JP5637929B2 - 分散補償電子ビーム装置および方法 - Google Patents

分散補償電子ビーム装置および方法 Download PDF

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Publication number
JP5637929B2
JP5637929B2 JP2011102799A JP2011102799A JP5637929B2 JP 5637929 B2 JP5637929 B2 JP 5637929B2 JP 2011102799 A JP2011102799 A JP 2011102799A JP 2011102799 A JP2011102799 A JP 2011102799A JP 5637929 B2 JP5637929 B2 JP 5637929B2
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Prior art keywords
dispersion
electron beam
primary
electron
deflector
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JP2011238612A5 (enExample
JP2011238612A (ja
Inventor
ラニオ ステファン
ラニオ ステファン
ショーネッカー ジェラルド
ショーネッカー ジェラルド
Original Assignee
アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
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Publication of JP2011238612A publication Critical patent/JP2011238612A/ja
Publication of JP2011238612A5 publication Critical patent/JP2011238612A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H01J2237/1523—Prisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2011102799A 2010-05-07 2011-05-02 分散補償電子ビーム装置および方法 Expired - Fee Related JP5637929B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP10162334.6 2010-05-07
EP20100162334 EP2385542B1 (en) 2010-05-07 2010-05-07 Electron beam device with dispersion compensation, and method of operating same

Publications (3)

Publication Number Publication Date
JP2011238612A JP2011238612A (ja) 2011-11-24
JP2011238612A5 JP2011238612A5 (enExample) 2014-06-19
JP5637929B2 true JP5637929B2 (ja) 2014-12-10

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JP2011102799A Expired - Fee Related JP5637929B2 (ja) 2010-05-07 2011-05-02 分散補償電子ビーム装置および方法

Country Status (5)

Country Link
US (1) US9048068B2 (enExample)
EP (1) EP2385542B1 (enExample)
JP (1) JP5637929B2 (enExample)
KR (1) KR101556236B1 (enExample)
TW (1) TWI488209B (enExample)

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EP2779204A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron gun arrangement
US9330884B1 (en) * 2014-11-11 2016-05-03 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Dome detection for charged particle beam device
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KR20190091577A (ko) * 2015-07-22 2019-08-06 에이에스엠엘 네델란즈 비.브이. 복수의 하전 입자 빔을 이용하는 장치
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JP6919063B2 (ja) * 2018-03-30 2021-08-11 株式会社日立ハイテク 荷電粒子線応用装置
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US11094501B2 (en) * 2019-11-19 2021-08-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Secondary charged particle imaging system
EP4268257A1 (en) * 2020-12-22 2023-11-01 ASML Netherlands B.V. Electron optical column and method for directing a beam of primary electrons onto a sample
EP4530236A1 (en) 2023-09-28 2025-04-02 Canon Kabushiki Kaisha A print substrate stack handling module for stacking and/or separating substrates

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Also Published As

Publication number Publication date
TW201214497A (en) 2012-04-01
US20110272577A1 (en) 2011-11-10
KR101556236B1 (ko) 2015-09-30
EP2385542A1 (en) 2011-11-09
EP2385542B1 (en) 2013-01-02
KR20110123679A (ko) 2011-11-15
JP2011238612A (ja) 2011-11-24
US9048068B2 (en) 2015-06-02
TWI488209B (zh) 2015-06-11

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