TWI488212B - 用以在帶電粒子束裝置中改進對比度以檢驗樣品之配置及方法 - Google Patents

用以在帶電粒子束裝置中改進對比度以檢驗樣品之配置及方法 Download PDF

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Publication number
TWI488212B
TWI488212B TW100127092A TW100127092A TWI488212B TW I488212 B TWI488212 B TW I488212B TW 100127092 A TW100127092 A TW 100127092A TW 100127092 A TW100127092 A TW 100127092A TW I488212 B TWI488212 B TW I488212B
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TW
Taiwan
Prior art keywords
particle beam
charged particle
detector
group
sample
Prior art date
Application number
TW100127092A
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English (en)
Chinese (zh)
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TW201241864A (en
Inventor
Pavel Adamec
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Integrated Circuit Testing
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Application filed by Integrated Circuit Testing filed Critical Integrated Circuit Testing
Publication of TW201241864A publication Critical patent/TW201241864A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW100127092A 2011-04-13 2011-07-29 用以在帶電粒子束裝置中改進對比度以檢驗樣品之配置及方法 TWI488212B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP11162291.6A EP2511939B1 (en) 2011-04-13 2011-04-13 Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen

Publications (2)

Publication Number Publication Date
TW201241864A TW201241864A (en) 2012-10-16
TWI488212B true TWI488212B (zh) 2015-06-11

Family

ID=44533263

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100127092A TWI488212B (zh) 2011-04-13 2011-07-29 用以在帶電粒子束裝置中改進對比度以檢驗樣品之配置及方法

Country Status (4)

Country Link
US (1) US8530837B2 (enExample)
EP (1) EP2511939B1 (enExample)
JP (1) JP5791028B2 (enExample)
TW (1) TWI488212B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI632586B (zh) * 2016-01-26 2018-08-11 美商英特爾公司 Charged particle beam lens device, charged particle beam cylinder, and charged particle beam exposure device
TWI747301B (zh) * 2019-06-13 2021-11-21 德商卡爾蔡司多重掃描電子顯微鏡有限公司 用於單個粒子束方位角偏轉的粒子束系統及粒子束系統中的方位角校正方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2879155B1 (en) * 2013-12-02 2018-04-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-beam system for high throughput EBI
CN106165054B (zh) * 2014-04-28 2018-08-28 株式会社日立高新技术 电子线装置
JP6689602B2 (ja) 2014-12-22 2020-04-28 カール ツァイス マイクロスコーピー エルエルシー 荷電粒子ビームシステム及び方法
EP3253799B1 (en) * 2015-02-05 2020-12-02 Molecular Templates, Inc. Multivalent cd20-binding molecules comprising shiga toxin a subunit effector regions and enriched compositions thereof
JP6967340B2 (ja) * 2016-09-13 2021-11-17 株式会社日立ハイテクサイエンス 複合ビーム装置
CN107240540A (zh) * 2017-06-22 2017-10-10 聚束科技（北京）有限公司 一种观察非导电或导电不均匀样品的方法和sem
CZ309855B6 (cs) 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem
DE102019203579A1 (de) * 2019-03-15 2020-09-17 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Teilchenstrahlgeräts sowie Teilchenstrahlgerät zur Durchführung des Verfahrens
JP7199290B2 (ja) 2019-04-08 2023-01-05 株式会社日立ハイテク パターン断面形状推定システム、およびプログラム
CN115428116A (zh) 2020-04-10 2022-12-02 Asml荷兰有限公司 具有多个检测器的带电粒子束装置和成像方法
CN113035675A (zh) * 2021-02-26 2021-06-25 中国科学院生物物理研究所 带电粒子束设备

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030230714A1 (en) * 2002-05-15 2003-12-18 Akira Yonezawa Electron beam apparatus
US20050045821A1 (en) * 2003-04-22 2005-03-03 Nobuharu Noji Testing apparatus using charged particles and device manufacturing method using the testing apparatus
EP2219204A1 (en) * 2009-02-12 2010-08-18 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen
TWI330861B (en) * 2005-03-17 2010-09-21 Integrated Circuit Testing Analysing system and charged particle beam device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189855A (ja) * 1984-03-12 1985-09-27 Hitachi Ltd ２次電子検出器
US5644132A (en) 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
DE19980548D2 (de) 1998-04-01 2001-07-12 Juergen Wolfrum Verfahren und Vorrichtung zur Quantifizierung von DNA und RNA
DE19828476A1 (de) 1998-06-26 1999-12-30 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät
US7135676B2 (en) * 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030230714A1 (en) * 2002-05-15 2003-12-18 Akira Yonezawa Electron beam apparatus
US20050045821A1 (en) * 2003-04-22 2005-03-03 Nobuharu Noji Testing apparatus using charged particles and device manufacturing method using the testing apparatus
TWI330861B (en) * 2005-03-17 2010-09-21 Integrated Circuit Testing Analysing system and charged particle beam device
EP2219204A1 (en) * 2009-02-12 2010-08-18 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI632586B (zh) * 2016-01-26 2018-08-11 美商英特爾公司 Charged particle beam lens device, charged particle beam cylinder, and charged particle beam exposure device
TWI747301B (zh) * 2019-06-13 2021-11-21 德商卡爾蔡司多重掃描電子顯微鏡有限公司 用於單個粒子束方位角偏轉的粒子束系統及粒子束系統中的方位角校正方法
US12249478B2 (en) 2019-06-13 2025-03-11 Carl Zeiss Multisem Gmbh Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system

Also Published As

Publication number Publication date
US8530837B2 (en) 2013-09-10
JP5791028B2 (ja) 2015-10-07
EP2511939A1 (en) 2012-10-17
JP2012221942A (ja) 2012-11-12
US20120261573A1 (en) 2012-10-18
EP2511939B1 (en) 2016-03-23
TW201241864A (en) 2012-10-16

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