JP2013058314A5 - - Google Patents

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Publication number
JP2013058314A5
JP2013058314A5 JP2011194563A JP2011194563A JP2013058314A5 JP 2013058314 A5 JP2013058314 A5 JP 2013058314A5 JP 2011194563 A JP2011194563 A JP 2011194563A JP 2011194563 A JP2011194563 A JP 2011194563A JP 2013058314 A5 JP2013058314 A5 JP 2013058314A5
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JP
Japan
Prior art keywords
electron
detector
electron microscope
scanning electron
scanning
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JP2011194563A
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English (en)
Japanese (ja)
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JP5860642B2 (ja
JP2013058314A (ja
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Priority claimed from JP2011194563A external-priority patent/JP5860642B2/ja
Priority to JP2011194563A priority Critical patent/JP5860642B2/ja
Priority to CN201280039396.XA priority patent/CN103733299B/zh
Priority to PCT/JP2012/063632 priority patent/WO2013035389A1/ja
Priority to US14/241,121 priority patent/US9029766B2/en
Priority to DE112012003413.9T priority patent/DE112012003413B4/de
Publication of JP2013058314A publication Critical patent/JP2013058314A/ja
Publication of JP2013058314A5 publication Critical patent/JP2013058314A5/ja
Publication of JP5860642B2 publication Critical patent/JP5860642B2/ja
Application granted granted Critical
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JP2011194563A 2011-09-07 2011-09-07 走査電子顕微鏡 Active JP5860642B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011194563A JP5860642B2 (ja) 2011-09-07 2011-09-07 走査電子顕微鏡
DE112012003413.9T DE112012003413B4 (de) 2011-09-07 2012-05-28 Rasterelektronenmikroskop
PCT/JP2012/063632 WO2013035389A1 (ja) 2011-09-07 2012-05-28 走査電子顕微鏡
US14/241,121 US9029766B2 (en) 2011-09-07 2012-05-28 Scanning electron microscope
CN201280039396.XA CN103733299B (zh) 2011-09-07 2012-05-28 扫描电子显微镜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011194563A JP5860642B2 (ja) 2011-09-07 2011-09-07 走査電子顕微鏡

Publications (3)

Publication Number Publication Date
JP2013058314A JP2013058314A (ja) 2013-03-28
JP2013058314A5 true JP2013058314A5 (enExample) 2014-04-10
JP5860642B2 JP5860642B2 (ja) 2016-02-16

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Family Applications (1)

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JP2011194563A Active JP5860642B2 (ja) 2011-09-07 2011-09-07 走査電子顕微鏡

Country Status (5)

