JP6727024B2 - 荷電粒子線装置 - Google Patents

荷電粒子線装置 Download PDF

Info

Publication number
JP6727024B2
JP6727024B2 JP2016090682A JP2016090682A JP6727024B2 JP 6727024 B2 JP6727024 B2 JP 6727024B2 JP 2016090682 A JP2016090682 A JP 2016090682A JP 2016090682 A JP2016090682 A JP 2016090682A JP 6727024 B2 JP6727024 B2 JP 6727024B2
Authority
JP
Japan
Prior art keywords
charged particle
sample
particle beam
detectors
secondary particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016090682A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017199606A (ja
JP2017199606A5 (enExample
Inventor
信裕 岡井
信裕 岡井
津野　夏規
夏規 津野
直正 鈴木
直正 鈴木
智康 猩々
智康 猩々
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Priority to JP2016090682A priority Critical patent/JP6727024B2/ja
Priority to US15/487,561 priority patent/US10121632B2/en
Publication of JP2017199606A publication Critical patent/JP2017199606A/ja
Publication of JP2017199606A5 publication Critical patent/JP2017199606A5/ja
Application granted granted Critical
Publication of JP6727024B2 publication Critical patent/JP6727024B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2016090682A 2016-04-28 2016-04-28 荷電粒子線装置 Active JP6727024B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016090682A JP6727024B2 (ja) 2016-04-28 2016-04-28 荷電粒子線装置
US15/487,561 US10121632B2 (en) 2016-04-28 2017-04-14 Charged particle beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016090682A JP6727024B2 (ja) 2016-04-28 2016-04-28 荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2017199606A JP2017199606A (ja) 2017-11-02
JP2017199606A5 JP2017199606A5 (enExample) 2019-02-07
JP6727024B2 true JP6727024B2 (ja) 2020-07-22

Family

ID=60156937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016090682A Active JP6727024B2 (ja) 2016-04-28 2016-04-28 荷電粒子線装置

Country Status (2)

Country Link
US (1) US10121632B2 (enExample)
JP (1) JP6727024B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017216941A1 (ja) * 2016-06-17 2017-12-21 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
WO2019100600A1 (en) * 2017-11-21 2019-05-31 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
WO2019207707A1 (ja) * 2018-04-26 2019-10-31 株式会社日立ハイテクノロジーズ 荷電粒子線装置
CN112005277A (zh) * 2018-04-27 2020-11-27 惠普发展公司，有限责任合伙企业 三维体积成像
WO2020136710A1 (ja) * 2018-12-25 2020-07-02 株式会社日立ハイテク 荷電粒子線装置
DE112019007399T5 (de) * 2019-07-02 2022-02-24 Hitachi High-Tech Corporation Ladungsteilchenstrahleinrichtung
US20230112447A1 (en) * 2020-03-11 2023-04-13 Asml Netherlands B.V. Systems and methods for signal electron detection
JP7364540B2 (ja) * 2020-08-05 2023-10-18 株式会社日立ハイテク 画像処理システム
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
US12339241B2 (en) * 2021-05-11 2025-06-24 Nuflare Technology, Inc. Multiple secondary electron beam alignment method, multiple secondary electron beam alignment apparatus, and electron beam inspection apparatus
JP7307768B2 (ja) 2021-07-08 2023-07-12 日本電子株式会社 走査電子顕微鏡および対物レンズ
US20250087442A1 (en) * 2023-09-07 2025-03-13 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam apparatus, foil or grid lens, and method of operating an electron beam apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5644132A (en) 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
JP3723260B2 (ja) 1994-12-19 2005-12-07 アプライド マテリアルズ イスラエル リミティド 粒子ビーム・コラム
JP2001110351A (ja) 1999-10-05 2001-04-20 Hitachi Ltd 走査電子顕微鏡
JP2001124713A (ja) * 1999-10-27 2001-05-11 Hitachi Ltd 回路パターン検査装置、および回路パターン検査方法
JP5033310B2 (ja) * 2005-02-18 2012-09-26 株式会社日立ハイテクノロジーズ 検査装置
JP4913854B2 (ja) * 2008-10-08 2012-04-11 アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー 荷電粒子検出装置及び検出方法
US7947953B2 (en) * 2008-10-08 2011-05-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle detection apparatus and detection method
US8629395B2 (en) * 2010-01-20 2014-01-14 Hitachi High-Technologies Corporation Charged particle beam apparatus
JP5530980B2 (ja) 2011-06-14 2014-06-25 株式会社アドバンテスト パターン測定装置及びパターン測定方法
WO2014132757A1 (ja) * 2013-02-26 2014-09-04 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
US20160336143A1 (en) * 2015-05-15 2016-11-17 Kabushiki Kaisha Toshiba Charged particle beam apparatus and method of calibrating sample position

Also Published As

Publication number Publication date
US10121632B2 (en) 2018-11-06
JP2017199606A (ja) 2017-11-02
US20170316915A1 (en) 2017-11-02

Similar Documents

Publication Publication Date Title
JP6727024B2 (ja) 荷電粒子線装置
JP3786875B2 (ja) 帯電粒子ビームデバイスのための対物レンズ
US6943349B2 (en) Multi beam charged particle device
US8378299B2 (en) Twin beam charged particle column and method of operating thereof
TWI650550B (zh) 用於高產量電子束檢測（ｅｂｉ）的多射束裝置
TWI662580B (zh) 帶電粒子束樣本檢查系統及用於其中操作之方法
TWI592976B (zh) Charged particle beam device and inspection method using the device
TWI689965B (zh) 藉由初級帶電粒子束的撞擊對從樣品發出的次級帶電粒子束成像的方法
JP6880209B2 (ja) 走査電子顕微鏡
JP2007207688A (ja) ミラー電子顕微鏡およびミラー電子顕微鏡を用いた検査装置
US20210249221A1 (en) Charged particle beam apparatus
US10665423B2 (en) Analyzing energy of charged particles
US20170263415A1 (en) Scanning electron microscope and electron trajectory adjustment method therefor
JP7188910B2 (ja) 粒子ビームを生成するための粒子源及び粒子光学装置
US9543115B2 (en) Electron microscope
JP6419849B2 (ja) 荷電粒子線装置
US7233008B1 (en) Multiple electrode lens arrangement and a method for inspecting an object
KR102858132B1 (ko) 하전 입자선 장치
Mankos et al. Electron optics for low energy electron microscopy
WO2025069195A1 (ja) 荷電粒子ビーム装置
JP2019169362A (ja) 電子ビーム装置
KR20220158828A (ko) 하전 입자선 장치
JP2012003909A (ja) 荷電粒子線装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20181217

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20181217

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20190909

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190924

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20191120

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200407

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200527

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20200609

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20200630

R150 Certificate of patent or registration of utility model

Ref document number: 6727024

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150