EP3268979A4 - Apparatus of plural charged-particle beams - Google Patents
Apparatus of plural charged-particle beams Download PDFInfo
- Publication number
- EP3268979A4 EP3268979A4 EP16762718.1A EP16762718A EP3268979A4 EP 3268979 A4 EP3268979 A4 EP 3268979A4 EP 16762718 A EP16762718 A EP 16762718A EP 3268979 A4 EP3268979 A4 EP 3268979A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- particle beams
- plural charged
- plural
- charged
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/049—Focusing means
- H01J2237/0492—Lens systems
- H01J2237/04924—Lens systems electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/083—Beam forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/1205—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/151—Electrostatic means
- H01J2237/1516—Multipoles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2817—Pattern inspection
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2016/027267 WO2016145458A1 (en) | 2015-03-10 | 2016-04-13 | Apparatus of plural charged-particle beams |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3268979A1 EP3268979A1 (en) | 2018-01-17 |
EP3268979A4 true EP3268979A4 (en) | 2019-05-08 |
Family
ID=61141517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP16762718.1A Pending EP3268979A4 (en) | 2016-04-13 | 2016-04-13 | Apparatus of plural charged-particle beams |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP3268979A4 (en) |
JP (1) | JP6550478B2 (en) |
CN (1) | CN108292583B (en) |
WO (1) | WO2016145458A1 (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102651558B1 (en) | 2015-07-22 | 2024-03-26 | 에이에스엠엘 네델란즈 비.브이. | Apparatus of plural charged-particle beams |
EP3384279A4 (en) | 2015-11-30 | 2019-10-09 | Hermes Microvision Inc. | Apparatus of plural charged-particle beams |
US10062541B2 (en) | 2016-01-27 | 2018-08-28 | Hermes Microvision Inc. | Apparatus of plural charged-particle beams |
JP7286630B2 (en) * | 2017-10-02 | 2023-06-05 | エーエスエムエル ネザーランズ ビー.ブイ. | Equipment using a charged particle beam |
US10741354B1 (en) | 2018-02-14 | 2020-08-11 | Kla-Tencor Corporation | Photocathode emitter system that generates multiple electron beams |
EP3576128A1 (en) * | 2018-05-28 | 2019-12-04 | ASML Netherlands B.V. | Electron beam apparatus, inspection tool and inspection method |
JP2021532545A (en) * | 2018-08-09 | 2021-11-25 | エーエスエムエル ネザーランズ ビー.ブイ. | Device for multiple charged particle beams |
DE102018124219A1 (en) * | 2018-10-01 | 2020-04-02 | Carl Zeiss Microscopy Gmbh | Multi-beam particle beam system and method for operating such a system |
US10748739B2 (en) * | 2018-10-12 | 2020-08-18 | Kla-Tencor Corporation | Deflection array apparatus for multi-electron beam system |
KR102660825B1 (en) * | 2018-10-19 | 2024-04-26 | 에이에스엠엘 네델란즈 비.브이. | System and method for aligning electron beams in a multi-beam inspection device |
EP3881347A1 (en) * | 2018-11-16 | 2021-09-22 | ASML Netherlands B.V. | Electromagnetic compound lens and charged particle optical system with such a lens |
CN113614873A (en) | 2018-12-31 | 2021-11-05 | Asml荷兰有限公司 | Multi-beam inspection apparatus |
US10748743B1 (en) * | 2019-02-12 | 2020-08-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Device and method for operating a charged particle device with multiple beamlets |
KR102655288B1 (en) | 2019-03-29 | 2024-04-08 | 에이에스엠엘 네델란즈 비.브이. | Multi-beam inspection device with single-beam mode |
DE102019004124B4 (en) * | 2019-06-13 | 2024-03-21 | Carl Zeiss Multisem Gmbh | Particle beam system for the azimuthal deflection of individual particle beams and its use and method for azimuth correction in a particle beam system |
JP7303052B2 (en) * | 2019-07-16 | 2023-07-04 | 株式会社ニューフレアテクノロジー | Continuity inspection method for multipole aberration corrector and continuity inspection apparatus for multipole aberration corrector |
US11056312B1 (en) * | 2020-02-05 | 2021-07-06 | Kla Corporation | Micro stigmator array for multi electron beam system |
KR20220134689A (en) * | 2020-03-05 | 2022-10-05 | 에이에스엠엘 네델란즈 비.브이. | Beam Array Geometry Optimizer for Multi-Beam Inspection Systems |
JP7442376B2 (en) | 2020-04-06 | 2024-03-04 | 株式会社ニューフレアテクノロジー | Multi-electron beam inspection device and multi-electron beam inspection method |
JP7514677B2 (en) * | 2020-07-13 | 2024-07-11 | 株式会社ニューフレアテクノロジー | Pattern inspection apparatus and method for acquiring contour position of pattern |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6175122B1 (en) * | 1998-01-09 | 2001-01-16 | International Business Machines Corporation | Method for writing a pattern using multiple variable shaped electron beams |
US20080054184A1 (en) * | 2003-09-05 | 2008-03-06 | Carl Zeiss Smt Ag | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
