JP2014082211A5 - - Google Patents

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Publication number
JP2014082211A5
JP2014082211A5 JP2013214365A JP2013214365A JP2014082211A5 JP 2014082211 A5 JP2014082211 A5 JP 2014082211A5 JP 2013214365 A JP2013214365 A JP 2013214365A JP 2013214365 A JP2013214365 A JP 2013214365A JP 2014082211 A5 JP2014082211 A5 JP 2014082211A5
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JP
Japan
Prior art keywords
charged particle
particle beam
astigmatism
assembly
compensating
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JP2013214365A
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English (en)
Japanese (ja)
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JP5738378B2 (ja
JP2014082211A (ja
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Priority claimed from EP12188686.5A external-priority patent/EP2722868B2/en
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Publication of JP2014082211A5 publication Critical patent/JP2014082211A5/ja
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Publication of JP5738378B2 publication Critical patent/JP5738378B2/ja
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JP2013214365A 2012-10-16 2013-10-15 オクタポール装置及びスポットサイズ向上方法 Active JP5738378B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP12188686.5 2012-10-16
EP12188686.5A EP2722868B2 (en) 2012-10-16 2012-10-16 Octopole device and method for spot size improvement

Publications (3)

Publication Number Publication Date
JP2014082211A JP2014082211A (ja) 2014-05-08
JP2014082211A5 true JP2014082211A5 (enExample) 2015-01-08
JP5738378B2 JP5738378B2 (ja) 2015-06-24

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JP2013214365A Active JP5738378B2 (ja) 2012-10-16 2013-10-15 オクタポール装置及びスポットサイズ向上方法

Country Status (4)

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US (1) US8816270B2 (enExample)
EP (1) EP2722868B2 (enExample)
JP (1) JP5738378B2 (enExample)
TW (1) TWI503858B (enExample)

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Publication number Priority date Publication date Assignee Title
JP2556869Y2 (ja) 1991-12-09 1997-12-08 三井精機工業株式会社 自動工具交換用複動シリンダー
US20130058446A1 (en) * 2011-06-10 2013-03-07 Xian-Jun Zheng Continuous fusion due to energy concentration through focusing of converging fuel particle beams
JP2014232082A (ja) * 2013-05-30 2014-12-11 株式会社東芝 パターン検査方法及びパターン検査装置
US9691588B2 (en) 2015-03-10 2017-06-27 Hermes Microvision, Inc. Apparatus of plural charged-particle beams
KR20190091577A (ko) * 2015-07-22 2019-08-06 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
US10276346B1 (en) * 2016-03-09 2019-04-30 Kla-Tencor Corporation Particle beam inspector with independently-controllable beams
CN108292583B (zh) * 2016-04-13 2020-03-20 Asml 荷兰有限公司 多个带电粒子束的装置
EP3563400A1 (en) * 2016-12-30 2019-11-06 ASML Netherlands B.V. An apparatus using multiple charged particle beams
US10283315B2 (en) * 2017-05-16 2019-05-07 International Business Machines Corporation Measuring spherical and chromatic aberrations in cathode lens electrode microscopes
KR20240097977A (ko) * 2017-09-29 2024-06-27 에이에스엠엘 네델란즈 비.브이. 하전 입자 빔 검사를 위한 샘플 사전-충전 방법들 및 장치들
JP7057220B2 (ja) * 2018-05-24 2022-04-19 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム光学系の位置決め方法
US10748739B2 (en) 2018-10-12 2020-08-18 Kla-Tencor Corporation Deflection array apparatus for multi-electron beam system
CN109585244B (zh) * 2018-10-23 2021-09-14 中国科学院电工研究所 高功率密度的电子束聚焦装置
CN119324145B (zh) * 2024-11-01 2025-11-18 北京航星机器制造有限公司 一种焦点可控的x射线管的制备方法

Family Cites Families (11)

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Publication number Priority date Publication date Assignee Title
NL9100294A (nl) * 1991-02-20 1992-09-16 Philips Nv Geladen deeltjesbundelinrichting.
JP3254906B2 (ja) * 1994-06-27 2002-02-12 富士通株式会社 荷電粒子ビーム露光装置及び露光方法
DE19739290A1 (de) * 1997-09-08 1999-03-11 Ceos Gmbh Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen
DE10159454B4 (de) 2001-12-04 2012-08-02 Carl Zeiss Nts Gmbh Korrektor zur Korrektion von Farbfehlern erster Ordnung, ersten Grades
JP4242101B2 (ja) 2002-02-08 2009-03-18 日本電子株式会社 ウィーンフィルタ
JP4074185B2 (ja) * 2002-12-17 2008-04-09 日本電子株式会社 エネルギーフィルタ及び電子顕微鏡
EP1432007B1 (en) 2002-12-17 2010-03-10 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-axis compound lens, beam system making use of the compound lens, and method of manufacturing the compound lens
NL1024192C2 (nl) * 2003-08-29 2005-03-01 Fei Co Werkwijze voor het focusseren in een deeltjes-optisch toestel met behulp van astigmatisme in de deeltjesbundel.
US8013315B2 (en) * 2006-09-12 2011-09-06 Ebara Corporation Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same
DE102007058443B4 (de) * 2007-12-05 2010-05-06 Ceos Corrected Electron Optical Systems Gmbh Korrektor für axialen und außeraxialen Strahlengang und TEM damit
CN103843105A (zh) * 2010-02-10 2014-06-04 摩奇有限公司(d/b/aVoxa) 暗视野像差矫正电子显微镜

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