CN103237920B - 耐磨涂层、包含该耐磨涂层的产品以及涂覆该耐磨涂层的方法 - Google Patents
耐磨涂层、包含该耐磨涂层的产品以及涂覆该耐磨涂层的方法 Download PDFInfo
- Publication number
- CN103237920B CN103237920B CN201180058513.2A CN201180058513A CN103237920B CN 103237920 B CN103237920 B CN 103237920B CN 201180058513 A CN201180058513 A CN 201180058513A CN 103237920 B CN103237920 B CN 103237920B
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- China
- Prior art keywords
- coating
- wear
- dimethylsilane
- products
- resistant coating
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Cylinder Crankcases Of Internal Combustion Engines (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38977710P | 2010-10-05 | 2010-10-05 | |
| US61/389,777 | 2010-10-05 | ||
| US201161507650P | 2011-07-14 | 2011-07-14 | |
| US61/507,650 | 2011-07-14 | ||
| PCT/US2011/054835 WO2012047945A2 (en) | 2010-10-05 | 2011-10-05 | Wear resistant coating, article, and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103237920A CN103237920A (zh) | 2013-08-07 |
| CN103237920B true CN103237920B (zh) | 2016-01-13 |
Family
ID=44936522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180058513.2A Active CN103237920B (zh) | 2010-10-05 | 2011-10-05 | 耐磨涂层、包含该耐磨涂层的产品以及涂覆该耐磨涂层的方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US10604660B2 (enExample) |
| EP (1) | EP2625307B1 (enExample) |
| JP (1) | JP5710770B2 (enExample) |
| KR (3) | KR101512579B1 (enExample) |
| CN (1) | CN103237920B (enExample) |
| WO (1) | WO2012047945A2 (enExample) |
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| JP5735522B2 (ja) | 2009-10-27 | 2015-06-17 | シルコテック コーポレイション | 化学気相成長コーティング、物品、及び方法 |
| US9340880B2 (en) | 2009-10-27 | 2016-05-17 | Silcotek Corp. | Semiconductor fabrication process |
| KR101512579B1 (ko) | 2010-10-05 | 2015-04-15 | 실코텍 코포레이션 | 내마모성 코팅, 물건 및 방법 |
| EP2996819A1 (en) | 2013-05-14 | 2016-03-23 | Silcotek Corp. | Vapor phase treatment of amorphous carbon films with (perfluoro 1,1,2,2 tetrahydroalkyl)trialkoxysilane |
| US20150030885A1 (en) * | 2013-07-29 | 2015-01-29 | Silcotek Corp. | Coated article and chemical vapor deposition process |
| US11292924B2 (en) | 2014-04-08 | 2022-04-05 | Silcotek Corp. | Thermal chemical vapor deposition coated article and process |
| SG10201506024WA (en) * | 2014-08-21 | 2016-03-30 | Silcotek Corp | Semiconductor fabrication process |
| SG10201506694QA (en) * | 2014-09-03 | 2016-04-28 | Silcotek Corp | Chemical vapor deposition process and coated article |
| US9915001B2 (en) | 2014-09-03 | 2018-03-13 | Silcotek Corp. | Chemical vapor deposition process and coated article |
| US10316408B2 (en) * | 2014-12-12 | 2019-06-11 | Silcotek Corp. | Delivery device, manufacturing system and process of manufacturing |
| US20160289824A1 (en) * | 2015-04-01 | 2016-10-06 | Silcotek Corp. | Article including a coating and process including an article with a coating |
| US20160289124A1 (en) * | 2015-04-01 | 2016-10-06 | Silcotek Corp. | Thermal chemical vapor deposition product and process of using a thermal chemical vapor deposition product |
| US20160289585A1 (en) * | 2015-04-01 | 2016-10-06 | Silcotek Corp. | Thermal chemical vapor deposition coated product and process of using a thermal vapor deposition coated product |
| WO2017040623A1 (en) | 2015-09-01 | 2017-03-09 | Silcotek Corp. | Thermal chemical vapor deposition coating |
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| US10578050B2 (en) | 2015-11-20 | 2020-03-03 | Tenneco Inc. | Thermally insulated steel piston crown and method of making using a ceramic coating |
| US10519854B2 (en) | 2015-11-20 | 2019-12-31 | Tenneco Inc. | Thermally insulated engine components and method of making using a ceramic coating |
| GB201520964D0 (en) | 2015-11-27 | 2016-01-13 | Porvair Filtration Group Ltd | Filtration material and method of manufacture thereof |
| US10323321B1 (en) | 2016-01-08 | 2019-06-18 | Silcotek Corp. | Thermal chemical vapor deposition process and coated article |
| US10487403B2 (en) * | 2016-12-13 | 2019-11-26 | Silcotek Corp | Fluoro-containing thermal chemical vapor deposition process and article |
