KR101512579B1 - 내마모성 코팅, 물건 및 방법 - Google Patents

내마모성 코팅, 물건 및 방법 Download PDF

Info

Publication number
KR101512579B1
KR101512579B1 KR1020137011766A KR20137011766A KR101512579B1 KR 101512579 B1 KR101512579 B1 KR 101512579B1 KR 1020137011766 A KR1020137011766 A KR 1020137011766A KR 20137011766 A KR20137011766 A KR 20137011766A KR 101512579 B1 KR101512579 B1 KR 101512579B1
Authority
KR
South Korea
Prior art keywords
layer
substrate
dimethylsilane
coating
delete delete
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020137011766A
Other languages
English (en)
Korean (ko)
Other versions
KR20130064819A (ko
Inventor
다비드 에이. 스미스
제임스 비. 매트젤라
파울 에이치. 실바이스
게리 에이. 바론
마틴 이. 히긴스
Original Assignee
실코텍 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 실코텍 코포레이션 filed Critical 실코텍 코포레이션
Publication of KR20130064819A publication Critical patent/KR20130064819A/ko
Application granted granted Critical
Publication of KR101512579B1 publication Critical patent/KR101512579B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0272Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56After-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31551Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609Particulate metal or metal compound-containing
    • Y10T428/31612As silicone, silane or siloxane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31663As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cylinder Crankcases Of Internal Combustion Engines (AREA)
  • Laminated Bodies (AREA)
KR1020137011766A 2010-10-05 2011-10-05 내마모성 코팅, 물건 및 방법 Active KR101512579B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US38977710P 2010-10-05 2010-10-05
US61/389,777 2010-10-05
US201161507650P 2011-07-14 2011-07-14
US61/507,650 2011-07-14
PCT/US2011/054835 WO2012047945A2 (en) 2010-10-05 2011-10-05 Wear resistant coating, article, and method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020147031583A Division KR101790206B1 (ko) 2010-10-05 2011-10-05 내마모성 코팅, 물건 및 방법

Publications (2)

Publication Number Publication Date
KR20130064819A KR20130064819A (ko) 2013-06-18
KR101512579B1 true KR101512579B1 (ko) 2015-04-15

Family

ID=44936522

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020177030045A Active KR101854162B1 (ko) 2010-10-05 2011-10-05 내마모성 코팅, 물건 및 방법
KR1020137011766A Active KR101512579B1 (ko) 2010-10-05 2011-10-05 내마모성 코팅, 물건 및 방법
KR1020147031583A Active KR101790206B1 (ko) 2010-10-05 2011-10-05 내마모성 코팅, 물건 및 방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020177030045A Active KR101854162B1 (ko) 2010-10-05 2011-10-05 내마모성 코팅, 물건 및 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020147031583A Active KR101790206B1 (ko) 2010-10-05 2011-10-05 내마모성 코팅, 물건 및 방법

Country Status (6)

