JP2013545889A5 - - Google Patents
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- JP2013545889A5 JP2013545889A5 JP2013532892A JP2013532892A JP2013545889A5 JP 2013545889 A5 JP2013545889 A5 JP 2013545889A5 JP 2013532892 A JP2013532892 A JP 2013532892A JP 2013532892 A JP2013532892 A JP 2013532892A JP 2013545889 A5 JP2013545889 A5 JP 2013545889A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- dimethylsilane
- chamber
- substep
- hours
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38977710P | 2010-10-05 | 2010-10-05 | |
| US61/389,777 | 2010-10-05 | ||
| US201161507650P | 2011-07-14 | 2011-07-14 | |
| US61/507,650 | 2011-07-14 | ||
| PCT/US2011/054835 WO2012047945A2 (en) | 2010-10-05 | 2011-10-05 | Wear resistant coating, article, and method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013545889A JP2013545889A (ja) | 2013-12-26 |
| JP2013545889A5 true JP2013545889A5 (enExample) | 2015-01-15 |
| JP5710770B2 JP5710770B2 (ja) | 2015-04-30 |
Family
ID=44936522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013532892A Active JP5710770B2 (ja) | 2010-10-05 | 2011-10-05 | 耐摩耗性コーティングの製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US10604660B2 (enExample) |
| EP (1) | EP2625307B1 (enExample) |
| JP (1) | JP5710770B2 (enExample) |
| KR (3) | KR101512579B1 (enExample) |
| CN (1) | CN103237920B (enExample) |
| WO (1) | WO2012047945A2 (enExample) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5735522B2 (ja) | 2009-10-27 | 2015-06-17 | シルコテック コーポレイション | 化学気相成長コーティング、物品、及び方法 |
| US9340880B2 (en) | 2009-10-27 | 2016-05-17 | Silcotek Corp. | Semiconductor fabrication process |
| KR101512579B1 (ko) | 2010-10-05 | 2015-04-15 | 실코텍 코포레이션 | 내마모성 코팅, 물건 및 방법 |
| EP2996819A1 (en) | 2013-05-14 | 2016-03-23 | Silcotek Corp. | Vapor phase treatment of amorphous carbon films with (perfluoro 1,1,2,2 tetrahydroalkyl)trialkoxysilane |
| US20150030885A1 (en) * | 2013-07-29 | 2015-01-29 | Silcotek Corp. | Coated article and chemical vapor deposition process |
| US11292924B2 (en) | 2014-04-08 | 2022-04-05 | Silcotek Corp. | Thermal chemical vapor deposition coated article and process |
| SG10201506024WA (en) * | 2014-08-21 | 2016-03-30 | Silcotek Corp | Semiconductor fabrication process |
| SG10201506694QA (en) * | 2014-09-03 | 2016-04-28 | Silcotek Corp | Chemical vapor deposition process and coated article |
| US9915001B2 (en) | 2014-09-03 | 2018-03-13 | Silcotek Corp. | Chemical vapor deposition process and coated article |
| US10316408B2 (en) * | 2014-12-12 | 2019-06-11 | Silcotek Corp. | Delivery device, manufacturing system and process of manufacturing |
| US20160289824A1 (en) * | 2015-04-01 | 2016-10-06 | Silcotek Corp. | Article including a coating and process including an article with a coating |
| US20160289124A1 (en) * | 2015-04-01 | 2016-10-06 | Silcotek Corp. | Thermal chemical vapor deposition product and process of using a thermal chemical vapor deposition product |
| US20160289585A1 (en) * | 2015-04-01 | 2016-10-06 | Silcotek Corp. | Thermal chemical vapor deposition coated product and process of using a thermal vapor deposition coated product |
| WO2017040623A1 (en) | 2015-09-01 | 2017-03-09 | Silcotek Corp. | Thermal chemical vapor deposition coating |
| US10029346B2 (en) * | 2015-10-16 | 2018-07-24 | Applied Materials, Inc. | External clamp ring for a chemical mechanical polishing carrier head |
| US10578050B2 (en) | 2015-11-20 | 2020-03-03 | Tenneco Inc. | Thermally insulated steel piston crown and method of making using a ceramic coating |
| US10519854B2 (en) | 2015-11-20 | 2019-12-31 | Tenneco Inc. | Thermally insulated engine components and method of making using a ceramic coating |
| GB201520964D0 (en) | 2015-11-27 | 2016-01-13 | Porvair Filtration Group Ltd | Filtration material and method of manufacture thereof |
| US10323321B1 (en) | 2016-01-08 | 2019-06-18 | Silcotek Corp. | Thermal chemical vapor deposition process and coated article |
| US10487403B2 (en) * | 2016-12-13 | 2019-11-26 | Silcotek Corp | Fluoro-containing thermal chemical vapor deposition process and article |
| US11161324B2 (en) * | 2017-09-13 | 2021-11-02 | Silcotek Corp. | Corrosion-resistant coated article and thermal chemical vapor deposition coating process |
