JP5851352B2 - 荷電粒子線装置 - Google Patents

荷電粒子線装置 Download PDF

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Publication number
JP5851352B2
JP5851352B2 JP2012135297A JP2012135297A JP5851352B2 JP 5851352 B2 JP5851352 B2 JP 5851352B2 JP 2012135297 A JP2012135297 A JP 2012135297A JP 2012135297 A JP2012135297 A JP 2012135297A JP 5851352 B2 JP5851352 B2 JP 5851352B2
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JP
Japan
Prior art keywords
sample
voltage
electrode
electron beam
primary electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012135297A
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English (en)
Japanese (ja)
Other versions
JP2014002835A5 (enExample
JP2014002835A (ja
Inventor
一郎 立花
一郎 立花
直正 鈴木
直正 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High-Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2012135297A priority Critical patent/JP5851352B2/ja
Priority to US14/407,117 priority patent/US9324540B2/en
Priority to KR1020147030888A priority patent/KR101685274B1/ko
Priority to PCT/JP2013/061010 priority patent/WO2013187115A1/ja
Publication of JP2014002835A publication Critical patent/JP2014002835A/ja
Publication of JP2014002835A5 publication Critical patent/JP2014002835A5/ja
Application granted granted Critical
Publication of JP5851352B2 publication Critical patent/JP5851352B2/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H01J2237/04756—Changing particle velocity decelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H01J2237/281—Bottom of trenches or holes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2012135297A 2012-06-15 2012-06-15 荷電粒子線装置 Active JP5851352B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012135297A JP5851352B2 (ja) 2012-06-15 2012-06-15 荷電粒子線装置
US14/407,117 US9324540B2 (en) 2012-06-15 2013-04-12 Charged particle beam device
KR1020147030888A KR101685274B1 (ko) 2012-06-15 2013-04-12 하전 입자선 장치
PCT/JP2013/061010 WO2013187115A1 (ja) 2012-06-15 2013-04-12 荷電粒子線装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012135297A JP5851352B2 (ja) 2012-06-15 2012-06-15 荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2014002835A JP2014002835A (ja) 2014-01-09
JP2014002835A5 JP2014002835A5 (enExample) 2015-03-19
JP5851352B2 true JP5851352B2 (ja) 2016-02-03

Family

ID=49757953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012135297A Active JP5851352B2 (ja) 2012-06-15 2012-06-15 荷電粒子線装置

Country Status (4)

Country Link
US (1) US9324540B2 (enExample)
JP (1) JP5851352B2 (enExample)
KR (1) KR101685274B1 (enExample)
WO (1) WO2013187115A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9564291B1 (en) * 2014-01-27 2017-02-07 Mochii, Inc. Hybrid charged-particle beam and light beam microscopy
US9881764B2 (en) 2016-01-09 2018-01-30 Kla-Tencor Corporation Heat-spreading blanking system for high throughput electron beam apparatus
WO2018096610A1 (ja) * 2016-11-24 2018-05-31 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US11056310B2 (en) 2017-01-12 2021-07-06 Hitachi High-Tech Corporation Charged-particle beam device
CN106920723A (zh) * 2017-03-06 2017-07-04 聚束科技（北京）有限公司 一种扫描聚焦系统及电子束控制方法
DE112017007771B4 (de) * 2017-08-24 2023-03-02 Hitachi High-Technologies Corporation Vorrichtung für strahl geladener teilchen und beobachtungsverahren und elementanalyseverfahren unter verwendung derselben
JP6950088B2 (ja) * 2018-05-22 2021-10-13 株式会社日立ハイテク 荷電粒子線装置及び荷電粒子線装置の検出器位置調整方法
JP6987233B2 (ja) * 2018-05-22 2021-12-22 株式会社日立ハイテク 荷電粒子線装置及びその軸調整方法
WO2019239546A1 (ja) 2018-06-14 2019-12-19 株式会社日立ハイテクノロジーズ 電子顕微鏡装置
US12001521B2 (en) 2018-11-08 2024-06-04 Hitachi High-Tech Corporation Adjusting method of charged particle beam device and charged particle beam device system
IL283996B2 (en) 2018-12-28 2026-02-01 Asml Netherlands Bv Methods and systems for focusing charged particle beams
WO2021001935A1 (ja) * 2019-07-02 2021-01-07 株式会社日立ハイテク 荷電粒子線装置
US12437965B1 (en) * 2022-08-01 2025-10-07 Mochil, Inc. Charged-particle beam microscope with differential vacuum pressures

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04302316A (ja) 1991-03-29 1992-10-26 Omron Corp メモリ管理装置
US6667476B2 (en) 1998-03-09 2003-12-23 Hitachi, Ltd. Scanning electron microscope
JP4093662B2 (ja) * 1999-01-04 2008-06-04 株式会社日立製作所 走査形電子顕微鏡
JP3494208B2 (ja) * 1999-03-19 2004-02-09 株式会社日立製作所 走査電子顕微鏡
US6998611B2 (en) 2001-09-06 2006-02-14 Ebara Corporation Electron beam apparatus and device manufacturing method using same
JP2003151484A (ja) * 2001-11-15 2003-05-23 Jeol Ltd 走査型荷電粒子ビーム装置
WO2004061892A1 (ja) 2002-12-27 2004-07-22 Advantest Corporation 試料観察装置、及び試料観察方法
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
JP4616180B2 (ja) * 2006-01-20 2011-01-19 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP2006294627A (ja) 2006-04-27 2006-10-26 Ebara Corp 電子線装置及び該装置を用いたデバイス製造方法
JP5075431B2 (ja) * 2007-02-28 2012-11-21 株式会社日立ハイテクノロジーズ 帯電測定方法、焦点調整方法、及び走査電子顕微鏡
US7888640B2 (en) * 2007-06-18 2011-02-15 Hitachi High-Technologies Corporation Scanning electron microscope and method of imaging an object by using the scanning electron microscope
JP5227643B2 (ja) * 2008-04-14 2013-07-03 株式会社日立ハイテクノロジーズ 高分解能でかつ高コントラストな観察が可能な電子線応用装置
JP5205515B2 (ja) * 2009-07-15 2013-06-05 株式会社日立ハイテクノロジーズ 試料電位測定方法、及び荷電粒子線装置

Also Published As

Publication number Publication date
JP2014002835A (ja) 2014-01-09
WO2013187115A1 (ja) 2013-12-19
KR20140143441A (ko) 2014-12-16
US20150136979A1 (en) 2015-05-21
US9324540B2 (en) 2016-04-26
KR101685274B1 (ko) 2016-12-09

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