ATE441202T1 - Belichtungssystem mit einem geladenen teilchenstrahl - Google Patents

Belichtungssystem mit einem geladenen teilchenstrahl

Info

Publication number
ATE441202T1
ATE441202T1 AT05740699T AT05740699T ATE441202T1 AT E441202 T1 ATE441202 T1 AT E441202T1 AT 05740699 T AT05740699 T AT 05740699T AT 05740699 T AT05740699 T AT 05740699T AT E441202 T1 ATE441202 T1 AT E441202T1
Authority
AT
Austria
Prior art keywords
group
charged particle
particle beam
apertures
deflectors
Prior art date
Application number
AT05740699T
Other languages
English (en)
Inventor
Pieter Kruit
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Application granted granted Critical
Publication of ATE441202T1 publication Critical patent/ATE441202T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
AT05740699T 2004-05-17 2005-04-29 Belichtungssystem mit einem geladenen teilchenstrahl ATE441202T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57228704P 2004-05-17 2004-05-17
PCT/NL2005/000329 WO2005112073A1 (en) 2004-05-17 2005-04-29 Charged particle beam exposure system

Publications (1)

Publication Number Publication Date
ATE441202T1 true ATE441202T1 (de) 2009-09-15

Family

ID=34967361

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05740699T ATE441202T1 (de) 2004-05-17 2005-04-29 Belichtungssystem mit einem geladenen teilchenstrahl

Country Status (8)

Country Link
US (2) US7453075B2 (de)
EP (1) EP1766653B1 (de)
JP (1) JP4856073B2 (de)
KR (1) KR101099487B1 (de)
CN (2) CN101019203B (de)
AT (1) ATE441202T1 (de)
DE (1) DE602005016256D1 (de)
WO (1) WO2005112073A1 (de)

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ATE441202T1 (de) * 2004-05-17 2009-09-15 Mapper Lithography Ip Bv Belichtungssystem mit einem geladenen teilchenstrahl
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US8445869B2 (en) 2008-04-15 2013-05-21 Mapper Lithography Ip B.V. Projection lens arrangement
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WO2010134017A1 (en) * 2009-05-20 2010-11-25 Mapper Lithography Ip B.V. Method of generating a two-level pattern for lithographic processing and pattern generator using the same
US8294125B2 (en) * 2009-11-18 2012-10-23 Kla-Tencor Corporation High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
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Also Published As

Publication number Publication date
JP2007538398A (ja) 2007-12-27
US20090065711A1 (en) 2009-03-12
WO2005112073A1 (en) 2005-11-24
EP1766653B1 (de) 2009-08-26
CN102005358B (zh) 2012-09-12
JP4856073B2 (ja) 2012-01-18
US20050269528A1 (en) 2005-12-08
KR101099487B1 (ko) 2011-12-28
KR20070021262A (ko) 2007-02-22
EP1766653A1 (de) 2007-03-28
DE602005016256D1 (de) 2009-10-08
CN101019203A (zh) 2007-08-15
CN102005358A (zh) 2011-04-06
US7453075B2 (en) 2008-11-18
CN101019203B (zh) 2010-12-22
US7868307B2 (en) 2011-01-11

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