JP2013140846A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013140846A5 JP2013140846A5 JP2011289888A JP2011289888A JP2013140846A5 JP 2013140846 A5 JP2013140846 A5 JP 2013140846A5 JP 2011289888 A JP2011289888 A JP 2011289888A JP 2011289888 A JP2011289888 A JP 2011289888A JP 2013140846 A5 JP2013140846 A5 JP 2013140846A5
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- reference mark
- distance
- substrate
- drawing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 11
- 238000005259 measurement Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011289888A JP2013140846A (ja) | 2011-12-28 | 2011-12-28 | 描画装置及び物品の製造方法 |
| US13/721,540 US20130171570A1 (en) | 2011-12-28 | 2012-12-20 | Drawing apparatus, and method of manufacturing article |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011289888A JP2013140846A (ja) | 2011-12-28 | 2011-12-28 | 描画装置及び物品の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013140846A JP2013140846A (ja) | 2013-07-18 |
| JP2013140846A5 true JP2013140846A5 (enExample) | 2015-02-19 |
Family
ID=48695065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011289888A Pending JP2013140846A (ja) | 2011-12-28 | 2011-12-28 | 描画装置及び物品の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20130171570A1 (enExample) |
| JP (1) | JP2013140846A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5506560B2 (ja) * | 2010-06-18 | 2014-05-28 | キヤノン株式会社 | 描画装置及びデバイス製造方法 |
| JP2014220263A (ja) * | 2013-04-30 | 2014-11-20 | キヤノン株式会社 | リソグラフィ装置、及び物品の製造方法 |
| JP2014220262A (ja) * | 2013-04-30 | 2014-11-20 | キヤノン株式会社 | リソグラフィ装置、リソグラフィ方法、及びデバイスの製造方法 |
| JP2015128132A (ja) * | 2013-11-28 | 2015-07-09 | キヤノン株式会社 | 描画データの作成方法、描画装置、描画方法、及び物品の製造方法 |
| JP6640497B2 (ja) * | 2015-09-01 | 2020-02-05 | 株式会社日立ハイテクサイエンス | 試料ホルダ及び試料ホルダ群 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2960746B2 (ja) * | 1990-03-15 | 1999-10-12 | 株式会社日立製作所 | ビーム照射方法および電子ビーム描画方法とビーム照射装置並びに電子ビーム描画装置 |
| JP2004158559A (ja) * | 2002-11-05 | 2004-06-03 | Nikon Corp | フィデューシャルマーク及びそれを有する露光装置 |
| JP2004241652A (ja) * | 2003-02-06 | 2004-08-26 | Nikon Corp | 基準マーク体及びそれを有する露光装置 |
| JP5744601B2 (ja) * | 2010-04-20 | 2015-07-08 | キヤノン株式会社 | 電子線描画装置及びデバイス製造方法 |
| JP5506560B2 (ja) * | 2010-06-18 | 2014-05-28 | キヤノン株式会社 | 描画装置及びデバイス製造方法 |
| JP2014220263A (ja) * | 2013-04-30 | 2014-11-20 | キヤノン株式会社 | リソグラフィ装置、及び物品の製造方法 |
-
2011
- 2011-12-28 JP JP2011289888A patent/JP2013140846A/ja active Pending
-
2012
- 2012-12-20 US US13/721,540 patent/US20130171570A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| HK1213642A1 (zh) | 曝光装置及曝光方法、以及元件制造方法 | |
| JP2012004461A5 (enExample) | ||
| EP2397906A3 (en) | Lithography apparatus and device manufacturing method | |
| JP2012517035A5 (enExample) | ||
| EP2669739A3 (en) | Measuring method, and exposure method and apparatus | |
| JP2015513219A5 (enExample) | ||
| TW200707088A (en) | Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method | |
| JP2013140846A5 (enExample) | ||
| WO2012141544A3 (ko) | Tsv 측정용 간섭계 및 이를 이용한 측정방법 | |
| WO2013189724A3 (en) | Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method | |
| WO2013132081A3 (en) | Lithography system and method for processing a target, such as a wafer | |
| WO2012117353A3 (en) | Method and apparatus for measuring the thickness of a transparent object in an automatic production line | |
| EP2833107A3 (en) | Wavefront measurement method, shape measurement method, optical element manufacturing method, optical apparatus manufacturing method, program, and wavefront measurement apparatus | |
| PH12018501598A1 (en) | Method and system for optical three-dimensional topography measurement | |
| WO2013151421A3 (en) | Integrated optical and charged particle inspection apparatus | |
| WO2012006558A3 (en) | Charged particle beam processing system with visual and infrared imaging | |
| WO2012041461A3 (en) | Projection exposure tool for microlithography and method for microlithographic exposure | |
| EP2587224A3 (en) | Displacement detecting device, scale calibrating method and scale calibrating program | |
| JP2011040547A5 (enExample) | ||
| WO2013009065A3 (ko) | 엘이디 부품의 3차원비전검사장치 및 비전검사방법 | |
| EP2947512A3 (en) | Lithography apparatus, determination method, and method of manufacturing article | |
| JP2016517631A5 (enExample) | ||
| JP2015017811A5 (enExample) | ||
| JP2012108476A5 (enExample) | ||
| JP2009252854A5 (enExample) |