Country Link
US (3) US10604660B2 (enExample)
EP (1) EP2625307B1 (enExample)
JP (1) JP5710770B2 (enExample)
KR (3) KR101854162B1 (enExample)
CN (1) CN103237920B (enExample)
WO (1) WO2012047945A2 (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9777368B2 (en) 2009-10-27 2017-10-03 Silcotek Corp. Chemical vapor deposition coating, article, and method
US9340880B2 (en) 2009-10-27 2016-05-17 Silcotek Corp. Semiconductor fabrication process
KR101854162B1 (ko) * 2010-10-05 2018-06-20 실코텍 코포레이션 내마모성 코팅, 물건 및 방법
EP2996819A1 (en) 2013-05-14 2016-03-23 Silcotek Corp. Vapor phase treatment of amorphous carbon films with (perfluoro 1,1,2,2 tetrahydroalkyl)trialkoxysilane
US20150030885A1 (en) * 2013-07-29 2015-01-29 Silcotek Corp. Coated article and chemical vapor deposition process
US11292924B2 (en) 2014-04-08 2022-04-05 Silcotek Corp. Thermal chemical vapor deposition coated article and process
SG10201506024WA (en) * 2014-08-21 2016-03-30 Silcotek Corp Semiconductor fabrication process
US9915001B2 (en) 2014-09-03 2018-03-13 Silcotek Corp. Chemical vapor deposition process and coated article
SG10201506694QA (en) * 2014-09-03 2016-04-28 Silcotek Corp Chemical vapor deposition process and coated article
US10316408B2 (en) * 2014-12-12 2019-06-11 Silcotek Corp. Delivery device, manufacturing system and process of manufacturing
US20160289124A1 (en) * 2015-04-01 2016-10-06 Silcotek Corp. Thermal chemical vapor deposition product and process of using a thermal chemical vapor deposition product
US20160289824A1 (en) * 2015-04-01 2016-10-06 Silcotek Corp. Article including a coating and process including an article with a coating
US20160289585A1 (en) * 2015-04-01 2016-10-06 Silcotek Corp. Thermal chemical vapor deposition coated product and process of using a thermal vapor deposition coated product
WO2017040623A1 (en) 2015-09-01 2017-03-09 Silcotek Corp. Thermal chemical vapor deposition coating
US10029346B2 (en) * 2015-10-16 2018-07-24 Applied Materials, Inc. External clamp ring for a chemical mechanical polishing carrier head
US10578050B2 (en) 2015-11-20 2020-03-03 Tenneco Inc. Thermally insulated steel piston crown and method of making using a ceramic coating
US10519854B2 (en) 2015-11-20 2019-12-31 Tenneco Inc. Thermally insulated engine components and method of making using a ceramic coating
GB201520964D0 (en) 2015-11-27 2016-01-13 Porvair Filtration Group Ltd Filtration material and method of manufacture thereof
US10323321B1 (en) 2016-01-08 2019-06-18 Silcotek Corp. Thermal chemical vapor deposition process and coated article
US10487403B2 (en) * 2016-12-13 2019-11-26 Silcotek Corp Fluoro-containing thermal chemical vapor deposition process and article
US11161324B2 (en) 2017-09-13 2021-11-02 Silcotek Corp. Corrosion-resistant coated article and thermal chemical vapor deposition coating process
US11709156B2 (en) 2017-09-18 2023-07-25 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved analytical analysis
US12180581B2 (en) 2017-09-18 2024-12-31 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
US12181452B2 (en) 2017-09-18 2024-12-31 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
US11709155B2 (en) 2017-09-18 2023-07-25 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
JP7541520B2 (ja) * 2018-11-29 2024-08-28 シルコテック コーポレーション 流体接触方法、コーティングされた物品、およびコーティング方法
EP3930867B1 (en) 2019-02-27 2025-11-12 Waters Technologies Corporation Chromatographic seal and coated flow paths for minimizing analyte adsorption
WO2020252306A1 (en) 2019-06-14 2020-12-17 Silcotek Corp. Nano-wire growth
US12269059B2 (en) 2019-10-25 2025-04-08 Nusil Technology Llc Silicone compositions and methods related thereto
US11918936B2 (en) 2020-01-17 2024-03-05 Waters Technologies Corporation Performance and dynamic range for oligonucleotide bioanalysis through reduction of non specific binding
US12473635B2 (en) 2020-06-03 2025-11-18 Silcotek Corp. Dielectric article
US20230258418A1 (en) 2020-07-30 2023-08-17 Silcotek Corp. Heat exchanger process
US20220073754A1 (en) * 2020-09-04 2022-03-10 Silcotek Corp. Coated medical device product and process
CN116391122A (zh) 2020-09-24 2023-07-04 沃特世科技公司 用于反应性分子分离的色谱硬件改进
US20220136110A1 (en) * 2020-10-30 2022-05-05 Silcotek Corp. De-icing process and product
WO2023081013A1 (en) * 2021-11-03 2023-05-11 Silcotek Corp. Process, component, and system with amorphous silicon-containing coating exposed to a temperature of greater than 600 degrees celsius

