DE602005016256D1 - Belichtungssystem mit einem geladenen teilchenstrahl - Google Patents

Belichtungssystem mit einem geladenen teilchenstrahl

Info

Publication number
DE602005016256D1
DE602005016256D1 DE602005016256T DE602005016256T DE602005016256D1 DE 602005016256 D1 DE602005016256 D1 DE 602005016256D1 DE 602005016256 T DE602005016256 T DE 602005016256T DE 602005016256 T DE602005016256 T DE 602005016256T DE 602005016256 D1 DE602005016256 D1 DE 602005016256D1
Authority
DE
Germany
Prior art keywords
group
particle beam
apertures
deflectors
aligned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005016256T
Other languages
English (en)
Inventor
Pieter Kruit
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mapper Lithopraphy IP BV
Original Assignee
Mapper Lithopraphy IP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithopraphy IP BV filed Critical Mapper Lithopraphy IP BV
Publication of DE602005016256D1 publication Critical patent/DE602005016256D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
DE602005016256T 2004-05-17 2005-04-29 Belichtungssystem mit einem geladenen teilchenstrahl Active DE602005016256D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57228704P 2004-05-17 2004-05-17
PCT/NL2005/000329 WO2005112073A1 (en) 2004-05-17 2005-04-29 Charged particle beam exposure system

Publications (1)

Publication Number Publication Date
DE602005016256D1 true DE602005016256D1 (de) 2009-10-08

Family

ID=34967361

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005016256T Active DE602005016256D1 (de) 2004-05-17 2005-04-29 Belichtungssystem mit einem geladenen teilchenstrahl

Country Status (8)

Country Link
US (2) US7453075B2 (de)
EP (1) EP1766653B1 (de)
JP (1) JP4856073B2 (de)
KR (1) KR101099487B1 (de)
CN (2) CN101019203B (de)
AT (1) ATE441202T1 (de)
DE (1) DE602005016256D1 (de)
WO (1) WO2005112073A1 (de)

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KR101605832B1 (ko) * 2009-05-20 2016-03-23 마퍼 리쏘그라피 아이피 비.브이. 리소그래픽 처리를 위한 2―레벨 패턴 발생 방법 및 이를 이용한 패턴 발생기
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JP6804304B2 (ja) * 2014-02-10 2020-12-23 ルクスブライト・アーベー Ｘ線管用の電子エミッタ及びｘ線デバイス
US10056228B2 (en) * 2014-07-29 2018-08-21 Applied Materials Israel Ltd. Charged particle beam specimen inspection system and method for operation thereof
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US10242839B2 (en) * 2017-05-05 2019-03-26 Kla-Tencor Corporation Reduced Coulomb interactions in a multi-beam column
NL2024065B1 (en) * 2019-10-21 2021-06-22 Univ Delft Tech Multi-beam charged particle source with alignment means
US11309163B2 (en) * 2019-11-07 2022-04-19 Applied Materials, Inc. Multibeamlet charged particle device and method
EP3869536A1 (de) * 2020-02-21 2021-08-25 ASML Netherlands B.V. Inspektionsvorrichtung
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Also Published As

Publication number Publication date
KR20070021262A (ko) 2007-02-22
JP4856073B2 (ja) 2012-01-18
CN101019203A (zh) 2007-08-15
US20090065711A1 (en) 2009-03-12
JP2007538398A (ja) 2007-12-27
EP1766653A1 (de) 2007-03-28
WO2005112073A1 (en) 2005-11-24
CN101019203B (zh) 2010-12-22
CN102005358A (zh) 2011-04-06
CN102005358B (zh) 2012-09-12
US7453075B2 (en) 2008-11-18
US20050269528A1 (en) 2005-12-08
ATE441202T1 (de) 2009-09-15
US7868307B2 (en) 2011-01-11
EP1766653B1 (de) 2009-08-26
KR101099487B1 (ko) 2011-12-28

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