English (en)
Japanese (ja)
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JP5791028B2 (ja
JP2012221942A (ja
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Publication date
Priority claimed from EP11162291.6A external-priority patent/EP2511939B1/en
Application filed filed Critical
Publication of JP2012221942A publication Critical patent/JP2012221942A/ja
Publication of JP2012221942A5 publication Critical patent/JP2012221942A5/ja
Application granted granted Critical
Publication of JP5791028B2 publication Critical patent/JP5791028B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011183390A 2011-04-13 2011-08-25 試料を検査する荷電粒子ビーム装置のコントラストを向上させる装置及び方法 Expired - Fee Related JP5791028B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP11162291.6 2011-04-13
EP11162291.6A EP2511939B1 (en) 2011-04-13 2011-04-13 Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen

Publications (3)

Publication Number Publication Date
JP2012221942A JP2012221942A (ja) 2012-11-12
JP2012221942A5 true JP2012221942A5 (enExample) 2014-10-09
JP5791028B2 JP5791028B2 (ja) 2015-10-07

Family

ID=44533263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011183390A Expired - Fee Related JP5791028B2 (ja) 2011-04-13 2011-08-25 試料を検査する荷電粒子ビーム装置のコントラストを向上させる装置及び方法

Country Status (4)

Country Link
US (1) US8530837B2 (enExample)
EP (1) EP2511939B1 (enExample)
JP (1) JP5791028B2 (enExample)
TW (1) TWI488212B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2879155B1 (en) * 2013-12-02 2018-04-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-beam system for high throughput EBI
CN106165054B (zh) * 2014-04-28 2018-08-28 株式会社日立高新技术 电子线装置
JP6689602B2 (ja) 2014-12-22 2020-04-28 カール ツァイス マイクロスコーピー エルエルシー 荷電粒子ビームシステム及び方法
EP3253799B1 (en) * 2015-02-05 2020-12-02 Molecular Templates, Inc. Multivalent cd20-binding molecules comprising shiga toxin a subunit effector regions and enriched compositions thereof
JP2017135218A (ja) * 2016-01-26 2017-08-03 株式会社アドバンテスト 荷電粒子ビームレンズ装置、荷電粒子ビームカラム、および荷電粒子ビーム露光装置
JP6967340B2 (ja) * 2016-09-13 2021-11-17 株式会社日立ハイテクサイエンス 複合ビーム装置
CN107240540A (zh) * 2017-06-22 2017-10-10 聚束科技（北京）有限公司 一种观察非导电或导电不均匀样品的方法和sem
CZ309855B6 (cs) 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem
DE102019203579A1 (de) * 2019-03-15 2020-09-17 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Teilchenstrahlgeräts sowie Teilchenstrahlgerät zur Durchführung des Verfahrens
JP7199290B2 (ja) 2019-04-08 2023-01-05 株式会社日立ハイテク パターン断面形状推定システム、およびプログラム
DE102019004124B4 (de) 2019-06-13 2024-03-21 Carl Zeiss Multisem Gmbh Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System
CN115428116A (zh) 2020-04-10 2022-12-02 Asml荷兰有限公司 具有多个检测器的带电粒子束装置和成像方法
CN113035675A (zh) * 2021-02-26 2021-06-25 中国科学院生物物理研究所 带电粒子束设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189855A (ja) * 1984-03-12 1985-09-27 Hitachi Ltd ２次電子検出器
US5644132A (en) 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
DE19980548D2 (de) 1998-04-01 2001-07-12 Juergen Wolfrum Verfahren und Vorrichtung zur Quantifizierung von DNA und RNA
DE19828476A1 (de) 1998-06-26 1999-12-30 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät
US7135676B2 (en) * 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
US7138629B2 (en) * 2003-04-22 2006-11-21 Ebara Corporation Testing apparatus using charged particles and device manufacturing method using the testing apparatus
EP1703537B9 (en) 2005-03-17 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Analysing system and charged particle beam device
EP2219204B1 (en) * 2009-02-12 2012-03-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen

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