|
JP6147528B2
(ja)
*
|
2012-06-01 |
2017-06-14 |
株式会社ニューフレアテクノロジー |
マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置
|
|
US9824851B2
(en)
*
|
2013-01-20 |
2017-11-21 |
William M. Tong |
Charge drain coating for electron-optical MEMS
|
|
JP6293435B2
(ja)
*
|
2013-08-08 |
2018-03-14 |
株式会社ニューフレアテクノロジー |
マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
|
|
NL2011401C2
(en)
*
|
2013-09-06 |
2015-03-09 |
Mapper Lithography Ip Bv |
Charged particle optical device.
|
|
DE102014008083B9
(de)
|
2014-05-30 |
2018-03-22 |
Carl Zeiss Microscopy Gmbh |
Teilchenstrahlsystem
|
|
DE102014008105B4
(de)
|
2014-05-30 |
2021-11-11 |
Carl Zeiss Multisem Gmbh |
Mehrstrahl-Teilchenmikroskop
|
|
DE102014008383B9
(de)
|
2014-06-06 |
2018-03-22 |
Carl Zeiss Microscopy Gmbh |
Teilchenstrahlsystem und Verfahren zum Betreiben einer Teilchenoptik
|
|
US10497536B2
(en)
*
|
2016-09-08 |
2019-12-03 |
Rockwell Collins, Inc. |
Apparatus and method for correcting arrayed astigmatism in a multi-column scanning electron microscopy system
|
|
US10840056B2
(en)
*
|
2017-02-03 |
2020-11-17 |
Kla Corporation |
Multi-column scanning electron microscopy system
|
|
KR102582001B1
(ko)
*
|
2017-04-28 |
2023-09-22 |
에이에스엠엘 네델란즈 비.브이. |
다수의 하전 입자 빔들을 사용하는 장치
|
|
KR102460680B1
(ko)
*
|
2017-10-02 |
2022-10-28 |
에이에스엠엘 네델란즈 비.브이. |
하전 입자 빔들을 사용하는 장치
|
|
EP3474308A1
(en)
*
|
2017-10-17 |
2019-04-24 |
Universiteit Antwerpen |
Spatial phase manipulation of charged particle beam
|
|
JP7198092B2
(ja)
*
|
2018-05-18 |
2022-12-28 |
株式会社ニューフレアテクノロジー |
マルチ電子ビーム照射装置、マルチ電子ビーム検査装置及びマルチ電子ビーム照射方法
|
|
EP3576128A1
(en)
*
|
2018-05-28 |
2019-12-04 |
ASML Netherlands B.V. |
Electron beam apparatus, inspection tool and inspection method
|
|
US10483080B1
(en)
*
|
2018-07-17 |
2019-11-19 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
|
|
DE102018007652B4
(de)
*
|
2018-09-27 |
2021-03-25 |
Carl Zeiss Multisem Gmbh |
Teilchenstrahl-System sowie Verfahren zur Stromregulierung von Einzel-Teilchenstrahlen
|
|
US11145485B2
(en)
*
|
2018-12-26 |
2021-10-12 |
Nuflare Technology, Inc. |
Multiple electron beams irradiation apparatus
|
|
US20200303156A1
(en)
*
|
2019-03-20 |
2020-09-24 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Beam splitter for a charged particle device
|
|
EP3716313A1
(en)
*
|
2019-03-28 |
2020-09-30 |
ASML Netherlands B.V. |
Aperture array with integrated current measurement
|
|
CN113795459B
(zh)
*
|
2019-04-06 |
2025-04-29 |
Asml荷兰有限公司 |
具有内置电压生成器的mems图像形成元件
|
|
DE102019005362A1
(de)
*
|
2019-07-31 |
2021-02-04 |
Carl Zeiss Multisem Gmbh |
Verfahren zum Betreiben eines Vielzahl-Teilchenstrahlsystems unter Veränderung der numerischen Apertur, zugehöriges Computerprogrammprodukt und Vielzahl-Teilchenstrahlsystem
|
|
JP7222874B2
(ja)
*
|
2019-11-12 |
2023-02-15 |
東芝デバイス&ストレージ株式会社 |
