CN110036456B - 用于电子束系统中的像差校正的方法及系统 - Google Patents

用于电子束系统中的像差校正的方法及系统 Download PDF

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Publication number
CN110036456B
CN110036456B CN201780074833.4A CN201780074833A CN110036456B CN 110036456 B CN110036456 B CN 110036456B CN 201780074833 A CN201780074833 A CN 201780074833A CN 110036456 B CN110036456 B CN 110036456B
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China
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electron
wien filter
optical system
deflector assembly
electron beam
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Chinese (zh)
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CN110036456A (zh
Inventor
姜辛容
C·西尔斯
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KLA Corp
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KLA Tencor Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1508—Combined electrostatic-electromagnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201780074833.4A 2016-12-07 2017-12-06 用于电子束系统中的像差校正的方法及系统 Active CN110036456B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/371,557 2016-12-07
US15/371,557 US10090131B2 (en) 2016-12-07 2016-12-07 Method and system for aberration correction in an electron beam system
PCT/US2017/064958 WO2018106833A1 (en) 2016-12-07 2017-12-06 Method and system for aberration correction in electron beam system

Publications (2)

Publication Number Publication Date
CN110036456A CN110036456A (zh) 2019-07-19
CN110036456B true CN110036456B (zh) 2022-04-05

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CN201780074833.4A Active CN110036456B (zh) 2016-12-07 2017-12-06 用于电子束系统中的像差校正的方法及系统

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US (1) US10090131B2 (enExample)
EP (1) EP3552222A4 (enExample)
JP (2) JP2019537228A (enExample)
KR (1) KR102325235B1 (enExample)
CN (1) CN110036456B (enExample)
TW (1) TWI743262B (enExample)
WO (1) WO2018106833A1 (enExample)

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US10338013B1 (en) * 2018-01-25 2019-07-02 Kla-Tencor Corporation Position feedback for multi-beam particle detector
US12278081B2 (en) 2019-03-27 2025-04-15 Asml Netherlands B.V. System and method for alignment of secondary beams in multi-beam inspection apparatus
US11791128B2 (en) * 2021-10-13 2023-10-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method of determining the beam convergence of a focused charged particle beam, and charged particle beam system
US12165831B2 (en) 2022-05-31 2024-12-10 Kla Corporation Method and system of image-forming multi-electron beams
US12283453B2 (en) 2022-06-01 2025-04-22 Kla Corporation Creating multiple electron beams with a photocathode film
US20250357067A1 (en) * 2024-05-17 2025-11-20 Kla Corporation Aberration corrector for scanning electron microscope with multiple electron beams
US20250357066A1 (en) * 2024-05-17 2025-11-20 Kla Corporation Electron beam metrology having a source energy spread with filtered tails

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KR19980079377A (ko) * 1997-03-25 1998-11-25 요시다쇼이치로 하전립자선 전사장치
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JP4103345B2 (ja) * 2001-06-12 2008-06-18 株式会社日立製作所 荷電粒子線装置
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JP3914750B2 (ja) * 2001-11-20 2007-05-16 日本電子株式会社 収差補正装置を備えた荷電粒子線装置
US6924488B2 (en) * 2002-06-28 2005-08-02 Jeol Ltd. Charged-particle beam apparatus equipped with aberration corrector
JP4310250B2 (ja) * 2004-08-30 2009-08-05 株式会社日立ハイテクノロジーズ 荷電粒子線調整方法及び荷電粒子線装置
JP4922747B2 (ja) * 2006-12-19 2012-04-25 日本電子株式会社 荷電粒子ビーム装置
JP5250350B2 (ja) * 2008-09-12 2013-07-31 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
EP2325862A1 (en) * 2009-11-18 2011-05-25 Fei Company Corrector for axial aberrations of a particle-optical lens
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JP6320186B2 (ja) * 2014-06-16 2018-05-09 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
JP6554288B2 (ja) 2015-01-26 2019-07-31 株式会社日立ハイテクノロジーズ 荷電粒子線装置
CN107533943B (zh) * 2015-05-08 2019-12-10 科磊股份有限公司 用于电子束系统中像差校正的方法及系统
US10366862B2 (en) * 2015-09-21 2019-07-30 KLA-Tencor Corporaton Method and system for noise mitigation in a multi-beam scanning electron microscopy system

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Also Published As

Publication number Publication date
TW201833969A (zh) 2018-09-16
JP2019537228A (ja) 2019-12-19
TWI743262B (zh) 2021-10-21
EP3552222A4 (en) 2020-07-22
KR102325235B1 (ko) 2021-11-10
US10090131B2 (en) 2018-10-02
JP7194849B2 (ja) 2022-12-22
EP3552222A1 (en) 2019-10-16
WO2018106833A1 (en) 2018-06-14
JP2022058942A (ja) 2022-04-12
CN110036456A (zh) 2019-07-19
US20180158644A1 (en) 2018-06-07
KR20190085157A (ko) 2019-07-17

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