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5249554A (en) * 1993-01-08 1993-10-05 Ford Motor Company Powertrain component with adherent film having a graded composition
EP1988190A2 (en) * 2007-04-27 2008-11-05 Sandvik Intellectual Property AB Coated cutting tool
WO2009143618A1 (en) * 2008-05-28 2009-12-03 Sixtron Advanced Materials, Inc. Silicon carbide-based antireflective coating

Family Cites Families (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2371524A1 (fr) 1976-11-18 1978-06-16 Alsthom Atlantique Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma
US4579752A (en) 1984-10-29 1986-04-01 At&T Bell Laboratories Enhanced corrosion resistance of metal surfaces
US4671997A (en) 1985-04-08 1987-06-09 United Technologies Corporation Gas turbine composite parts
US4714632A (en) 1985-12-11 1987-12-22 Air Products And Chemicals, Inc. Method of producing silicon diffusion coatings on metal articles
US4792460A (en) 1986-07-15 1988-12-20 Electric Power Research Institute, Inc. Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium
US4741964A (en) 1986-07-17 1988-05-03 International Business Machines Corporation Structure containing hydrogenated amorphous silicon and process
US4749631B1 (en) 1986-12-04 1993-03-23 Multilayer ceramics from silicate esters
US4753856A (en) 1987-01-02 1988-06-28 Dow Corning Corporation Multilayer ceramic coatings from silicate esters and metal oxides
JPH01206629A (ja) * 1988-02-15 1989-08-18 Toshiba Corp 薄膜の形成方法
US4842888A (en) 1988-04-07 1989-06-27 Dow Corning Corporation Ceramic coatings from the pyrolysis in ammonia of mixtures of silicate esters and other metal oxide precursors
US5160544A (en) 1990-03-20 1992-11-03 Diamonex Incorporated Hot filament chemical vapor deposition reactor
US5270082A (en) * 1991-04-15 1993-12-14 Lin Tyau Jeen Organic vapor deposition process for corrosion protection of metal substrates
FR2675947A1 (fr) 1991-04-23 1992-10-30 France Telecom Procede de passivation locale d'un substrat par une couche de carbone amorphe hydrogene et procede de fabrication de transistors en couches minces sur ce substrat passive.
TW203633B (enExample) 1991-06-03 1993-04-11 L Air Liquide Sa Pour L Expl Des Proce
CA2104340A1 (en) 1992-08-31 1994-03-01 Grish Chandra Hermetic protection for integrated circuits
US5825078A (en) 1992-09-23 1998-10-20 Dow Corning Corporation Hermetic protection for integrated circuits
US5299731A (en) 1993-02-22 1994-04-05 L'air Liquide Corrosion resistant welding of stainless steel
TW347149U (en) 1993-02-26 1998-12-01 Dow Corning Integrated circuits protected from the environment by ceramic and barrier metal layers
US5465680A (en) * 1993-07-01 1995-11-14 Dow Corning Corporation Method of forming crystalline silicon carbide coatings
EP0653501B1 (en) 1993-11-11 1998-02-04 Nissin Electric Company, Limited Plasma-CVD method and apparatus
US5818071A (en) 1995-02-02 1998-10-06 Dow Corning Corporation Silicon carbide metal diffusion barrier layer
US6511760B1 (en) 1998-02-27 2003-01-28 Restek Corporation Method of passivating a gas vessel or component of a gas transfer system using a silicon overlay coating
US6159871A (en) * 1998-05-29 2000-12-12 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
US6444326B1 (en) * 1999-03-05 2002-09-03 Restek Corporation Surface modification of solid supports through the thermal decomposition and functionalization of silanes