半導体装置
|
|
US11120965B2
(en)
*
|
2019-12-04 |
2021-09-14 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Beam blanking device for a multi-beamlet charged particle beam apparatus
|
|
EP4088301A1
(en)
|
2020-01-06 |
2022-11-16 |
ASML Netherlands B.V. |
Charged particle assessment tool, inspection method
|
|
EP3937204A1
(en)
|
2020-07-06 |
2022-01-12 |
ASML Netherlands B.V. |
Inspection apparatus
|
|
EP3975222A1
(en)
|
2020-09-24 |
2022-03-30 |
ASML Netherlands B.V. |
Charged particle assessment tool, inspection method
|
|
EP3863040A1
(en)
|
2020-02-07 |
2021-08-11 |
ASML Netherlands B.V. |
Charged particle manipulator device
|
|
EP3869533A1
(en)
|
2020-02-21 |
2021-08-25 |
ASML Netherlands B.V. |
Charged particle assessment tool, inspection method
|
|
EP3869536A1
(en)
|
2020-02-21 |
2021-08-25 |
ASML Netherlands B.V. |
Inspection apparatus
|
|
CN115152000A
(zh)
|
2020-02-21 |
2022-10-04 |
Asml荷兰有限公司 |
带电粒子评估工具及检查方法
|
|
EP3869535A1
(en)
|
2020-02-21 |
2021-08-25 |
ASML Netherlands B.V. |
Charged particle assessment tool, inspection method
|
|
KR20250144502A
(ko)
*
|
2020-02-21 |
2025-10-10 |
에이에스엠엘 네델란즈 비.브이. |
검사 장치
|
|
EP3876258A1
(en)
*
|
2020-03-06 |
2021-09-08 |
ASML Netherlands B.V. |
Beam manipulator in charged particle-beam exposure apparatus
|
|
JP7359050B2
(ja)
*
|
2020-03-18 |
2023-10-11 |
株式会社ニューフレアテクノロジー |
マルチビーム用のブランキング装置及びマルチ荷電粒子ビーム描画装置
|
|
EP3893263A1
(en)
|
2020-04-06 |
2021-10-13 |
ASML Netherlands B.V. |
Aperture assembly, beam manipulator unit, method of manipulating charged particle beams, and charged particle projection apparatus
|
|
EP3893264A1
(en)
|
2020-04-06 |
2021-10-13 |
ASML Netherlands B.V. |
Charged particle assessment tool, inspection method
|
|
JP7409946B2
(ja)
*
|
2020-04-13 |
2024-01-09 |
株式会社ニューフレアテクノロジー |
マルチ荷電粒子ビーム照射装置及びマルチ荷電粒子ビーム検査装置
|
|
EP4165675A1
(en)
|
2020-06-10 |
2023-04-19 |
ASML Netherlands B.V. |
Replaceable module for a charged particle apparatus
|
|
EP4020565A1
(en)
|
2020-12-23 |
2022-06-29 |
ASML Netherlands B.V. |
Detector substrate, an inspection apparatus and method of sample assessment
|
|
CN115769376A
(zh)
|
2020-07-06 |
2023-03-07 |
Asml荷兰有限公司 |
检测器衬底、检查设备和样品评估方法
|
|
EP3937205A1
(en)
|
2020-07-06 |
2022-01-12 |
ASML Netherlands B.V. |
Charged-particle multi-beam column, charged-particle multi-beam column array, inspection method
|
|
EP4214736A2
(en)
|
2020-09-17 |
2023-07-26 |
ASML Netherlands B.V. |
Charged particle assessment tool, inspection method
|
|
EP3971939A1
(en)
|
2020-09-17 |
2022-03-23 |
ASML Netherlands B.V. |
Charged particle assessment tool, inspection method
|
|
IL300781A
(en)
|
2020-09-17 |
2023-04-01 |
Asml Netherlands Bv |
Assembling an objective lens array, electronic-optical system, electronic-optical system array, focusing method, objective lens arrangement
|
|
