JP2019536250A5 - - Google Patents

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Publication number
JP2019536250A5
JP2019536250A5 JP2019529641A JP2019529641A JP2019536250A5 JP 2019536250 A5 JP2019536250 A5 JP 2019536250A5 JP 2019529641 A JP2019529641 A JP 2019529641A JP 2019529641 A JP2019529641 A JP 2019529641A JP 2019536250 A5 JP2019536250 A5 JP 2019536250A5
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Japan
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charged particle
array
lens
particle beam
primary charged
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JP2019529641A
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Japanese (ja)
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JP2019536250A (ja
JP6728498B2 (ja
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Priority claimed from US15/366,482 external-priority patent/US10453645B2/en
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JP2019529641A 2016-12-01 2017-11-27 試験片を検査する方法および荷電粒子マルチビーム装置 Active JP6728498B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/366,482 US10453645B2 (en) 2016-12-01 2016-12-01 Method for inspecting a specimen and charged particle multi-beam device
US15/366,482 2016-12-01
PCT/EP2017/080506 WO2018099854A1 (en) 2016-12-01 2017-11-27 Method for inspecting a specimen and charged particle multi-beam device

Publications (3)

Publication Number Publication Date
JP2019536250A JP2019536250A (ja) 2019-12-12
JP2019536250A5 true JP2019536250A5 (enExample) 2020-01-30
JP6728498B2 JP6728498B2 (ja) 2020-07-22

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JP2019529641A Active JP6728498B2 (ja) 2016-12-01 2017-11-27 試験片を検査する方法および荷電粒子マルチビーム装置

Country Status (7)

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US (1) US10453645B2 (enExample)
EP (1) EP3549153A1 (enExample)
JP (1) JP6728498B2 (enExample)
KR (1) KR102179897B1 (enExample)
CN (1) CN110214361B (enExample)
TW (1) TWI709992B (enExample)
WO (1) WO2018099854A1 (enExample)

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DE102019004124B4 (de) 2019-06-13 2024-03-21 Carl Zeiss Multisem Gmbh Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System
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US10923313B1 (en) * 2019-10-17 2021-02-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device and method of operating a charged particle beam device
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WO2021078352A1 (en) * 2019-10-21 2021-04-29 Applied Materials Israel Ltd. Method for inspecting a specimen and charged particle beam device
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US11257657B2 (en) * 2020-02-18 2022-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with interferometer for height measurement
KR20250144502A (ko) * 2020-02-21 2025-10-10 에이에스엠엘 네델란즈 비.브이. 검사 장치
EP3882951A1 (en) * 2020-03-19 2021-09-22 FEI Company Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets
US11380511B2 (en) * 2020-03-24 2022-07-05 Fei Company Charged particle beam source
DE102020115183A1 (de) * 2020-06-08 2021-12-09 Carl Zeiss Multisem Gmbh Teilchenstrahlsystem mit Multiquellensystem
EP3937205A1 (en) * 2020-07-06 2022-01-12 ASML Netherlands B.V. Charged-particle multi-beam column, charged-particle multi-beam column array, inspection method
EP4214736A2 (en) * 2020-09-17 2023-07-26 ASML Netherlands B.V. Charged particle assessment tool, inspection method
US11699564B2 (en) * 2020-10-23 2023-07-11 Nuflare Technology, Inc. Schottky thermal field emitter with integrated beam splitter
WO2022136064A1 (en) 2020-12-23 2022-06-30 Asml Netherlands B.V. Charged particle optical device
US11705301B2 (en) * 2021-01-19 2023-07-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam manipulation device and method for manipulating charged particle beamlets
US11869743B2 (en) * 2021-05-11 2024-01-09 Kla Corporation High throughput multi-electron beam system
EP4095881A1 (en) * 2021-05-25 2022-11-30 ASML Netherlands B.V. Charged particle device
JP7680923B2 (ja) * 2021-09-16 2025-05-21 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams
JP7105022B1 (ja) 2022-03-31 2022-07-22 株式会社Photo electron Soul 電子銃、電子線適用装置およびマルチ電子ビームの形成方法
US20240212968A1 (en) * 2022-12-23 2024-06-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Lens for a charged particle beam apparatus, charged particle beam apparatus, and method of focusing a charged particle beam
CN118588522B (zh) * 2024-08-06 2024-11-08 北京惠然肯来科技中心(有限合伙) 用于带电粒子束装置的载物单元及相关产品
CN119517703B (zh) * 2024-11-15 2025-10-31 深圳后浪实验室科技有限公司 一种离子束聚焦系统

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