JP2013186018A5 - - Google Patents

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Publication number
JP2013186018A5
JP2013186018A5 JP2012052423A JP2012052423A JP2013186018A5 JP 2013186018 A5 JP2013186018 A5 JP 2013186018A5 JP 2012052423 A JP2012052423 A JP 2012052423A JP 2012052423 A JP2012052423 A JP 2012052423A JP 2013186018 A5 JP2013186018 A5 JP 2013186018A5
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JP
Japan
Prior art keywords
sensor
angle
light beam
optical axis
ray
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JP2012052423A
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English (en)
Japanese (ja)
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JP6000578B2 (ja
JP2013186018A (ja
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Priority to JP2012052423A priority Critical patent/JP6000578B2/ja
Priority claimed from JP2012052423A external-priority patent/JP6000578B2/ja
Priority to DE102013203882A priority patent/DE102013203882A1/de
Priority to US13/789,921 priority patent/US8947675B2/en
Publication of JP2013186018A publication Critical patent/JP2013186018A/ja
Publication of JP2013186018A5 publication Critical patent/JP2013186018A5/ja
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Publication of JP6000578B2 publication Critical patent/JP6000578B2/ja
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JP2012052423A 2012-03-09 2012-03-09 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法 Active JP6000578B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012052423A JP6000578B2 (ja) 2012-03-09 2012-03-09 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法
DE102013203882A DE102013203882A1 (de) 2012-03-09 2013-03-07 Verfahren zum Messen einer asphärischen Oberfläche, Vorrichtung zum Messen einer asphärischen Oberfläche, Vorrichtung zum Erzeugen eines optischen Elements und optisches Element
US13/789,921 US8947675B2 (en) 2012-03-09 2013-03-08 Aspheric surface measuring method, aspheric surface measuring apparatus, optical element producing apparatus and optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012052423A JP6000578B2 (ja) 2012-03-09 2012-03-09 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法

Publications (3)

Publication Number Publication Date
JP2013186018A JP2013186018A (ja) 2013-09-19
JP2013186018A5 true JP2013186018A5 (enExample) 2015-03-05
JP6000578B2 JP6000578B2 (ja) 2016-09-28

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ID=49029773

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JP2012052423A Active JP6000578B2 (ja) 2012-03-09 2012-03-09 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法

Country Status (3)

Country Link
US (1) US8947675B2 (enExample)
JP (1) JP6000578B2 (enExample)
DE (1) DE102013203882A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8913236B2 (en) * 2011-08-30 2014-12-16 Corning Incorporated Method and device for measuring freeform surfaces
JP5955001B2 (ja) * 2012-01-25 2016-07-20 キヤノン株式会社 非球面形状計測方法、形状計測プログラム及び形状計測装置
JP5896792B2 (ja) 2012-03-09 2016-03-30 キヤノン株式会社 非球面計測方法、非球面計測装置および光学素子加工装置
JP6000577B2 (ja) 2012-03-09 2016-09-28 キヤノン株式会社 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法
JP6429503B2 (ja) * 2014-06-16 2018-11-28 キヤノン株式会社 計測装置、計測方法、光学素子の加工装置、および、光学素子
JPWO2017119118A1 (ja) * 2016-01-08 2018-11-01 オリンパス株式会社 標本形状測定方法及び標本形状測定装置
CN110579877B (zh) * 2019-09-23 2024-03-26 中国科学院上海技术物理研究所 共轭校正检验非球面镜的光学系统及理论

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01291105A (ja) * 1988-05-18 1989-11-22 Ricoh Co Ltd 表面形状測定方法に於ける測定準備方法
JPH09329427A (ja) 1996-06-07 1997-12-22 Nikon Corp 非球面形状の測定方法
JPH11314184A (ja) * 1998-04-30 1999-11-16 Narukkusu Kk 光学素子加工装置
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
US6867913B2 (en) * 2000-02-14 2005-03-15 Carl Zeiss Smt Ag 6-mirror microlithography projection objective
US6449049B1 (en) * 2000-03-31 2002-09-10 Nanyang Technological University Profiling of aspheric surfaces using liquid crystal compensatory interferometry
US7106455B2 (en) * 2001-03-06 2006-09-12 Canon Kabushiki Kaisha Interferometer and interferance measurement method
JP2003050109A (ja) * 2001-08-07 2003-02-21 Nikon Corp 面形状測定装置および面形状測定方法
JP4312602B2 (ja) * 2001-11-16 2009-08-12 ザイゴ コーポレイション 非球面表面および波面の走査干渉計
US7612893B2 (en) * 2006-09-19 2009-11-03 Zygo Corporation Scanning interferometric methods and apparatus for measuring aspheric surfaces and wavefronts
JP2010164388A (ja) * 2009-01-14 2010-07-29 Canon Inc 測定方法及び測定装置
JP5394317B2 (ja) * 2010-05-17 2014-01-22 富士フイルム株式会社 回転対称非球面形状測定装置
JP6000577B2 (ja) 2012-03-09 2016-09-28 キヤノン株式会社 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法
JP5896792B2 (ja) 2012-03-09 2016-03-30 キヤノン株式会社 非球面計測方法、非球面計測装置および光学素子加工装置

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