| US11709155B2 (en) | 2017-09-18 | 2023-07-25 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| US12181452B2 (en) | 2017-09-18 | 2024-12-31 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| US11709156B2 (en) | 2017-09-18 | 2023-07-25 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved analytical analysis |
| US12180581B2 (en) | 2017-09-18 | 2024-12-31 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| SG11202105663XA (en) * | 2018-11-29 | 2021-06-29 | Silcotek Corp | Fluid contact process, coated article, and coating process |
| CN113507971A (zh) | 2019-02-27 | 2021-10-15 | 沃特世科技公司 | 用于最大程度减少分析物吸附的色谱密封件和经涂覆的流动路径 |
| WO2020252306A1 (en) | 2019-06-14 | 2020-12-17 | Silcotek Corp. | Nano-wire growth |
| CA3155811A1 (en) | 2019-10-25 | 2021-04-29 | Nusil Technology Llc | Silicone compositions and methods related thereto |
| US11918936B2 (en) | 2020-01-17 | 2024-03-05 | Waters Technologies Corporation | Performance and dynamic range for oligonucleotide bioanalysis through reduction of non specific binding |
| US12473635B2 (en) | 2020-06-03 | 2025-11-18 | Silcotek Corp. | Dielectric article |
| EP4189018A1 (en) | 2020-07-30 | 2023-06-07 | Silcotek Corp. | Heat exchanger process |
| US20220073754A1 (en) * | 2020-09-04 | 2022-03-10 | Silcotek Corp. | Coated medical device product and process |
| CN116391122A (zh) | 2020-09-24 | 2023-07-04 | 沃特世科技公司 | 用于反应性分子分离的色谱硬件改进 |
| US20220136110A1 (en) * | 2020-10-30 | 2022-05-05 | Silcotek Corp. | De-icing process and product |
| CN118414209A (zh) * | 2021-11-03 | 2024-07-30 | 西尔科特克公司 | 具有暴露于高于600摄氏度的温度的含非晶硅涂层的工艺、部件和系统 |
Family Cites Families (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2371524A1 (fr) | 1976-11-18 | 1978-06-16 | Alsthom Atlantique | Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma |
| US4579752A (en) | 1984-10-29 | 1986-04-01 | At&T Bell Laboratories | Enhanced corrosion resistance of metal surfaces |
| US4671997A (en) | 1985-04-08 | 1987-06-09 | United Technologies Corporation | Gas turbine composite parts |
| US4714632A (en) | 1985-12-11 | 1987-12-22 | Air Products And Chemicals, Inc. | Method of producing silicon diffusion coatings on metal articles |
| US4792460A (en) | 1986-07-15 | 1988-12-20 | Electric Power Research Institute, Inc. | Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium |
| US4741964A (en) | 1986-07-17 | 1988-05-03 | International Business Machines Corporation | Structure containing hydrogenated amorphous silicon and process |
| US4749631B1 (en) | 1986-12-04 | 1993-03-23 | Multilayer ceramics from silicate esters | |
| US4753856A (en) | 1987-01-02 | 1988-06-28 | Dow Corning Corporation | Multilayer ceramic coatings from silicate esters and metal oxides |
| JPH01206629A (ja) * | 1988-02-15 | 1989-08-18 | Toshiba Corp | 薄膜の形成方法 |
| US4842888A (en) | 1988-04-07 | 1989-06-27 | Dow Corning Corporation | Ceramic coatings from the pyrolysis in ammonia of mixtures of silicate esters and other metal oxide precursors |
| US5160544A (en) | 1990-03-20 | 1992-11-03 | Diamonex Incorporated | Hot filament chemical vapor deposition reactor |
| US5270082A (en) * | 1991-04-15 | 1993-12-14 | Lin Tyau Jeen | Organic vapor deposition process for corrosion protection of metal substrates |
| FR2675947A1 (fr) | 1991-04-23 | 1992-10-30 | France Telecom | Procede de passivation locale d'un substrat par une couche de carbone amorphe hydrogene et procede de fabrication de transistors en couches minces sur ce substrat passive. |
| TW203633B (enExample) | 1991-06-03 | 1993-04-11 | L Air Liquide Sa Pour L Expl Des Proce | |
| CA2104340A1 (en) | 1992-08-31 | 1994-03-01 | Grish Chandra | Hermetic protection for integrated circuits |
| US5825078A (en) | 1992-09-23 | 1998-10-20 | Dow Corning Corporation | Hermetic protection for integrated circuits |
| US5249554A (en) | 1993-01-08 | 1993-10-05 | Ford Motor Company | Powertrain component with adherent film having a graded composition |
| US5299731A (en) | 1993-02-22 | 1994-04-05 | L'air Liquide | Corrosion resistant welding of stainless steel |
| TW347149U (en) | 1993-02-26 | 1998-12-01 | Dow Corning | Integrated circuits protected from the environment by ceramic and barrier metal layers |
| US5465680A (en) * | 1993-07-01 | 1995-11-14 | Dow Corning Corporation | Method of forming crystalline silicon carbide coatings |