EP3971940A1
(en)
|
2020-09-17 |
2022-03-23 |
ASML Netherlands B.V. |
Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing, objective lens arrangement
|
|
EP4002421A1
(en)
|
2020-11-12 |
2022-05-25 |
ASML Netherlands B.V. |
Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing
|
|
KR20230098813A
(ko)
|
2020-11-12 |
2023-07-04 |
에이에스엠엘 네델란즈 비.브이. |
대물 렌즈 어레이 조립체, 전자-광학 시스템, 전자-광학 시스템 어레이, 포커싱 방법
|
|
EP4009348A1
(en)
|
2020-12-01 |
2022-06-08 |
ASML Netherlands B.V. |
Charged particle inspection tool and method
|
|
EP4009349A1
(en)
|
2020-12-03 |
2022-06-08 |
ASML Netherlands B.V. |
Charged particle tool, calibration method, inspection method
|
|
KR20230118106A
(ko)
|
2020-12-14 |
2023-08-10 |
에이에스엠엘 네델란즈 비.브이. |
하전 입자의 다중 빔을 사용하여 샘플을 프로세싱하는 하전 입자 시스템, 방법
|
|
EP4086933A1
(en)
|
2021-05-03 |
2022-11-09 |
ASML Netherlands B.V. |
Charged particle system, method of processing a sample using a multi-beam of charged particles
|
|
EP4020516A1
(en)
|
2020-12-23 |
2022-06-29 |
ASML Netherlands B.V. |
Charged particle optical device, objective lens assembly, detector, detector array, and methods
|
|
WO2022136064A1
(en)
|
2020-12-23 |
2022-06-30 |
Asml Netherlands B.V. |
Charged particle optical device
|
|
US20240006146A1
(en)
*
|
2020-12-24 |
2024-01-04 |
National University Of Singapore |
Ion microscope
|
|
EP4084039A1
(en)
|
2021-04-29 |
2022-11-02 |
ASML Netherlands B.V. |
Charged particle assessment system and method
|
|
KR20240007649A
(ko)
|
2021-05-12 |
2024-01-16 |
에이에스엠엘 네델란즈 비.브이. |
평가 시스템, 평가 방법
|
|
EP4089712A1
(en)
|
2021-05-12 |
2022-11-16 |
ASML Netherlands B.V. |
Assessment system, method of assessing
|
|
EP4092712A1
(en)
|
2021-05-18 |
2022-11-23 |
ASML Netherlands B.V. |
Charged particle optical device and method using it
|
|
EP4092614A1
(en)
|
2021-05-21 |
2022-11-23 |
ASML Netherlands B.V. |
Data processing device and method, charged particle assessment system and method
|
|
IL308017A
(en)
|
2021-05-21 |
2023-12-01 |
Asml Netherlands Bv |
Device and method for data processing, system and method for evaluating charged particles
|
|
EP4095881A1
(en)
|
2021-05-25 |
2022-11-30 |
ASML Netherlands B.V. |
Charged particle device
|
|
EP4102535A1
(en)
|
2021-06-08 |
2022-12-14 |
ASML Netherlands B.V. |
Charged particle apparatus and method
|
|
EP4352773A1
(en)
|
2021-06-08 |
2024-04-17 |
ASML Netherlands B.V. |
Charged particle apparatus and method
|
|
EP4102536A1
(en)
|
2021-06-10 |
2022-12-14 |
ASML Netherlands B.V. |
Method of compensating for an effect of electrode distortion, assessment system
|
|
EP4113570A1
(en)
|
2021-06-29 |
2023-01-04 |
ASML Netherlands B.V. |
Charged particle assessment system and method of aligning a sample in a charged particle assessment system
|
|
EP4117016A1
(en)
|
2021-07-05 |
2023-01-11 |
ASML Netherlands B.V. |
