CN110214361B - 用于检查样本的方法和带电粒子多束装置 - Google Patents

用于检查样本的方法和带电粒子多束装置 Download PDF

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Publication number
CN110214361B
CN110214361B CN201780074730.8A CN201780074730A CN110214361B CN 110214361 B CN110214361 B CN 110214361B CN 201780074730 A CN201780074730 A CN 201780074730A CN 110214361 B CN110214361 B CN 110214361B
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charged particle
lens
particle beam
primary charged
primary
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Chinese (zh)
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CN110214361A (zh
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于尔根·弗洛森
彼得·克鲁伊特
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Applied Materials Israel Ltd
Technische Universiteit Delft
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Applied Materials Israel Ltd
Technische Universiteit Delft
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/103—Lenses characterised by lens type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1536—Image distortions due to scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
CN201780074730.8A 2016-12-01 2017-11-27 用于检查样本的方法和带电粒子多束装置 Active CN110214361B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/366,482 US10453645B2 (en) 2016-12-01 2016-12-01 Method for inspecting a specimen and charged particle multi-beam device
US15/366,482 2016-12-01
PCT/EP2017/080506 WO2018099854A1 (en) 2016-12-01 2017-11-27 Method for inspecting a specimen and charged particle multi-beam device

Publications (2)

Publication Number Publication Date
CN110214361A CN110214361A (zh) 2019-09-06
CN110214361B true CN110214361B (zh) 2022-01-28

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US (1) US10453645B2 (enExample)
EP (1) EP3549153A1 (enExample)
JP (1) JP6728498B2 (enExample)
KR (1) KR102179897B1 (enExample)
CN (1) CN110214361B (enExample)
TW (1) TWI709992B (enExample)
WO (1) WO2018099854A1 (enExample)

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DE102019004124B4 (de) 2019-06-13 2024-03-21 Carl Zeiss Multisem Gmbh Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System
DE102019005362A1 (de) * 2019-07-31 2021-02-04 Carl Zeiss Multisem Gmbh Verfahren zum Betreiben eines Vielzahl-Teilchenstrahlsystems unter Veränderung der numerischen Apertur, zugehöriges Computerprogrammprodukt und Vielzahl-Teilchenstrahlsystem
US10923313B1 (en) * 2019-10-17 2021-02-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device and method of operating a charged particle beam device
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WO2021078352A1 (en) * 2019-10-21 2021-04-29 Applied Materials Israel Ltd. Method for inspecting a specimen and charged particle beam device
TWI821618B (zh) * 2019-12-19 2023-11-11 荷蘭商Ａｓｍｌ荷蘭公司 藉由多光束裝置執行以形成樣本之影像的方法及相關的多光束裝置
NL2024694B1 (en) * 2020-01-17 2021-09-08 Delmic Ip B V Apparatus and method for projecting an array of multiple charged particle beamlets on a sample
US11257657B2 (en) * 2020-02-18 2022-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with interferometer for height measurement
KR20250144502A (ko) * 2020-02-21 2025-10-10 에이에스엠엘 네델란즈 비.브이. 검사 장치
EP3882951A1 (en) * 2020-03-19 2021-09-22 FEI Company Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets
US11380511B2 (en) * 2020-03-24 2022-07-05 Fei Company Charged particle beam source
DE102020115183A1 (de) * 2020-06-08 2021-12-09 Carl Zeiss Multisem Gmbh Teilchenstrahlsystem mit Multiquellensystem
EP3937205A1 (en) * 2020-07-06 2022-01-12 ASML Netherlands B.V. Charged-particle multi-beam column, charged-particle multi-beam column array, inspection method
EP4214736A2 (en) * 2020-09-17 2023-07-26 ASML Netherlands B.V. Charged particle assessment tool, inspection method
US11699564B2 (en) * 2020-10-23 2023-07-11 Nuflare Technology, Inc. Schottky thermal field emitter with integrated beam splitter
WO2022136064A1 (en) 2020-12-23 2022-06-30 Asml Netherlands B.V. Charged particle optical device
US11705301B2 (en) * 2021-01-19 2023-07-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam manipulation device and method for manipulating charged particle beamlets
US11869743B2 (en) * 2021-05-11 2024-01-09 Kla Corporation High throughput multi-electron beam system
EP4095881A1 (en) * 2021-05-25 2022-11-30 ASML Netherlands B.V. Charged particle device
JP7680923B2 (ja) * 2021-09-16 2025-05-21 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams
JP7105022B1 (ja) 2022-03-31 2022-07-22 株式会社Photo electron Soul 電子銃、電子線適用装置およびマルチ電子ビームの形成方法
US20240212968A1 (en) * 2022-12-23 2024-06-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Lens for a charged particle beam apparatus, charged particle beam apparatus, and method of focusing a charged particle beam
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CN119517703B (zh) * 2024-11-15 2025-10-31 深圳后浪实验室科技有限公司 一种离子束聚焦系统

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Also Published As

Publication number Publication date
JP2019536250A (ja) 2019-12-12
KR20190089963A (ko) 2019-07-31
JP6728498B2 (ja) 2020-07-22
US20180158642A1 (en) 2018-06-07
CN110214361A (zh) 2019-09-06
TWI709992B (zh) 2020-11-11
WO2018099854A1 (en) 2018-06-07
EP3549153A1 (en) 2019-10-09
TW201833968A (zh) 2018-09-16
KR102179897B1 (ko) 2020-11-19
US10453645B2 (en) 2019-10-22

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