JP2011238612A5 - - Google Patents

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Publication number
JP2011238612A5
JP2011238612A5 JP2011102799A JP2011102799A JP2011238612A5 JP 2011238612 A5 JP2011238612 A5 JP 2011238612A5 JP 2011102799 A JP2011102799 A JP 2011102799A JP 2011102799 A JP2011102799 A JP 2011102799A JP 2011238612 A5 JP2011238612 A5 JP 2011238612A5
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JP
Japan
Prior art keywords
dispersion
electron beam
primary
deflector
sample
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JP2011102799A
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English (en)
Japanese (ja)
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JP2011238612A (ja
JP5637929B2 (ja
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Priority claimed from EP20100162334 external-priority patent/EP2385542B1/en
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Publication of JP2011238612A publication Critical patent/JP2011238612A/ja
Publication of JP2011238612A5 publication Critical patent/JP2011238612A5/ja
Application granted granted Critical
Publication of JP5637929B2 publication Critical patent/JP5637929B2/ja
Expired - Fee Related legal-status Critical Current
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JP2011102799A 2010-05-07 2011-05-02 分散補償電子ビーム装置および方法 Expired - Fee Related JP5637929B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP10162334.6 2010-05-07
EP20100162334 EP2385542B1 (en) 2010-05-07 2010-05-07 Electron beam device with dispersion compensation, and method of operating same

Publications (3)

Publication Number Publication Date
JP2011238612A JP2011238612A (ja) 2011-11-24
JP2011238612A5 true JP2011238612A5 (enExample) 2014-06-19
JP5637929B2 JP5637929B2 (ja) 2014-12-10

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011102799A Expired - Fee Related JP5637929B2 (ja) 2010-05-07 2011-05-02 分散補償電子ビーム装置および方法

Country Status (5)

Country Link
US (1) US9048068B2 (enExample)
EP (1) EP2385542B1 (enExample)
JP (1) JP5637929B2 (enExample)
KR (1) KR101556236B1 (enExample)
TW (1) TWI488209B (enExample)

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JP5386544B2 (ja) * 2011-06-07 2014-01-15 株式会社アドバンテスト 電子ビーム露光装置及び電子ビーム露光方法
JP6037693B2 (ja) * 2012-07-23 2016-12-07 株式会社日立ハイテクノロジーズ 荷電粒子線装置
EP2779204A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron gun arrangement
US9330884B1 (en) * 2014-11-11 2016-05-03 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Dome detection for charged particle beam device
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KR20190091577A (ko) * 2015-07-22 2019-08-06 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
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US10504687B2 (en) * 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
JP6919063B2 (ja) * 2018-03-30 2021-08-11 株式会社日立ハイテク 荷電粒子線応用装置
EP3948920A1 (en) * 2019-03-27 2022-02-09 ASML Netherlands B.V. System and method for alignment of secondary beams in multi-beam inspection apparatus
US11094501B2 (en) * 2019-11-19 2021-08-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Secondary charged particle imaging system
EP4268257A1 (en) * 2020-12-22 2023-11-01 ASML Netherlands B.V. Electron optical column and method for directing a beam of primary electrons onto a sample
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