| DE69408405T2 (de) | 1993-11-11 | 1998-08-20 | Nissin Electric Co Ltd | Plasma-CVD-Verfahren und Vorrichtung |
| US5818071A (en) | 1995-02-02 | 1998-10-06 | Dow Corning Corporation | Silicon carbide metal diffusion barrier layer |
| US6511760B1 (en) | 1998-02-27 | 2003-01-28 | Restek Corporation | Method of passivating a gas vessel or component of a gas transfer system using a silicon overlay coating |
| US6159871A (en) | 1998-05-29 | 2000-12-12 | Dow Corning Corporation | Method for producing hydrogenated silicon oxycarbide films having low dielectric constant |
| US6444326B1 (en) | 1999-03-05 | 2002-09-03 | Restek Corporation | Surface modification of solid supports through the thermal decomposition and functionalization of silanes |
| US6406793B1 (en) * | 1999-09-22 | 2002-06-18 | Shin-Etsu Chemical Co., Ltd. | Addition-reaction silicone pressure sensitive adhesive composition |
| US6472076B1 (en) | 1999-10-18 | 2002-10-29 | Honeywell International Inc. | Deposition of organosilsesquioxane films |
| FR2805583B1 (fr) * | 2000-02-28 | 2002-05-17 | Renault | Piece de friction metallique comportant une couche a proprietes de frottement et d'usure ameliorees |
| US6531398B1 (en) | 2000-10-30 | 2003-03-11 | Applied Materials, Inc. | Method of depositing organosillicate layers |
| US6936309B2 (en) * | 2002-04-02 | 2005-08-30 | Applied Materials, Inc. | Hardness improvement of silicon carboxy films |
| EP1504138A2 (en) * | 2002-05-08 | 2005-02-09 | Applied Materials, Inc. | Method for using low dielectric constant film by electron beam |
| JP4148759B2 (ja) * | 2002-11-13 | 2008-09-10 | 三井化学株式会社 | ガスバリアフィルムの製造方法 |
| US7070833B2 (en) | 2003-03-05 | 2006-07-04 | Restek Corporation | Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments |
| JP4300876B2 (ja) * | 2003-05-28 | 2009-07-22 | 株式会社Ｉｈｉ | 摺動部材及びその製造方法 |
| US20050271893A1 (en) * | 2004-06-04 | 2005-12-08 | Applied Microstructures, Inc. | Controlled vapor deposition of multilayered coatings adhered by an oxide layer |
| US7867627B2 (en) | 2004-12-13 | 2011-01-11 | Silcotek Corporation | Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures |
| US7678712B2 (en) | 2005-03-22 | 2010-03-16 | Honeywell International, Inc. | Vapor phase treatment of dielectric materials |
| CA2885593C (en) * | 2006-05-17 | 2018-03-06 | G & H Technologies Llc | Wear resistant coating |
| SE0701028L (sv) * | 2007-04-27 | 2008-10-28 | Sandvik Intellectual Property | Skär |
| WO2009032488A1 (en) * | 2007-08-28 | 2009-03-12 | International Business Machines Corporation | Improved low k porous sicoh dielectric and integration with post film formation treatment |
| US7964442B2 (en) | 2007-10-09 | 2011-06-21 | Applied Materials, Inc. | Methods to obtain low k dielectric barrier with superior etch resistivity |
| JP5143769B2 (ja) * | 2008-03-12 | 2013-02-13 | 東京エレクトロン株式会社 | 半導体装置およびその製造方法 |
| US20110146787A1 (en) | 2008-05-28 | 2011-06-23 | Sebastien Allen | Silicon carbide-based antireflective coating |
| JP5735522B2 (ja) | 2009-10-27 | 2015-06-17 | シルコテック コーポレイション | 化学気相成長コーティング、物品、及び方法 |
| KR101512579B1 (ko) | 2010-10-05 | 2015-04-15 | 실코텍 코포레이션 | 내마모성 코팅, 물건 및 방법 |
| JP6256953B2 (ja) | 2012-03-26 | 2018-01-10 | シルコテック コーポレーション | コーティングされた物品及び化学蒸着方法 |
| US20150030885A1 (en) | 2013-07-29 | 2015-01-29 | Silcotek Corp. | Coated article and chemical vapor deposition process |
| US11292924B2 (en) | 2014-04-08 | 2022-04-05 | Silcotek Corp. | Thermal chemical vapor deposition coated article and process |
-
2011
- 2011-10-05 KR KR1020137011766A patent/KR101512579B1/ko active Active
- 2011-10-05 KR KR1020147031583A patent/KR101790206B1/ko active Active
- 2011-10-05 KR KR1020177030045A patent/KR101854162B1/ko active Active
- 2011-10-05 JP JP2013532892A patent/JP5710770B2/ja active Active
- 2011-10-05 US US13/876,328 patent/US10604660B2/en active Active
- 2011-10-05 EP EP11773611.6A patent/EP2625307B1/en active Active
- 2011-10-05 WO PCT/US2011/054835 patent/WO2012047945A2/en not_active Ceased
- 2011-10-05 CN CN201180058513.2A patent/CN103237920B/zh active Active
-
2020
- 2020-02-26 US US16/801,230 patent/US11807777B2/en active Active
-
2023
- 2023-06-08 US US18/331,647 patent/US20230383126A1/en active Pending
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