Charged particle detector
|
|
EP4117015A1
(en)
|
2021-07-05 |
2023-01-11 |
ASML Netherlands B.V. |
Charged particle device, detector, and methods
|
|
EP4117017A1
(en)
|
2021-07-05 |
2023-01-11 |
ASML Netherlands B.V. |
Charged particle detector
|
|
IL309679A
(en)
|
2021-07-07 |
2024-02-01 |
Asml Netherlands Bv |
Charged particle device and method
|
|
EP4117012A1
(en)
|
2021-07-07 |
2023-01-11 |
ASML Netherlands B.V. |
Charged particle-optical device, charged particle apparatus and method
|
|
EP4117014A1
(en)
|
2021-07-07 |
2023-01-11 |
ASML Netherlands B.V. |
Charged particle apparatus and method
|
|
DE102021118561B4
(de)
|
2021-07-19 |
2023-03-30 |
Carl Zeiss Multisem Gmbh |
Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskopes mit schneller Strahlstromregelung, Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop
|
|
EP4123683A1
(en)
|
2021-07-20 |
2023-01-25 |
ASML Netherlands B.V. |
Data processing device and method, charged particle assessment system and method
|
|
EP4131329A1
(en)
|
2021-08-02 |
2023-02-08 |
ASML Netherlands B.V. |
Charged-particle optical device
|
|
EP4156227A1
(en)
|
2021-09-27 |
2023-03-29 |
ASML Netherlands B.V. |
Charged particle apparatus and method
|
|
US11651934B2
(en)
|
2021-09-30 |
2023-05-16 |
Kla Corporation |
Systems and methods of creating multiple electron beams
|
|
WO2023066595A1
(en)
|
2021-10-19 |
2023-04-27 |
Asml Netherlands B.V. |
Detector assembly, charged particle device, apparatus, and methods
|
|
EP4170695A1
(en)
|
2021-10-19 |
2023-04-26 |
ASML Netherlands B.V. |
Detector assembly, charged particle device, apparatus, and methods
|
|
EP4181167A1
(en)
|
2021-11-11 |
2023-05-17 |
ASML Netherlands B.V. |
Charged particle assessment system and method
|
|
KR20240095241A
(ko)
|
2021-11-11 |
2024-06-25 |
에이에스엠엘 네델란즈 비.브이. |
하전 입자 평가 시스템 및 방법
|
|
EP4213176A1
(en)
|
2022-01-13 |
2023-07-19 |
ASML Netherlands B.V. |
Charged particle assessment system
|
|
WO2023110244A1
(en)
|
2021-12-15 |
2023-06-22 |
Asml Netherlands B.V. |
Charged particle assessment system
|
|
WO2023110284A1
(en)
|
2021-12-15 |
2023-06-22 |
Asml Netherlands B.V. |
Method of generating a sample map, computer program product
|
|
EP4199031A1
(en)
|
2021-12-17 |
2023-06-21 |
ASML Netherlands B.V. |
Charged-particle optical apparatus and projection method
|
|
KR20240115321A
(ko)
|
2021-12-17 |
2024-07-25 |
에이에스엠엘 네델란즈 비.브이. |
검출기 검사 디바이스, 검출기 조립체, 검출기 어레이, 장치, 및 방법
|
|
WO2023110331A1
(en)
|
2021-12-17 |
2023-06-22 |
Asml Netherlands B.V. |
Charged-particle optical apparatus and projection method
|
|
EP4199027A1
(en)
|
2021-12-17 |
2023-06-21 |
ASML Netherlands B.V. |
Charged-particle apparatus, multi-device apparatus, method of using charged-particle apparatus and control method
|
|
EP4199032A1
(en)
|
2021-12-17 |
2023-06-21 |
