JP2019537228A5 - - Google Patents

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Publication number
JP2019537228A5
JP2019537228A5 JP2019530459A JP2019530459A JP2019537228A5 JP 2019537228 A5 JP2019537228 A5 JP 2019537228A5 JP 2019530459 A JP2019530459 A JP 2019530459A JP 2019530459 A JP2019530459 A JP 2019530459A JP 2019537228 A5 JP2019537228 A5 JP 2019537228A5
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JP
Japan
Prior art keywords
electro
optical system
deflector assembly
strength
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2019530459A
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English (en)
Japanese (ja)
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JP2019537228A (ja
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Publication date
Priority claimed from US15/371,557 external-priority patent/US10090131B2/en
Application filed filed Critical
Publication of JP2019537228A publication Critical patent/JP2019537228A/ja
Publication of JP2019537228A5 publication Critical patent/JP2019537228A5/ja
Priority to JP2022018557A priority Critical patent/JP7194849B2/ja
Pending legal-status Critical Current

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JP2019530459A 2016-12-07 2017-12-06 電子ビームシステムにおける収差補正方法及びシステム Pending JP2019537228A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022018557A JP7194849B2 (ja) 2016-12-07 2022-02-09 電子光学システム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/371,557 2016-12-07
US15/371,557 US10090131B2 (en) 2016-12-07 2016-12-07 Method and system for aberration correction in an electron beam system
PCT/US2017/064958 WO2018106833A1 (en) 2016-12-07 2017-12-06 Method and system for aberration correction in electron beam system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022018557A Division JP7194849B2 (ja) 2016-12-07 2022-02-09 電子光学システム

Publications (2)

Publication Number Publication Date
JP2019537228A JP2019537228A (ja) 2019-12-19
JP2019537228A5 true JP2019537228A5 (enExample) 2021-01-21

Family

ID=62243018

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2019530459A Pending JP2019537228A (ja) 2016-12-07 2017-12-06 電子ビームシステムにおける収差補正方法及びシステム
JP2022018557A Active JP7194849B2 (ja) 2016-12-07 2022-02-09 電子光学システム

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022018557A Active JP7194849B2 (ja) 2016-12-07 2022-02-09 電子光学システム

Country Status (7)

Country Link
US (1) US10090131B2 (enExample)
EP (1) EP3552222A4 (enExample)
JP (2) JP2019537228A (enExample)
KR (1) KR102325235B1 (enExample)
CN (1) CN110036456B (enExample)
TW (1) TWI743262B (enExample)
WO (1) WO2018106833A1 (enExample)

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US10338013B1 (en) * 2018-01-25 2019-07-02 Kla-Tencor Corporation Position feedback for multi-beam particle detector
JP7265646B2 (ja) * 2019-03-27 2023-04-26 エーエスエムエル ネザーランズ ビー．ブイ． マルチビーム検査装置における二次ビームのアライメントのためのシステム及び方法
US11791128B2 (en) * 2021-10-13 2023-10-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method of determining the beam convergence of a focused charged particle beam, and charged particle beam system
US12165831B2 (en) 2022-05-31 2024-12-10 Kla Corporation Method and system of image-forming multi-electron beams
US12283453B2 (en) 2022-06-01 2025-04-22 Kla Corporation Creating multiple electron beams with a photocathode film
US20250357066A1 (en) * 2024-05-17 2025-11-20 Kla Corporation Electron beam metrology having a source energy spread with filtered tails
US20250357067A1 (en) * 2024-05-17 2025-11-20 Kla Corporation Aberration corrector for scanning electron microscope with multiple electron beams

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KR19980079377A (ko) * 1997-03-25 1998-11-25 요시다쇼이치로 하전립자선 전사장치
US6452175B1 (en) * 1999-04-15 2002-09-17 Applied Materials, Inc. Column for charged particle beam device
US6552340B1 (en) * 2000-10-12 2003-04-22 Nion Co. Autoadjusting charged-particle probe-forming apparatus
DE10061798A1 (de) * 2000-12-12 2002-06-13 Leo Elektronenmikroskopie Gmbh Monochromator für geladene Teilchen
JP4103345B2 (ja) * 2001-06-12 2008-06-18 株式会社日立製作所 荷電粒子線装置
US6723997B2 (en) * 2001-10-26 2004-04-20 Jeol Ltd. Aberration corrector for instrument utilizing charged-particle beam
JP3914750B2 (ja) * 2001-11-20 2007-05-16 日本電子株式会社 収差補正装置を備えた荷電粒子線装置
US6924488B2 (en) * 2002-06-28 2005-08-02 Jeol Ltd. Charged-particle beam apparatus equipped with aberration corrector
JP4310250B2 (ja) * 2004-08-30 2009-08-05 株式会社日立ハイテクノロジーズ 荷電粒子線調整方法及び荷電粒子線装置
JP4922747B2 (ja) * 2006-12-19 2012-04-25 日本電子株式会社 荷電粒子ビーム装置
JP5250350B2 (ja) * 2008-09-12 2013-07-31 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
EP2325862A1 (en) * 2009-11-18 2011-05-25 Fei Company Corrector for axial aberrations of a particle-optical lens
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US8921782B2 (en) * 2012-11-30 2014-12-30 Kla-Tencor Corporation Tilt-imaging scanning electron microscope
JP6265643B2 (ja) * 2013-07-31 2018-01-24 株式会社日立ハイテクノロジーズ 電子ビーム装置
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JP6254445B2 (ja) * 2014-01-09 2017-12-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
US9443696B2 (en) 2014-05-25 2016-09-13 Kla-Tencor Corporation Electron beam imaging with dual Wien-filter monochromator
JP6320186B2 (ja) * 2014-06-16 2018-05-09 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
JP6554288B2 (ja) 2015-01-26 2019-07-31 株式会社日立ハイテクノロジーズ 荷電粒子線装置
KR102387776B1 (ko) * 2015-05-08 2022-04-15 케이엘에이 코포레이션 전자빔 시스템의 수차 보정 방법 및 시스템
US10366862B2 (en) * 2015-09-21 2019-07-30 KLA-Tencor Corporaton Method and system for noise mitigation in a multi-beam scanning electron microscopy system

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