JP2015023032A5 - - Google Patents
Info
- Publication number
- JP2015023032A5 JP2015023032A5 JP2014147844A JP2014147844A JP2015023032A5 JP 2015023032 A5 JP2015023032 A5 JP 2015023032A5 JP 2014147844 A JP2014147844 A JP 2014147844A JP 2014147844 A JP2014147844 A JP 2014147844A JP 2015023032 A5 JP2015023032 A5 JP 2015023032A5
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- detection
- signal beam
- opening
- type opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 claims 22
- 239000002245 particle Substances 0.000 claims 18
- 230000003287 optical effect Effects 0.000 claims 5
- 238000006073 displacement reaction Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13177207.1 | 2013-07-19 | ||
| EP13177207.1A EP2827136B1 (en) | 2013-07-19 | 2013-07-19 | Switchable multi perspective detector, optics therefore and method of operating thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015023032A JP2015023032A (ja) | 2015-02-02 |
| JP2015023032A5 true JP2015023032A5 (enExample) | 2015-04-30 |
| JP5805831B2 JP5805831B2 (ja) | 2015-11-10 |
Family
ID=48874128
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014147844A Active JP5805831B2 (ja) | 2013-07-19 | 2014-07-18 | 切り換え型マルチパースペクティブ検出器、切り換え型マルチパースペクティブ検出器用光学系、及び切り換え型マルチパースペクティブ検出器の動作方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8963083B2 (enExample) |
| EP (1) | EP2827136B1 (enExample) |
| JP (1) | JP5805831B2 (enExample) |
| TW (1) | TWI523064B (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9805908B2 (en) * | 2015-02-18 | 2017-10-31 | Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Signal charged particle deflection device, signal charged particle detection system, charged particle beam device and method of detection of a signal charged particle beam |
| US10643819B2 (en) | 2015-03-24 | 2020-05-05 | Kla-Tencor Corporation | Method and system for charged particle microscopy with improved image beam stabilization and interrogation |
| KR102441581B1 (ko) | 2015-06-03 | 2022-09-07 | 삼성전자주식회사 | 표면 검사 방법 및 이를 이용한 포토 마스크의 검사 방법 |
| US10103004B2 (en) * | 2015-07-02 | 2018-10-16 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | System and method for imaging a secondary charged particle beam with adaptive secondary charged particle optics |
| CN108738343B (zh) * | 2015-11-30 | 2022-02-01 | Asml荷兰有限公司 | 多个带电粒子束的设备 |
| CN112055886A (zh) * | 2018-02-27 | 2020-12-08 | 卡尔蔡司MultiSEM有限责任公司 | 带电粒子多束系统及方法 |
| JP7085258B2 (ja) * | 2018-04-13 | 2022-06-16 | 株式会社ホロン | 超高速電子検出器および該検出器を組み込んだ走査型電子ビーム検査装置 |
| US20230112447A1 (en) * | 2020-03-11 | 2023-04-13 | Asml Netherlands B.V. | Systems and methods for signal electron detection |
| CN111948697B (zh) * | 2020-07-08 | 2022-11-08 | 中国科学院国家空间科学中心 | 一种星载中能电子探测器 |
| US20230377831A1 (en) * | 2020-09-22 | 2023-11-23 | Asml Netherlands B.V. | Anti-scanning operation mode of secondary-electron projection imaging system for apparatus with plurality of beamlets |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5818851A (ja) * | 1981-07-24 | 1983-02-03 | Hitachi Ltd | 反射電子検出装置 |
| JPH0614453B2 (ja) * | 1983-06-30 | 1994-02-23 | 三菱電機株式会社 | カラ−受像管 |
| US4894212A (en) | 1987-07-20 | 1990-01-16 | Mobil Oil Corp. | Synthesis of crystalline silicate ZSM-11 |
| JPH0547334A (ja) * | 1991-08-12 | 1993-02-26 | Shimadzu Corp | 2次元電子分光装置 |
| US5892224A (en) * | 1996-05-13 | 1999-04-06 | Nikon Corporation | Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams |
| JP3767341B2 (ja) * | 2000-07-21 | 2006-04-19 | 株式会社日立製作所 | 電子線を用いたパターン検査方法及びその装置 |
| EP1271605A4 (en) * | 2000-11-02 | 2009-09-02 | Ebara Corp | ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING SAID APPARATUS |
| JP3906866B2 (ja) * | 2005-08-18 | 2007-04-18 | 株式会社日立製作所 | 荷電粒子ビーム検査装置 |
| EP2654069B1 (en) * | 2012-04-16 | 2016-02-24 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multi channel detector, optics therefore and method of operating thereof |
| EP2654068B1 (en) * | 2012-04-16 | 2017-05-17 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Switchable multi perspective detector, optics therefore and method of operating thereof |
-
2013
- 2013-07-19 EP EP13177207.1A patent/EP2827136B1/en active Active
- 2013-08-06 US US13/960,393 patent/US8963083B2/en active Active
-
2014
- 2014-07-10 TW TW103123813A patent/TWI523064B/zh active
- 2014-07-18 JP JP2014147844A patent/JP5805831B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2015023032A5 (enExample) | ||
| JP2018509741A5 (enExample) | ||
| WO2016036246A3 (en) | Multi electron beam inspection apparatus | |
| WO2012112894A3 (en) | Focusing a charged particle imaging system | |
| TWI751193B (zh) | 於多行掃描電子顯微鏡系統中用於校正陣列散光之裝置及方法 | |
| TWI603363B (zh) | 二次帶電粒子偵測系統、帶電粒子束裝置及偵測二次帶電粒子的方法 | |
| JP6942709B2 (ja) | マルチビームツールを用いた後方散乱電子(bse)イメージング | |
| JP2012243802A5 (enExample) | ||
| JP2012243803A5 (enExample) | ||
| KR20190126326A (ko) | 하전 입자 빔 시스템 및 방법 | |
| MX378128B (es) | Limitación de ruido en detectores de luz utilizando una apertura. | |
| WO2012009543A4 (en) | Improved contrast for scanning confocal electron microscope | |
| WO2014188882A1 (ja) | 荷電粒子線応用装置 | |
| JP2014082211A5 (enExample) | ||
| US8471203B2 (en) | Particle-beam microscope | |
| US11513363B2 (en) | Speckle elimination apparatus, laser light source and laser projection system | |
| JP2014209482A5 (enExample) | ||
| WO2009003714A3 (de) | Vorrichtung und verfahren zur durchführung statischer und dynamischer streulichtmessungen in kleinen volumina | |
| SG10201807071TA (en) | An optical interference device | |
| JP2017517119A (ja) | 2重ウィーンフィルタ単色計を用いる電子ビーム画像化 | |
| JP2009252854A5 (enExample) | ||
| JP2019537228A5 (enExample) | ||
| WO2012076188A8 (en) | Euv lithography system | |
| JP2012014170A5 (enExample) | ||
| US9171694B2 (en) | Asymmetric electrostatic quadrupole deflector for improved field uniformity |