JP5791028B2 - 試料を検査する荷電粒子ビーム装置のコントラストを向上させる装置及び方法 - Google Patents

試料を検査する荷電粒子ビーム装置のコントラストを向上させる装置及び方法 Download PDF

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JP5791028B2
JP5791028B2 JP2011183390A JP2011183390A JP5791028B2 JP 5791028 B2 JP5791028 B2 JP 5791028B2 JP 2011183390 A JP2011183390 A JP 2011183390A JP 2011183390 A JP2011183390 A JP 2011183390A JP 5791028 B2 JP5791028 B2 JP 5791028B2
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charged particle
particle beam
sample
group
aperture
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Japanese (ja)
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JP2012221942A (ja
JP2012221942A5 (enExample
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アダメック パヴェル
アダメック パヴェル
Original Assignee
アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
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Application filed by アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー, アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー filed Critical アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
Publication of JP2012221942A publication Critical patent/JP2012221942A/ja
Publication of JP2012221942A5 publication Critical patent/JP2012221942A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2011183390A 2011-04-13 2011-08-25 試料を検査する荷電粒子ビーム装置のコントラストを向上させる装置及び方法 Expired - Fee Related JP5791028B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP11162291.6 2011-04-13
EP11162291.6A EP2511939B1 (en) 2011-04-13 2011-04-13 Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen

Publications (3)

Publication Number Publication Date
JP2012221942A JP2012221942A (ja) 2012-11-12
JP2012221942A5 JP2012221942A5 (enExample) 2014-10-09
JP5791028B2 true JP5791028B2 (ja) 2015-10-07

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ID=44533263

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JP2011183390A Expired - Fee Related JP5791028B2 (ja) 2011-04-13 2011-08-25 試料を検査する荷電粒子ビーム装置のコントラストを向上させる装置及び方法

Country Status (4)

Country Link
US (1) US8530837B2 (enExample)
EP (1) EP2511939B1 (enExample)
JP (1) JP5791028B2 (enExample)
TW (1) TWI488212B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200118756A (ko) * 2019-04-08 2020-10-16 주식회사 히타치하이테크 패턴 단면 형상 추정 시스템, 및 프로그램

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2879155B1 (en) * 2013-12-02 2018-04-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-beam system for high throughput EBI
CN106165054B (zh) * 2014-04-28 2018-08-28 株式会社日立高新技术 电子线装置
JP6689602B2 (ja) 2014-12-22 2020-04-28 カール ツァイス マイクロスコーピー エルエルシー 荷電粒子ビームシステム及び方法
EP3253799B1 (en) * 2015-02-05 2020-12-02 Molecular Templates, Inc. Multivalent cd20-binding molecules comprising shiga toxin a subunit effector regions and enriched compositions thereof
JP2017135218A (ja) * 2016-01-26 2017-08-03 株式会社アドバンテスト 荷電粒子ビームレンズ装置、荷電粒子ビームカラム、および荷電粒子ビーム露光装置
JP6967340B2 (ja) * 2016-09-13 2021-11-17 株式会社日立ハイテクサイエンス 複合ビーム装置
CN107240540A (zh) * 2017-06-22 2017-10-10 聚束科技（北京）有限公司 一种观察非导电或导电不均匀样品的方法和sem
CZ309855B6 (cs) 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem
DE102019203579A1 (de) * 2019-03-15 2020-09-17 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Teilchenstrahlgeräts sowie Teilchenstrahlgerät zur Durchführung des Verfahrens
DE102019004124B4 (de) 2019-06-13 2024-03-21 Carl Zeiss Multisem Gmbh Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System
CN115428116A (zh) 2020-04-10 2022-12-02 Asml荷兰有限公司 具有多个检测器的带电粒子束装置和成像方法
CN113035675A (zh) * 2021-02-26 2021-06-25 中国科学院生物物理研究所 带电粒子束设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189855A (ja) * 1984-03-12 1985-09-27 Hitachi Ltd ２次電子検出器
US5644132A (en) 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
DE19980548D2 (de) 1998-04-01 2001-07-12 Juergen Wolfrum Verfahren und Vorrichtung zur Quantifizierung von DNA und RNA
DE19828476A1 (de) 1998-06-26 1999-12-30 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät
US7135676B2 (en) * 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
US7138629B2 (en) * 2003-04-22 2006-11-21 Ebara Corporation Testing apparatus using charged particles and device manufacturing method using the testing apparatus
EP1703537B9 (en) 2005-03-17 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Analysing system and charged particle beam device
EP2219204B1 (en) * 2009-02-12 2012-03-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200118756A (ko) * 2019-04-08 2020-10-16 주식회사 히타치하이테크 패턴 단면 형상 추정 시스템, 및 프로그램
US11211226B2 (en) 2019-04-08 2021-12-28 Hitachi High-Tech Corporation Pattern cross-sectional shape estimation system and program
KR102369791B1 (ko) * 2019-04-08 2022-03-03 주식회사 히타치하이테크 패턴 단면 형상 추정 시스템, 및 프로그램

Also Published As

Publication number Publication date
US8530837B2 (en) 2013-09-10
EP2511939A1 (en) 2012-10-17
JP2012221942A (ja) 2012-11-12
TWI488212B (zh) 2015-06-11
US20120261573A1 (en) 2012-10-18
EP2511939B1 (en) 2016-03-23
TW201241864A (en) 2012-10-16

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