EP2879155A1 (en) * | 2013-12-02 | 2015-06-03 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multi-beam system for high throughput EBI |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6630681B1 (en) * | 1999-07-21 | 2003-10-07 | Nikon Corporation | Charged-particle-beam microlithography apparatus and methods including correction of aberrations caused by space-charge effects |
WO2001039243A1 (en) * | 1999-11-23 | 2001-05-31 | Ion Diagnostics, Inc. | Electron optics for multi-beam electron beam lithography tool |
WO2002091421A1 (en) * | 2001-05-01 | 2002-11-14 | Nikon Corporation | Electron beam apparatus and device manufacturing method using the electron beam apparatus |
JP2003331772A (en) * | 2002-05-16 | 2003-11-21 | Ebara Corp | Electron beam equipment and device manufacturing method |
US7528614B2 (en) * | 2004-12-22 | 2009-05-05 | Applied Materials, Inc. | Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam |
KR101119890B1 (en) * | 2002-10-30 | 2012-03-13 | 마퍼 리쏘그라피 아이피 비.브이. | Electron beam exposure system |
JP3728315B2 (en) * | 2003-12-16 | 2005-12-21 | キヤノン株式会社 | Electron beam exposure apparatus, electron beam exposure method, and device manufacturing method |
TW200700717A (en) * | 2005-03-22 | 2007-01-01 | Ebara Corp | Electron beam device |
EP2406810B1 (en) * | 2008-10-01 | 2014-09-17 | Mapper Lithography IP B.V. | Electrostatic lens structure |
US8552373B2 (en) * | 2009-05-27 | 2013-10-08 | Hitachi High-Technologies Corporation | Charged particle beam device and sample observation method |
EP2722868B1 (en) * | 2012-10-16 | 2018-02-21 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Octopole device and method for spot size improvement |
JP2014082171A (en) * | 2012-10-18 | 2014-05-08 | Canon Inc | Irradiation system, drawing device and method of manufacturing article |
JP2014229481A (en) * | 2013-05-22 | 2014-12-08 | 株式会社日立ハイテクノロジーズ | Charged particle ray application device |
-
2016
- 2016-04-13 WO PCT/US2016/027267 patent/WO2016145458A1/en active Application Filing
- 2016-04-13 JP JP2017567053A patent/JP6550478B2/en active Active
- 2016-04-13 EP EP16762718.1A patent/EP3268979A4/en active Pending
- 2016-04-13 CN CN201680026508.6A patent/CN108292583B/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6175122B1 (en) * | 1998-01-09 | 2001-01-16 | International Business Machines Corporation | Method for writing a pattern using multiple variable shaped electron beams |
US20080054184A1 (en) * | 2003-09-05 | 2008-03-06 | Carl Zeiss Smt Ag | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
EP2879155A1 (en) * | 2013-12-02 | 2015-06-03 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multi-beam system for high throughput EBI |
Non-Patent Citations (1)
Title |
---|
See also references of WO2016145458A1 * |
Also Published As
Publication number | Publication date |
---|---|
JP6550478B2 (en) | 2019-07-24 |
JP2018513543A (en) | 2018-05-24 |
WO2016145458A1 (en) | 2016-09-15 |
CN108292583B (en) | 2020-03-20 |
CN108292583A (en) | 2018-07-17 |
EP3268979A1 (en) | 2018-01-17 |
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Legal Events
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
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17P | Request for examination filed |
Effective date: 20170901 |
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AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
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AX | Request for extension of the european patent |
Extension state: BA ME |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01J 37/147 20060101ALI20181212BHEP Ipc: H01J 49/00 20060101AFI20181212BHEP Ipc: G21K 5/10 20060101ALI20181212BHEP Ipc: G21K 7/00 20060101ALI20181212BHEP Ipc: H01J 37/28 20060101ALI20181212BHEP Ipc: G01N 23/00 20060101ALI20181212BHEP |
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A4 | Supplementary search report drawn up and despatched |
Effective date: 20190404 |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: G21K 7/00 20060101ALI20190329BHEP Ipc: H01J 37/147 20060101ALI20190329BHEP Ipc: H01J 37/28 20060101ALI20190329BHEP Ipc: H01J 49/00 20060101AFI20190329BHEP Ipc: G21K 5/10 20060101ALI20190329BHEP Ipc: G01N 23/00 20060101ALI20190329BHEP |
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DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: CHEN, ZHONGWEI Owner name: LI, SHUAI Owner name: LIU, XUEDONG Owner name: REN, WEIMING Owner name: ASML NETHERLANDS B.V. |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |
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17Q | First examination report despatched |
Effective date: 20230316 |
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P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230414 |