AU2002232395A1 - Hall effect ion source at high current density - Google Patents

Hall effect ion source at high current density

Info

Publication number
AU2002232395A1
AU2002232395A1 AU2002232395A AU3239502A AU2002232395A1 AU 2002232395 A1 AU2002232395 A1 AU 2002232395A1 AU 2002232395 A AU2002232395 A AU 2002232395A AU 3239502 A AU3239502 A AU 3239502A AU 2002232395 A1 AU2002232395 A1 AU 2002232395A1
Authority
AU
Australia
Prior art keywords
current density
ion source
high current
hall effect
effect ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002232395A
Inventor
Wayne L. Johnson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2002232395A1 publication Critical patent/AU2002232395A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/146—End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
AU2002232395A 2000-11-03 2001-10-30 Hall effect ion source at high current density Abandoned AU2002232395A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US24521200P 2000-11-03 2000-11-03
US60/245,212 2000-11-03
PCT/US2001/042846 WO2002037521A2 (en) 2000-11-03 2001-10-30 Hall effect ion source at high current density

Publications (1)

Publication Number Publication Date
AU2002232395A1 true AU2002232395A1 (en) 2002-05-15

Family

ID=22925751

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002232395A Abandoned AU2002232395A1 (en) 2000-11-03 2001-10-30 Hall effect ion source at high current density

Country Status (3)

Country Link
US (1) US6819053B2 (en)
AU (1) AU2002232395A1 (en)
WO (1) WO2002037521A2 (en)

Families Citing this family (24)

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US20030206837A1 (en) 1998-11-05 2003-11-06 Taylor Charles E. Electro-kinetic air transporter and conditioner device with enhanced maintenance features and enhanced anti-microorganism capability
US20050210902A1 (en) 2004-02-18 2005-09-29 Sharper Image Corporation Electro-kinetic air transporter and/or conditioner devices with features for cleaning emitter electrodes
US6176977B1 (en) 1998-11-05 2001-01-23 Sharper Image Corporation Electro-kinetic air transporter-conditioner
US7695690B2 (en) 1998-11-05 2010-04-13 Tessera, Inc. Air treatment apparatus having multiple downstream electrodes
US6911779B2 (en) * 2001-04-20 2005-06-28 John Madocks Magnetic mirror plasma source
KR101153978B1 (en) * 2002-03-26 2012-06-14 카부시키카이샤 시.브이.리서어치 Method of manufacturing amorphous metal oxide film and methods of manufacturing capacitance element having amorphous metal oxide film and semiconductor device
US7906080B1 (en) 2003-09-05 2011-03-15 Sharper Image Acquisition Llc Air treatment apparatus having a liquid holder and a bipolar ionization device
US7724492B2 (en) 2003-09-05 2010-05-25 Tessera, Inc. Emitter electrode having a strip shape
WO2005028697A1 (en) 2003-09-12 2005-03-31 Applied Process Technologies, Inc. Magnetic mirror plasma source and method using same
USH2212H1 (en) * 2003-09-26 2008-04-01 The United States Of America As Represented By The Secretary Of The Navy Method and apparatus for producing an ion-ion plasma continuous in time
CN100533642C (en) * 2003-10-15 2009-08-26 塞恩技术有限公司 Ion source with modified gas delivery
US7767169B2 (en) 2003-12-11 2010-08-03 Sharper Image Acquisition Llc Electro-kinetic air transporter-conditioner system and method to oxidize volatile organic compounds
US20060016333A1 (en) 2004-07-23 2006-01-26 Sharper Image Corporation Air conditioner device with removable driver electrodes
US7420182B2 (en) * 2005-04-27 2008-09-02 Busek Company Combined radio frequency and hall effect ion source and plasma accelerator system
KR100741401B1 (en) * 2005-08-10 2007-07-20 한국기계연구원 Method for separating and purifying nanotube by using microwave and device for the same
CN100419944C (en) * 2005-12-08 2008-09-17 北京北方微电子基地设备工艺研究中心有限责任公司 Plasma treating coil
US7833322B2 (en) 2006-02-28 2010-11-16 Sharper Image Acquisition Llc Air treatment apparatus having a voltage control device responsive to current sensing
US7850828B2 (en) * 2006-09-15 2010-12-14 Cardinal Cg Company Enhanced virtual anode
EP2385542B1 (en) * 2010-05-07 2013-01-02 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam device with dispersion compensation, and method of operating same
US8508134B2 (en) * 2010-07-29 2013-08-13 Evgeny Vitalievich Klyuev Hall-current ion source with improved ion beam energy distribution
WO2016126650A1 (en) 2015-02-03 2016-08-11 Cardinal Cg Company Sputtering apparatus including gas distribution system
AU2016282065A1 (en) * 2015-06-23 2018-02-08 Aurora Labs Limited Plasma driven particle propagation apparatus and pumping method
CN111140448A (en) * 2019-12-23 2020-05-12 北京航空航天大学 Vector magnetic nozzle for electric propulsion consisting of interwoven electromagnetic coils
CN113436951A (en) * 2021-05-21 2021-09-24 武汉理工大学 Ion beam and radio frequency hybrid driven capacitively coupled plasma source

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5562734A (en) * 1978-11-01 1980-05-12 Toshiba Corp Ion source and ion etching method
US4541890A (en) * 1982-06-01 1985-09-17 International Business Machines Corporation Hall ion generator for working surfaces with a low energy high intensity ion beam
FR2546358B1 (en) * 1983-05-20 1985-07-05 Commissariat Energie Atomique ION SOURCE WITH ELECTRON CYCLOTRON RESONANCE
JPS6161345A (en) * 1984-08-31 1986-03-29 Univ Kyoto Whole accelerator with magnetron auxiliary discharge
US4862032A (en) * 1986-10-20 1989-08-29 Kaufman Harold R End-Hall ion source
EP0463408A3 (en) * 1990-06-22 1992-07-08 Hauzer Techno Coating Europe Bv Plasma accelerator with closed electron drift
EP0525927B1 (en) * 1991-07-23 1995-09-27 Nissin Electric Company, Limited Ion source having a mass separation device
UA27921C2 (en) * 1993-06-21 2000-10-16 Сосьєте Національ Д`Етюд Ет Де Конструкцьон Де Мотер Д`Авіацьон (С.Н.Е.К.М.А.) Plasma engine with decreased length with closed electron drift
US5763989A (en) * 1995-03-16 1998-06-09 Front Range Fakel, Inc. Closed drift ion source with improved magnetic field
ATE376122T1 (en) * 1995-12-09 2007-11-15 Matra Marconi Space France CONTROLLER HALL EFFECT DRIVE
JPH09302484A (en) * 1996-05-15 1997-11-25 Ulvac Japan Ltd Discharge cleaning device of magnetic neutron beam plasma type
JP2000021871A (en) * 1998-06-30 2000-01-21 Tokyo Electron Ltd Plasma treating method
US6293090B1 (en) * 1998-07-22 2001-09-25 New England Space Works, Inc. More efficient RF plasma electric thruster
CN1241316C (en) * 1999-07-13 2006-02-08 东京电子株式会社 Radio frequency power source for genrating an inducively coupled plasma

Also Published As

Publication number Publication date
US6819053B2 (en) 2004-11-16
US20030184205A1 (en) 2003-10-02
WO2002037521A2 (en) 2002-05-10
WO2002037521A3 (en) 2003-03-13

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