TWI503858B - 用於改善光點大小的八極裝置及方法 - Google Patents

用於改善光點大小的八極裝置及方法 Download PDF

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Publication number
TWI503858B
TWI503858B TW102134138A TW102134138A TWI503858B TW I503858 B TWI503858 B TW I503858B TW 102134138 A TW102134138 A TW 102134138A TW 102134138 A TW102134138 A TW 102134138A TW I503858 B TWI503858 B TW I503858B
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TW
Taiwan
Prior art keywords
charged particle
particle beam
lens
pole
compensating
Prior art date
Application number
TW102134138A
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English (en)
Chinese (zh)
Other versions
TW201417134A (zh
Inventor
Aleksandra Kramer
Stefan Lanio
Original Assignee
Integrated Circuit Testing
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Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=47358341&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI503858(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Integrated Circuit Testing filed Critical Integrated Circuit Testing
Publication of TW201417134A publication Critical patent/TW201417134A/zh
Application granted granted Critical
Publication of TWI503858B publication Critical patent/TWI503858B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
TW102134138A 2012-10-16 2013-09-23 用於改善光點大小的八極裝置及方法 TWI503858B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP12188686.5A EP2722868B2 (en) 2012-10-16 2012-10-16 Octopole device and method for spot size improvement

Publications (2)

Publication Number Publication Date
TW201417134A TW201417134A (zh) 2014-05-01
TWI503858B true TWI503858B (zh) 2015-10-11

Family

ID=47358341

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102134138A TWI503858B (zh) 2012-10-16 2013-09-23 用於改善光點大小的八極裝置及方法

Country Status (4)

Country Link
US (1) US8816270B2 (enExample)
EP (1) EP2722868B2 (enExample)
JP (1) JP5738378B2 (enExample)
TW (1) TWI503858B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI745687B (zh) * 2018-05-24 2021-11-11 日商紐富來科技股份有限公司 多電子束影像取得裝置以及多電子束光學系統的定位方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2556869Y2 (ja) 1991-12-09 1997-12-08 三井精機工業株式会社 自動工具交換用複動シリンダー
US20130058446A1 (en) * 2011-06-10 2013-03-07 Xian-Jun Zheng Continuous fusion due to energy concentration through focusing of converging fuel particle beams
JP2014232082A (ja) * 2013-05-30 2014-12-11 株式会社東芝 パターン検査方法及びパターン検査装置
WO2016145458A1 (en) * 2015-03-10 2016-09-15 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US9691588B2 (en) 2015-03-10 2017-06-27 Hermes Microvision, Inc. Apparatus of plural charged-particle beams
KR102007497B1 (ko) 2015-07-22 2019-08-05 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
US10276346B1 (en) * 2016-03-09 2019-04-30 Kla-Tencor Corporation Particle beam inspector with independently-controllable beams
EP4250334A3 (en) * 2016-12-30 2023-12-06 ASML Netherlands B.V. An apparatus using multiple charged particle beams
US10283315B2 (en) * 2017-05-16 2019-05-07 International Business Machines Corporation Measuring spherical and chromatic aberrations in cathode lens electrode microscopes
KR20200044097A (ko) * 2017-09-29 2020-04-28 에이에스엠엘 네델란즈 비.브이. 하전 입자 빔 검사를 위한 샘플 사전-충전 방법들 및 장치들
US10748739B2 (en) 2018-10-12 2020-08-18 Kla-Tencor Corporation Deflection array apparatus for multi-electron beam system
CN109585244B (zh) * 2018-10-23 2021-09-14 中国科学院电工研究所 高功率密度的电子束聚焦装置
CN119324145B (zh) * 2024-11-01 2025-11-18 北京航星机器制造有限公司 一种焦点可控的x射线管的制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0500179A1 (en) * 1991-02-20 1992-08-26 Koninklijke Philips Electronics N.V. Charged particle beam device
US6784437B2 (en) * 2001-12-04 2004-08-31 Leo Elektronenmikroskopie Gmbh Corrector for correcting first-order chromatic aberrations of the first degree
CN1591761A (zh) * 2003-08-29 2005-03-09 Fei公司 借助于粒子束中的像散在粒子光学设备中执行聚焦的方法
TW200818232A (en) * 2006-09-12 2008-04-16 Ebara Corp Charged particle beam device, astigmatism adjustment method using the same and device manufacturing method using the same
JP2009140924A (ja) * 2007-12-05 2009-06-25 Ceos Corrected Electron Optical Systems Gmbh 軸上及び軸外ビーム経路のための補正器

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3254906B2 (ja) * 1994-06-27 2002-02-12 富士通株式会社 荷電粒子ビーム露光装置及び露光方法
DE19739290A1 (de) * 1997-09-08 1999-03-11 Ceos Gmbh Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen
JP4242101B2 (ja) * 2002-02-08 2009-03-18 日本電子株式会社 ウィーンフィルタ
JP4074185B2 (ja) * 2002-12-17 2008-04-09 日本電子株式会社 エネルギーフィルタ及び電子顕微鏡
DE60235636D1 (de) 2002-12-17 2010-04-22 Integrated Circuit Testing it dieser Linse, und Herstellungsverfahren für diese Linse
CN103843105A (zh) * 2010-02-10 2014-06-04 摩奇有限公司(d/b/aVoxa) 暗视野像差矫正电子显微镜

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0500179A1 (en) * 1991-02-20 1992-08-26 Koninklijke Philips Electronics N.V. Charged particle beam device
US6784437B2 (en) * 2001-12-04 2004-08-31 Leo Elektronenmikroskopie Gmbh Corrector for correcting first-order chromatic aberrations of the first degree
CN1591761A (zh) * 2003-08-29 2005-03-09 Fei公司 借助于粒子束中的像散在粒子光学设备中执行聚焦的方法
TW200818232A (en) * 2006-09-12 2008-04-16 Ebara Corp Charged particle beam device, astigmatism adjustment method using the same and device manufacturing method using the same
JP2009140924A (ja) * 2007-12-05 2009-06-25 Ceos Corrected Electron Optical Systems Gmbh 軸上及び軸外ビーム経路のための補正器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI745687B (zh) * 2018-05-24 2021-11-11 日商紐富來科技股份有限公司 多電子束影像取得裝置以及多電子束光學系統的定位方法

Also Published As

Publication number Publication date
JP2014082211A (ja) 2014-05-08
EP2722868B2 (en) 2025-03-26
US20140103201A1 (en) 2014-04-17
JP5738378B2 (ja) 2015-06-24
EP2722868B1 (en) 2018-02-21
EP2722868A1 (en) 2014-04-23
TW201417134A (zh) 2014-05-01
US8816270B2 (en) 2014-08-26

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