| US11161324B2 (en) * | 2017-09-13 | 2021-11-02 | Silcotek Corp. | Corrosion-resistant coated article and thermal chemical vapor deposition coating process |
| US11709155B2 (en) | 2017-09-18 | 2023-07-25 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| US12181452B2 (en) | 2017-09-18 | 2024-12-31 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| US11709156B2 (en) | 2017-09-18 | 2023-07-25 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved analytical analysis |
| US12180581B2 (en) | 2017-09-18 | 2024-12-31 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| SG11202105663XA (en) * | 2018-11-29 | 2021-06-29 | Silcotek Corp | Fluid contact process, coated article, and coating process |
| CN113507971A (zh) | 2019-02-27 | 2021-10-15 | 沃特世科技公司 | 用于最大程度减少分析物吸附的色谱密封件和经涂覆的流动路径 |
| WO2020252306A1 (en) | 2019-06-14 | 2020-12-17 | Silcotek Corp. | Nano-wire growth |
| CA3155811A1 (en) | 2019-10-25 | 2021-04-29 | Nusil Technology Llc | Silicone compositions and methods related thereto |
| US11918936B2 (en) | 2020-01-17 | 2024-03-05 | Waters Technologies Corporation | Performance and dynamic range for oligonucleotide bioanalysis through reduction of non specific binding |
| US12473635B2 (en) | 2020-06-03 | 2025-11-18 | Silcotek Corp. | Dielectric article |
| EP4189018A1 (en) | 2020-07-30 | 2023-06-07 | Silcotek Corp. | Heat exchanger process |
| US20220073754A1 (en) * | 2020-09-04 | 2022-03-10 | Silcotek Corp. | Coated medical device product and process |
| CN116391122A (zh) | 2020-09-24 | 2023-07-04 | 沃特世科技公司 | 用于反应性分子分离的色谱硬件改进 |
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| CN118414209A (zh) * | 2021-11-03 | 2024-07-30 | 西尔科特克公司 | 具有暴露于高于600摄氏度的温度的含非晶硅涂层的工艺、部件和系统 |
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| US7964442B2 (en) | 2007-10-09 | 2011-06-21 | Applied Materials, Inc. | Methods to obtain low k dielectric barrier with superior etch resistivity |
| JP5143769B2 (ja) * | 2008-03-12 | 2013-02-13 | 東京エレクトロン株式会社 | 半導体装置およびその製造方法 |
| JP5735522B2 (ja) | 2009-10-27 | 2015-06-17 | シルコテック コーポレイション | 化学気相成長コーティング、物品、及び方法 |
| KR101512579B1 (ko) | 2010-10-05 | 2015-04-15 | 실코텍 코포레이션 | 내마모성 코팅, 물건 및 방법 |
| JP6256953B2 (ja) | 2012-03-26 | 2018-01-10 | シルコテック コーポレーション | コーティングされた物品及び化学蒸着方法 |
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| US11292924B2 (en) | 2014-04-08 | 2022-04-05 | Silcotek Corp. | Thermal chemical vapor deposition coated article and process |
-
2011
- 2011-10-05 KR KR1020137011766A patent/KR101512579B1/ko active Active
- 2011-10-05 KR KR1020147031583A patent/KR101790206B1/ko active Active
- 2011-10-05 KR KR1020177030045A patent/KR101854162B1/ko active Active
- 2011-10-05 JP JP2013532892A patent/JP5710770B2/ja active Active
- 2011-10-05 US US13/876,328 patent/US10604660B2/en active Active
- 2011-10-05 EP EP11773611.6A patent/EP2625307B1/en active Active
- 2011-10-05 WO PCT/US2011/054835 patent/WO2012047945A2/en not_active Ceased
- 2011-10-05 CN CN201180058513.2A patent/CN103237920B/zh active Active
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2020
- 2020-02-26 US US16/801,230 patent/US11807777B2/en active Active
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- 2023-06-08 US US18/331,647 patent/US20230383126A1/en active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| US20130244025A1 (en) | 2013-09-19 |
| WO2012047945A2 (en) | 2012-04-12 |
| WO2012047945A3 (en) | 2012-05-31 |
| US20200190336A1 (en) | 2020-06-18 |
| EP2625307A2 (en) | 2013-08-14 |
| KR101512579B1 (ko) | 2015-04-15 |
| KR101790206B1 (ko) | 2017-10-25 |
| JP2013545889A (ja) | 2013-12-26 |
| JP5710770B2 (ja) | 2015-04-30 |
| US10604660B2 (en) | 2020-03-31 |
| US20230383126A1 (en) | 2023-11-30 |
| KR20130064819A (ko) | 2013-06-18 |
| KR101854162B1 (ko) | 2018-06-20 |
| CN103237920A (zh) | 2013-08-07 |
| US11807777B2 (en) | 2023-11-07 |
| EP2625307B1 (en) | 2017-11-15 |
| KR20170119745A (ko) | 2017-10-27 |
| KR20140138352A (ko) | 2014-12-03 |
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