JP5738378B2 - オクタポール装置及びスポットサイズ向上方法 - Google Patents

オクタポール装置及びスポットサイズ向上方法 Download PDF

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JP5738378B2
JP5738378B2 JP2013214365A JP2013214365A JP5738378B2 JP 5738378 B2 JP5738378 B2 JP 5738378B2 JP 2013214365 A JP2013214365 A JP 2013214365A JP 2013214365 A JP2013214365 A JP 2013214365A JP 5738378 B2 JP5738378 B2 JP 5738378B2
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Prior art keywords
charged particle
particle beam
compensation
assembly
astigmatism
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Japanese (ja)
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JP2014082211A (ja
JP2014082211A5 (enExample
Inventor
クレイマー アレクサンドラ
クレイマー アレクサンドラ
ラニオ シュテファン
ラニオ シュテファン
Original Assignee
アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
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Application filed by アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー, アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー filed Critical アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2013214365A 2012-10-16 2013-10-15 オクタポール装置及びスポットサイズ向上方法 Active JP5738378B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP12188686.5A EP2722868B2 (en) 2012-10-16 2012-10-16 Octopole device and method for spot size improvement
EP12188686.5 2012-10-16

Publications (3)

Publication Number Publication Date
JP2014082211A JP2014082211A (ja) 2014-05-08
JP2014082211A5 JP2014082211A5 (enExample) 2015-01-08
JP5738378B2 true JP5738378B2 (ja) 2015-06-24

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ID=47358341

Family Applications (1)

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JP2013214365A Active JP5738378B2 (ja) 2012-10-16 2013-10-15 オクタポール装置及びスポットサイズ向上方法

Country Status (4)

Country Link
US (1) US8816270B2 (enExample)
EP (1) EP2722868B2 (enExample)
JP (1) JP5738378B2 (enExample)
TW (1) TWI503858B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2556869Y2 (ja) 1991-12-09 1997-12-08 三井精機工業株式会社 自動工具交換用複動シリンダー

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US20130058446A1 (en) * 2011-06-10 2013-03-07 Xian-Jun Zheng Continuous fusion due to energy concentration through focusing of converging fuel particle beams
JP2014232082A (ja) * 2013-05-30 2014-12-11 株式会社東芝 パターン検査方法及びパターン検査装置
US9691588B2 (en) 2015-03-10 2017-06-27 Hermes Microvision, Inc. Apparatus of plural charged-particle beams
KR20240042242A (ko) 2015-07-22 2024-04-01 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
US10276346B1 (en) * 2016-03-09 2019-04-30 Kla-Tencor Corporation Particle beam inspector with independently-controllable beams
EP3268979A4 (en) * 2016-04-13 2019-05-08 Hermes Microvision Inc. DEVICE WITH MULTIPLE LOADED PARTICLE RAYS
KR20250127344A (ko) * 2016-12-30 2025-08-26 에이에스엠엘 네델란즈 비.브이. 다수의 하전 입자 빔을 사용하는 장치
US10283315B2 (en) * 2017-05-16 2019-05-07 International Business Machines Corporation Measuring spherical and chromatic aberrations in cathode lens electrode microscopes
KR20240097977A (ko) 2017-09-29 2024-06-27 에이에스엠엘 네델란즈 비.브이. 하전 입자 빔 검사를 위한 샘플 사전-충전 방법들 및 장치들
JP7057220B2 (ja) * 2018-05-24 2022-04-19 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム光学系の位置決め方法
US10748739B2 (en) * 2018-10-12 2020-08-18 Kla-Tencor Corporation Deflection array apparatus for multi-electron beam system
CN109585244B (zh) * 2018-10-23 2021-09-14 中国科学院电工研究所 高功率密度的电子束聚焦装置
CN119324145B (zh) * 2024-11-01 2025-11-18 北京航星机器制造有限公司 一种焦点可控的x射线管的制备方法

Family Cites Families (11)

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Publication number Priority date Publication date Assignee Title
NL9100294A (nl) * 1991-02-20 1992-09-16 Philips Nv Geladen deeltjesbundelinrichting.
JP3254906B2 (ja) * 1994-06-27 2002-02-12 富士通株式会社 荷電粒子ビーム露光装置及び露光方法
DE19739290A1 (de) * 1997-09-08 1999-03-11 Ceos Gmbh Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen
DE10159454B4 (de) * 2001-12-04 2012-08-02 Carl Zeiss Nts Gmbh Korrektor zur Korrektion von Farbfehlern erster Ordnung, ersten Grades
JP4242101B2 (ja) * 2002-02-08 2009-03-18 日本電子株式会社 ウィーンフィルタ
DE60235636D1 (de) 2002-12-17 2010-04-22 Integrated Circuit Testing it dieser Linse, und Herstellungsverfahren für diese Linse
JP4074185B2 (ja) * 2002-12-17 2008-04-09 日本電子株式会社 エネルギーフィルタ及び電子顕微鏡
NL1024192C2 (nl) * 2003-08-29 2005-03-01 Fei Co Werkwijze voor het focusseren in een deeltjes-optisch toestel met behulp van astigmatisme in de deeltjesbundel.
US8013315B2 (en) * 2006-09-12 2011-09-06 Ebara Corporation Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same
DE102007058443B4 (de) * 2007-12-05 2010-05-06 Ceos Corrected Electron Optical Systems Gmbh Korrektor für axialen und außeraxialen Strahlengang und TEM damit
TW201137923A (en) * 2010-02-10 2011-11-01 Halcyon Molecular Inc Aberration-correcting dark-field electron microscopy

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2556869Y2 (ja) 1991-12-09 1997-12-08 三井精機工業株式会社 自動工具交換用複動シリンダー

Also Published As

Publication number Publication date
EP2722868B2 (en) 2025-03-26
EP2722868A1 (en) 2014-04-23
US20140103201A1 (en) 2014-04-17
JP2014082211A (ja) 2014-05-08
TWI503858B (zh) 2015-10-11
TW201417134A (zh) 2014-05-01
EP2722868B1 (en) 2018-02-21
US8816270B2 (en) 2014-08-26

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