JP2009252854A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2009252854A5 JP2009252854A5 JP2008096699A JP2008096699A JP2009252854A5 JP 2009252854 A5 JP2009252854 A5 JP 2009252854A5 JP 2008096699 A JP2008096699 A JP 2008096699A JP 2008096699 A JP2008096699 A JP 2008096699A JP 2009252854 A5 JP2009252854 A5 JP 2009252854A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- charged particle
- inspection apparatus
- image
- probe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000523 sample Substances 0.000 claims 113
- 238000007689 inspection Methods 0.000 claims 35
- 239000002245 particle Substances 0.000 claims 33
- 230000003287 optical effect Effects 0.000 claims 8
- 230000001678 irradiating effect Effects 0.000 claims 5
- 230000001133 acceleration Effects 0.000 claims 2
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008096699A JP5459973B2 (ja) | 2008-04-03 | 2008-04-03 | 試料検査装置 |
| US12/416,914 US7989766B2 (en) | 2008-04-03 | 2009-04-01 | Sample inspection apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008096699A JP5459973B2 (ja) | 2008-04-03 | 2008-04-03 | 試料検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009252854A JP2009252854A (ja) | 2009-10-29 |
| JP2009252854A5 true JP2009252854A5 (enExample) | 2011-06-16 |
| JP5459973B2 JP5459973B2 (ja) | 2014-04-02 |
Family
ID=41132389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008096699A Active JP5459973B2 (ja) | 2008-04-03 | 2008-04-03 | 試料検査装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7989766B2 (enExample) |
| JP (1) | JP5459973B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5315076B2 (ja) * | 2009-02-06 | 2013-10-16 | 株式会社日立ハイテクノロジーズ | 電子線の影響を考慮した半導体検査方法及び装置 |
| JP5481401B2 (ja) * | 2011-01-14 | 2014-04-23 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
| US9485846B2 (en) * | 2011-05-20 | 2016-11-01 | Hermes Microvision Inc. | Method and system for inspecting an EUV mask |
| US9859089B2 (en) * | 2011-05-20 | 2018-01-02 | Hermes Microvision Inc. | Method and system for inspecting and grounding an EUV mask |
| JP2016042037A (ja) * | 2014-08-14 | 2016-03-31 | 富士通株式会社 | 評価方法及び装置、並びにプログラム |
| TW201704766A (zh) * | 2015-03-19 | 2017-02-01 | 帝喜科技股份有限公司 | 加熱粒子束以識別缺陷 |
| CN107923939B (zh) | 2015-09-02 | 2021-11-19 | 株式会社日立高新技术 | 电路检查方法以及样品检查装置 |
| KR102592921B1 (ko) * | 2015-12-31 | 2023-10-23 | 삼성전자주식회사 | 패턴 결함 검사 방법 |
| WO2019042905A1 (en) | 2017-08-31 | 2019-03-07 | Asml Netherlands B.V. | ELECTRON BEAM INSPECTION TOOL |
| DE102017120408B4 (de) * | 2017-09-05 | 2020-11-19 | scia Systems GmbH | Verfahren und Anordnung zum Ermitteln eines elektrischen Potentials und zum Ermitteln einer Verteilungsdichtefunktion eines Stromes von einem Strahl von Teilchen |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001063660A1 (en) * | 2000-02-25 | 2001-08-30 | Hitachi, Ltd. | Apparatus for detecting defect in device and method of detecting defect |
| JP2002353279A (ja) * | 2001-05-25 | 2002-12-06 | Hitachi Ltd | 回路パターン検査方法とその装置 |
| JP3955445B2 (ja) * | 2001-06-11 | 2007-08-08 | 株式会社ルネサステクノロジ | 半導体装置の検査方法及び試料検査装置 |
| JP2003086913A (ja) | 2001-09-11 | 2003-03-20 | Brother Ind Ltd | フレキシブル配線基板の接続構造及び接続方法 |
| JP2004296771A (ja) * | 2003-03-27 | 2004-10-21 | Renesas Technology Corp | 半導体検査装置及び検査方法 |
| JP4248465B2 (ja) * | 2004-09-03 | 2009-04-02 | 日本電子株式会社 | 荷電粒子ビーム装置及び荷電粒子ビーム装置の制御方法 |
| JP2006105960A (ja) * | 2004-09-13 | 2006-04-20 | Jeol Ltd | 試料検査方法及び試料検査装置 |
| JP4467588B2 (ja) | 2007-02-28 | 2010-05-26 | 株式会社日立ハイテクノロジーズ | 試料検査装置及び吸収電流像の作成方法 |
-
2008
- 2008-04-03 JP JP2008096699A patent/JP5459973B2/ja active Active
-
2009
- 2009-04-01 US US12/416,914 patent/US7989766B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2009252854A5 (enExample) | ||
| CN113936983B (zh) | 用于物体的粒子光学检查的粒子束系统和方法 | |
| CN104903710B (zh) | 检测样品表面的装置和方法 | |
| JP5269041B2 (ja) | X線撮像装置およびx線撮像方法 | |
| EP2508903A3 (en) | Inspection device using secondary charged particle detection | |
| JP2016081929A5 (enExample) | ||
| JP2016045206A5 (enExample) | ||
| JP2012118061A5 (enExample) | ||
| JP2010199002A5 (enExample) | ||
| RU2011153725A (ru) | Система визуализации с массивом из множества детекторов | |
| JP2012104426A5 (enExample) | ||
| US8901510B2 (en) | Particle beam device having a detector arrangement | |
| JP2013101918A5 (enExample) | ||
| JP2015511405A5 (enExample) | ||
| JP2004014485A5 (enExample) | ||
| US9857318B2 (en) | Method for generating image data relating to an object and particle beam device for carrying out this method | |
| JP2007180403A5 (enExample) | ||
| JPWO2016047538A1 (ja) | エネルギー弁別電子検出器及びそれを用いた走査電子顕微鏡 | |
| JP2009156788A5 (ja) | X線検査装置 | |
| TWI582449B (zh) | 用於決定飛行物體軌跡的測量配置 | |
| TWI735805B (zh) | 檢測樣本之設備及方法及電腦程式產品 | |
| JP2013140846A5 (enExample) | ||
| JP5489412B2 (ja) | 蛍光x線分析機能付き高分解能x線顕微装置 | |
| RU152734U1 (ru) | Устройство для измерения профилей протонных пучков ускорителей высоких энергий | |
| KR101389428B1 (ko) | 엘디브이 시스템을 이용한 핵융합장치의 진동 측정 시스템 |