ASML Netherlands B.V. |
Detector inspection device, detector assembly, detector array, apparatus, and method
|
|
EP4199033A1
(en)
|
2021-12-20 |
2023-06-21 |
ASML Netherlands B.V. |
Method of processing a sample with a charged particle assessment system
|
|
EP4199028A1
(en)
|
2021-12-20 |
2023-06-21 |
ASML Netherlands B.V. |
Charged particle device, charged particle assessment apparatus, measuring method, and monitoring method
|
|
EP4202969A1
(en)
|
2021-12-23 |
2023-06-28 |
ASML Netherlands B.V. |
Electron-optical device with compensation for variations in a property of sub-beams
|
|
JP2025503393A
(ja)
|
2021-12-23 |
2025-02-04 |
エーエスエムエル ネザーランズ ビー.ブイ. |
電子光学デバイス、サブビームの特性の変動を補償する方法
|
|
EP4202970A1
(en)
|
2021-12-24 |
2023-06-28 |
ASML Netherlands B.V. |
Alignment determination method and computer program
|
|
CA3242123A1
(en)
*
|
2021-12-31 |
2023-07-06 |
German AKSENOV |
A beam manipulator in charged particle-beam apparatus
|
|
EP4250331A1
(en)
|
2022-03-22 |
2023-09-27 |
ASML Netherlands B.V. |
Charged particle apparatus and method
|
|
EP4258320A1
(en)
|
2022-04-08 |
2023-10-11 |
ASML Netherlands B.V. |
Sensor substrate, apparatus, and method
|
|
CN119156687A
(zh)
*
|
2022-04-11 |
2024-12-17 |
华为技术有限公司 |
粒子矫正装置、粒子矫正器模组和粒子系统
|
|
EP4280252A1
(en)
|
2022-05-16 |
2023-11-22 |
ASML Netherlands B.V. |
Charged particle optical device and method
|
|
EP4511860A1
(en)
|
2022-04-18 |
2025-02-26 |
ASML Netherlands B.V. |
Charged particle optical device and method
|
|
CN119404279A
(zh)
|
2022-07-15 |
2025-02-07 |
Asml荷兰有限公司 |
带电粒子光学装置
|
|
EP4354485A1
(en)
|
2022-10-13 |
2024-04-17 |
ASML Netherlands B.V. |
Charged particle-optical apparatus
|
|
EP4345861A1
(en)
|
2022-09-28 |
2024-04-03 |
ASML Netherlands B.V. |
Charged particle apparatus
|
|
EP4421843A1
(en)
|
2023-02-27 |
2024-08-28 |
ASML Netherlands B.V. |
Charged particle-optical apparatus
|
|
KR20250093503A
(ko)
|
2022-10-27 |
2025-06-24 |
에이에스엠엘 네델란즈 비.브이. |
하전 입자 광학 장치
|
|
DE102022131862A1
(de)
|
2022-12-01 |
2024-06-06 |
Carl Zeiss Multisem Gmbh |
Vielstrahl-Teilchenmikroskop umfassend eine Aberrationskorrektureinheit mit Geometrie-basierten Korrekturelektroden und Verfahren zum Einstellen der Aberrationskorrektur sowie Computerprogrammprodukt
|
|
EP4391009A1
(en)
|
2022-12-21 |
2024-06-26 |
ASML Netherlands B.V. |
Charged particle device and charged particle apparatus
|
|
US12451322B2
(en)
*
|
2023-02-15 |
2025-10-21 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Method of forming a multipole device, method of influencing an electron beam, and multipole device
|
|
EP4418302A1
(en)
*
|
2023-02-16 |
2024-08-21 |
ASML Netherlands B.V. |
Charged particle-optical element, charged particle-optical module, assessment apparatus, chip assembly, method of manufacturing
|
|
DE102023202582A1
(de)
*
|
