JP2010199002A5 - - Google Patents

Download PDF

Info

Publication number
JP2010199002A5
JP2010199002A5 JP2009045048A JP2009045048A JP2010199002A5 JP 2010199002 A5 JP2010199002 A5 JP 2010199002A5 JP 2009045048 A JP2009045048 A JP 2009045048A JP 2009045048 A JP2009045048 A JP 2009045048A JP 2010199002 A5 JP2010199002 A5 JP 2010199002A5
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
detector
sample
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009045048A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010199002A (ja
JP5103422B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009045048A priority Critical patent/JP5103422B2/ja
Priority claimed from JP2009045048A external-priority patent/JP5103422B2/ja
Priority to US13/202,554 priority patent/US8610060B2/en
Priority to PCT/JP2009/005581 priority patent/WO2010097861A1/ja
Publication of JP2010199002A publication Critical patent/JP2010199002A/ja
Publication of JP2010199002A5 publication Critical patent/JP2010199002A5/ja
Application granted granted Critical
Publication of JP5103422B2 publication Critical patent/JP5103422B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2009045048A 2009-02-27 2009-02-27 荷電粒子ビーム装置 Expired - Fee Related JP5103422B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009045048A JP5103422B2 (ja) 2009-02-27 2009-02-27 荷電粒子ビーム装置
US13/202,554 US8610060B2 (en) 2009-02-27 2009-10-23 Charged particle beam device
PCT/JP2009/005581 WO2010097861A1 (ja) 2009-02-27 2009-10-23 荷電粒子ビーム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009045048A JP5103422B2 (ja) 2009-02-27 2009-02-27 荷電粒子ビーム装置

Publications (3)

Publication Number Publication Date
JP2010199002A JP2010199002A (ja) 2010-09-09
JP2010199002A5 true JP2010199002A5 (enExample) 2011-08-04
JP5103422B2 JP5103422B2 (ja) 2012-12-19

Family

ID=42665088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009045048A Expired - Fee Related JP5103422B2 (ja) 2009-02-27 2009-02-27 荷電粒子ビーム装置

Country Status (3)

Country Link
US (1) US8610060B2 (enExample)
JP (1) JP5103422B2 (enExample)
WO (1) WO2010097861A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5612493B2 (ja) * 2010-03-18 2014-10-22 株式会社日立ハイテクサイエンス 複合荷電粒子ビーム装置
DE102010024625A1 (de) * 2010-06-22 2011-12-22 Carl Zeiss Nts Gmbh Verfahren zum Bearbeiten eines Objekts
JP5517790B2 (ja) * 2010-07-02 2014-06-11 株式会社キーエンス 拡大観察装置
JP5690086B2 (ja) * 2010-07-02 2015-03-25 株式会社キーエンス 拡大観察装置
DE102011006588A1 (de) * 2011-03-31 2012-10-04 Carl Zeiss Nts Gmbh Teilchenstrahlgerät mit Detektoranordnung
KR101843042B1 (ko) * 2012-01-11 2018-03-28 삼성전자주식회사 반도체 기판 검사 장비 및 이를 이용한 반도체 기판 검사 방법
JP5852474B2 (ja) * 2012-03-01 2016-02-03 株式会社日立ハイテクノロジーズ 荷電粒子線装置
EP2722866A1 (en) * 2012-10-22 2014-04-23 Fei Company Configurable charged-particle beam apparatus
JP5856574B2 (ja) * 2013-02-13 2016-02-10 株式会社東芝 試料加工方法
EP2816585A1 (en) * 2013-06-17 2014-12-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam system and method of operating thereof
JPWO2015118605A1 (ja) * 2014-02-04 2017-03-23 富士通株式会社 材料評価装置及び方法
US10354836B2 (en) * 2014-03-09 2019-07-16 Ib Labs, Inc. Methods, apparatuses, systems and software for treatment of a specimen by ion-milling
US11024481B2 (en) * 2016-03-04 2021-06-01 Fei Company Scanning electron microscope
JP2017198588A (ja) * 2016-04-28 2017-11-02 株式会社ニューフレアテクノロジー パターン検査装置
US11094501B2 (en) * 2019-11-19 2021-08-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Secondary charged particle imaging system

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56132756A (en) * 1980-03-19 1981-10-17 Hitachi Ltd Secondary electron detector
JPS59201356A (ja) * 1983-04-30 1984-11-14 Shimadzu Corp 走査型電子顕微鏡
JP4178741B2 (ja) 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
JP2004039453A (ja) * 2002-07-03 2004-02-05 Seiko Instruments Inc 微細ステンシル構造修正装置
JP2008210702A (ja) * 2007-02-27 2008-09-11 Hitachi High-Technologies Corp 荷電粒子ビーム装置及び印加電圧制御方法
US7834315B2 (en) * 2007-04-23 2010-11-16 Omniprobe, Inc. Method for STEM sample inspection in a charged particle beam instrument
US8835845B2 (en) * 2007-06-01 2014-09-16 Fei Company In-situ STEM sample preparation
JP5352335B2 (ja) * 2009-04-28 2013-11-27 株式会社日立ハイテクノロジーズ 複合荷電粒子線装置
JP5612493B2 (ja) * 2010-03-18 2014-10-22 株式会社日立ハイテクサイエンス 複合荷電粒子ビーム装置
JP5690086B2 (ja) * 2010-07-02 2015-03-25 株式会社キーエンス 拡大観察装置
JP5517790B2 (ja) * 2010-07-02 2014-06-11 株式会社キーエンス 拡大観察装置

Similar Documents

Publication Publication Date Title
JP2010199002A5 (enExample)
JP2012527651A5 (enExample)
JP2012518804A5 (enExample)
WO2012009437A3 (en) High resolution autofocus inspection system
JP2014513319A5 (enExample)
WO2009078443A1 (ja) 露光装置、露光方法及びデバイス製造方法
WO2013151421A3 (en) Integrated optical and charged particle inspection apparatus
JP2009252854A5 (enExample)
WO2010014850A3 (en) Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
JP2011170161A5 (enExample)
JP2013207389A5 (enExample)
JP2012154742A5 (ja) トールボット干渉計及び撮像方法
JP2011039433A5 (enExample)
TW201614386A (en) Illumination system
JP2012108476A5 (enExample)
CN104749162A (zh) 共聚焦拉曼光谱仪及其光路装置
JP2010230612A5 (enExample)
JP2016045310A5 (enExample)
JP2012255738A5 (enExample)
FR2981148B1 (fr) Equipement de mesure pour le controle d'un indicateur de trajectoire d'approche pour l'atterrissage d'un avion, et dispositif de controle correspondant.
JP2011039389A5 (enExample)
CN106569254B (zh) 一种x射线掠入射镜头远距离光源对准装置及其对准方法
JP2013140846A5 (enExample)
CN103868680A (zh) 基于斑点干涉成像的地基望远镜离焦像差探测方法
JP2012050010A5 (enExample)