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US (1) US9029766B2 (enExample)
JP (1) JP5860642B2 (enExample)
CN (1) CN103733299B (enExample)
DE (1) DE112012003413B4 (enExample)
WO (1) WO2013035389A1 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2013783B1 (en) * 2014-11-12 2016-10-07 Phenom-World Holding B V Sample stage.
CN105006416B (zh) * 2015-05-19 2017-09-19 北京中科科仪股份有限公司 一种扫描电镜探针电流检测装置和一种扫描电镜
CN108738343B (zh) * 2015-11-30 2022-02-01 Asml荷兰有限公司 多个带电粒子束的设备
CN107342205B (zh) * 2016-05-03 2019-07-23 睿励科学仪器（上海）有限公司 一种带电粒子探测装置
WO2018020626A1 (ja) * 2016-07-28 2018-02-01 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
JP6718782B2 (ja) * 2016-09-21 2020-07-08 日本電子株式会社 対物レンズおよび透過電子顕微鏡
CN106645250B (zh) * 2016-11-21 2024-04-26 宁波聚瑞精密仪器有限公司 一种具备光学成像功能的扫描透射电子显微镜
CN106770405A (zh) * 2016-12-09 2017-05-31 清华大学 一种完全大气压下超光学衍射成像装置
US10741352B2 (en) * 2016-12-29 2020-08-11 The Board Of Trustees Of The Leland Stanford Junior University Optically addressed, thermionic electron beam device
JP6857511B2 (ja) * 2017-02-23 2021-04-14 日本電子株式会社 走査電子顕微鏡
CN106920723A (zh) * 2017-03-06 2017-07-04 聚束科技（北京）有限公司 一种扫描聚焦系统及电子束控制方法
DE112017006802B4 (de) * 2017-03-24 2021-03-25 Hitachi High-Tech Corporation Ladungsteilchenstrahl-vorrichtung
DE112017008344B4 (de) 2017-03-24 2024-05-29 Hitachi High-Tech Corporation Ladungsteilchenstrahl-vorrichtung
CZ309855B6 (cs) 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem
WO2019100600A1 (en) * 2017-11-21 2019-05-31 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
DE102018202428B3 (de) 2018-02-16 2019-05-09 Carl Zeiss Microscopy Gmbh Vielstrahl-Teilchenmikroskop
JP6605080B2 (ja) * 2018-06-25 2019-11-13 株式会社ホロン 超高速電子検出器および該検出器を組み込んだ走査型電子ビーム検査装置
JP6843913B2 (ja) * 2019-03-28 2021-03-17 日本電子株式会社 透過電子顕微鏡の制御方法および透過電子顕微鏡
CN110133836B (zh) * 2019-05-31 2024-04-19 宁波大学 一种微结构固定荧光粉末的方法及装置
DE112019007399T5 (de) * 2019-07-02 2022-02-24 Hitachi High-Tech Corporation Ladungsteilchenstrahleinrichtung
US20230112447A1 (en) * 2020-03-11 2023-04-13 Asml Netherlands B.V. Systems and methods for signal electron detection
US11239043B2 (en) * 2020-05-19 2022-02-01 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device and method for inspecting and/or imaging a sample
US11183361B1 (en) * 2020-05-19 2021-11-23 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device and method for inspecting and/or imaging a sample
CN113758955A (zh) * 2020-06-01 2021-12-07 宸鸿科技(厦门)有限公司 利用扫描式电子显微镜观测表面不含导电层的样品的方法
JP7004776B2 (ja) * 2020-07-27 2022-01-21 株式会社日立ハイテク 荷電粒子ビーム装置
CN114171361B (zh) * 2020-09-11 2024-09-06 聚束科技（北京）有限公司 一种电子显微镜
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
CN112652510B (zh) * 2020-12-16 2022-05-10 中国科学院西安光学精密机械研究所 一种大视场、低像差电子光学成像系统及成像方法
WO2023276002A1 (ja) * 2021-06-29 2023-01-05 株式会社日立ハイテク プローブ装置
CN113539769B (zh) * 2021-07-16 2023-01-17 苏州矽视科技有限公司 一种实现共轴的电子束成像设备及实现方法
US11749495B2 (en) * 2021-10-05 2023-09-05 KLA Corp. Bandpass charged particle energy filtering detector for charged particle tools
CN119343737A (zh) * 2022-06-10 2025-01-21 Asml荷兰有限公司 具有快速聚焦校正的带电粒子束装置及其方法
US20240047171A1 (en) * 2022-08-08 2024-02-08 Fei Company Charged particle optics components and their fabrication
US20240194440A1 (en) * 2022-12-09 2024-06-13 Kla Corporation System and method for multi-beam electron microscopy using a detector array
WO2024152501A1 (zh) * 2023-01-18 2024-07-25 纳克微束(北京)有限公司 一种双内置复合结构的探测系统
DE102023106030A1 (de) 2023-03-10 2024-09-12 Carl Zeiss Microscopy Gmbh Elektronenstrahlmikroskop
DE102023106025A1 (de) 2023-03-10 2024-09-12 Carl Zeiss Microscopy Gmbh Teilchenstrahlmikroskop
WO2024242993A2 (en) * 2023-05-19 2024-11-28 Yale University Systems and methods for subvoxel sem based volume electron microscopy
CN116646228B (zh) * 2023-07-20 2023-10-27 北京惠然肯来科技中心(有限合伙) 快速聚焦扫描偏转装置、扫描电子显微镜
KR20250166833A (ko) * 2024-04-23 2025-11-28 씨아이큐텍 컴퍼니 리미티드 전자 검출장치 및 주사전자현미경

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2919170B2 (ja) 1992-03-19 1999-07-12 株式会社日立製作所 走査電子顕微鏡
DE69638126D1 (de) * 1995-10-19 2010-04-01 Hitachi Ltd Rasterelektronenmikroskop
JP3432091B2 (ja) * 1996-11-05 2003-07-28 日本電子株式会社 走査電子顕微鏡
JP3434165B2 (ja) 1997-04-18 2003-08-04 株式会社日立製作所 走査電子顕微鏡
DE19828476A1 (de) 1998-06-26 1999-12-30 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät
JP2000299078A (ja) * 1999-04-13 2000-10-24 Topcon Corp 走査型電子顕微鏡
US6642520B2 (en) 1999-04-13 2003-11-04 Kabushiki Kaisha Topcon Scanning electron microscope
JP2003172781A (ja) * 2001-12-06 2003-06-20 Fuji Photo Film Co Ltd 放射線測定装置
JP2003331770A (ja) 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
JP2004047341A (ja) * 2002-07-15 2004-02-12 Jeol Ltd 観察方法及び観察装置
JP2006114225A (ja) * 2004-10-12 2006-04-27 Hitachi High-Technologies Corp 荷電粒子線装置
DE602005010969D1 (de) 2005-03-17 2008-12-24 Integrated Circuit Testing Teilchenstrahlgerät für hohe räumliche Auflösung und verschiedene für perspektivische Abbildungsmethoden
JP4721821B2 (ja) * 2005-08-23 2011-07-13 日本電子株式会社 走査電子顕微鏡及び走査電子顕微鏡における信号検出方法
US7872236B2 (en) * 2007-01-30 2011-01-18 Hermes Microvision, Inc. Charged particle detection devices
JP5227643B2 (ja) * 2008-04-14 2013-07-03 株式会社日立ハイテクノロジーズ 高分解能でかつ高コントラストな観察が可能な電子線応用装置
JP5280238B2 (ja) * 2009-02-09 2013-09-04 日本電子株式会社 荷電粒子ビーム装置
JP5529573B2 (ja) * 2009-02-10 2014-06-25 国立大学法人 東京大学 透過型電子顕微鏡

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