2023-03-22 |
2024-09-26 |
Carl Zeiss Multisem Gmbh |
Verbesserte Vielstrahl-Erzeugungseinrichtung und Methode zum Betrieb einer Vielstrahl-Erzeugungseinrichtung
|
|
EP4539091A1
(en)
|
2023-10-10 |
2025-04-16 |
ASML Netherlands B.V. |
Electron-beam imaging system
|
|
EP4576159A1
(en)
|
2023-12-20 |
2025-06-25 |
ASML Netherlands B.V. |
Charged particle system and method of baking out a charged particle system
|
|
TW202536906A
(zh)
|
2023-11-09 |
2025-09-16 |
荷蘭商Asml荷蘭公司 |
帶電粒子系統及烘乾帶電粒子系統之方法
|
|
EP4567474A1
(en)
|
2023-12-08 |
2025-06-11 |
ASML Netherlands B.V. |
Signal processing method, signal processor, assessment method, and assessment apparatus
|
|
EP4576158A1
(en)
|
2023-12-18 |
2025-06-25 |
ASML Netherlands B.V. |
Charged particle-optical module, charged particle-optical device, and a method of using a charged-particle apparatus
|
|
EP4575637A1
(en)
|
2023-12-20 |
2025-06-25 |
ASML Netherlands B.V. |
Method and apparatus for assessing a sample surface, method of scanning a sample surface, and charged particle assessment apparatus
|
|
WO2025131457A1
(en)
|
2023-12-20 |
2025-06-26 |
Asml Netherlands B.V. |
Method and apparatus for assessing a sample surface, method of scanning a sample surface, and charged particle assessment apparatus
|
|
WO2025131442A1
(en)
|
2023-12-20 |
2025-06-26 |
Asml Netherlands B.V. |
Charged particle-optical apparatus and method of processing a sample
|
|
EP4597540A1
(en)
|
2024-01-30 |
2025-08-06 |
ASML Netherlands B.V. |
Charged particle-optical apparatus and method of processing a sample
|
|
EP4576157A1
(en)
|
2023-12-20 |
2025-06-25 |
ASML Netherlands B.V. |
High-voltage discharge detection in a charged particle system
|
|
WO2025201803A1
(en)
|
2024-03-28 |
2025-10-02 |
Asml Netherlands B.V. |
Charged particle-optical module
|
|
WO2025201789A1
(en)
|
2024-03-28 |
2025-10-02 |
Asml Netherlands B.V. |
Charged particle-optical module
|
|
WO2025201804A1
(en)
|
2024-03-28 |
2025-10-02 |
Asml Netherlands B.V. |
Charged particle-optical module
|
|
WO2025201799A1
(en)
|
2024-03-28 |
2025-10-02 |
Asml Netherlands B.V. |
Charged particle-optical module
|
|
WO2025201790A1
(en)
|
2024-03-28 |
2025-10-02 |
Asml Netherlands B.V. |
Charged particle-optical module
|
|
WO2025201807A1
(en)
|
2024-03-28 |
2025-10-02 |
Asml Netherlands B.V. |
Charged particle-optical module
|
|
WO2025224235A2
(en)
*
|
2024-04-25 |
2025-10-30 |
Carl Zeiss Multisem Gmbh |
Improved beam control for a multi-beam scanning particle imaging system
|
|
EP4571811A2
(en)
|
2025-04-30 |
2025-06-18 |
ASML Netherlands B.V. |
Cross talk reduction
|
|
EP4576149A3
(en)
|
2025-05-02 |
2025-11-19 |
ASML Netherlands B.V. |
Electrical connection system
|
|
EP4589629A2
(en)
|
2025-05-15 |
2025-07-23 |
ASML Netherlands B.V. |
Assessment apparatus and method for assessment
|