US6406793B1 (en) * 1999-09-22 2002-06-18 Shin-Etsu Chemical Co., Ltd. Addition-reaction silicone pressure sensitive adhesive composition
US6472076B1 (en) 1999-10-18 2002-10-29 Honeywell International Inc. Deposition of organosilsesquioxane films
FR2805583B1 (fr) * 2000-02-28 2002-05-17 Renault Piece de friction metallique comportant une couche a proprietes de frottement et d'usure ameliorees
US6531398B1 (en) 2000-10-30 2003-03-11 Applied Materials, Inc. Method of depositing organosillicate layers
US6936309B2 (en) 2002-04-02 2005-08-30 Applied Materials, Inc. Hardness improvement of silicon carboxy films
EP1504138A2 (en) * 2002-05-08 2005-02-09 Applied Materials, Inc. Method for using low dielectric constant film by electron beam
JP4148759B2 (ja) 2002-11-13 2008-09-10 三井化学株式会社 ガスバリアフィルムの製造方法
US7070833B2 (en) 2003-03-05 2006-07-04 Restek Corporation Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments
JP4300876B2 (ja) * 2003-05-28 2009-07-22 株式会社Ihi 摺動部材及びその製造方法
US20050271893A1 (en) * 2004-06-04 2005-12-08 Applied Microstructures, Inc. Controlled vapor deposition of multilayered coatings adhered by an oxide layer
US7867627B2 (en) 2004-12-13 2011-01-11 Silcotek Corporation Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures
US7678712B2 (en) 2005-03-22 2010-03-16 Honeywell International, Inc. Vapor phase treatment of dielectric materials
US7939172B2 (en) * 2006-05-17 2011-05-10 G & H Technologies, Llc Wear resistant vapor deposited coating, method of coating deposition and applications therefor
WO2009032488A1 (en) * 2007-08-28 2009-03-12 International Business Machines Corporation Improved low k porous sicoh dielectric and integration with post film formation treatment
US7964442B2 (en) 2007-10-09 2011-06-21 Applied Materials, Inc. Methods to obtain low k dielectric barrier with superior etch resistivity
US8278205B2 (en) * 2008-03-12 2012-10-02 Tokyo Electron Limited Semiconductor device and method for manufacturing the same
US9777368B2 (en) 2009-10-27 2017-10-03 Silcotek Corp. Chemical vapor deposition coating, article, and method
KR101854162B1 (ko) * 2010-10-05 2018-06-20 실코텍 코포레이션 내마모성 코팅, 물건 및 방법
EP2830781A2 (en) 2012-03-26 2015-02-04 Silcotek Corp. Coated article and chemical vapor deposition process
US20150030885A1 (en) 2013-07-29 2015-01-29 Silcotek Corp. Coated article and chemical vapor deposition process
US11292924B2 (en) 2014-04-08 2022-04-05 Silcotek Corp. Thermal chemical vapor deposition coated article and process

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5249554A (en) * 1993-01-08 1993-10-05 Ford Motor Company Powertrain component with adherent film having a graded composition
EP1988190A2 (en) * 2007-04-27 2008-11-05 Sandvik Intellectual Property AB Coated cutting tool
WO2009143618A1 (en) * 2008-05-28 2009-12-03 Sixtron Advanced Materials, Inc. Silicon carbide-based antireflective coating

Also Published As

Publication number Publication date
EP2625307B1 (en) 2017-11-15
JP5710770B2 (ja) 2015-04-30
KR20140138352A (ko) 2014-12-03
WO2012047945A2 (en) 2012-04-12
US20200190336A1 (en) 2020-06-18
US11807777B2 (en) 2023-11-07
WO2012047945A3 (en) 2012-05-31
CN103237920B (zh) 2016-01-13
US10604660B2 (en) 2020-03-31
US20130244025A1 (en) 2013-09-19
JP2013545889A (ja) 2013-12-26
KR101854162B1 (ko) 2018-06-20
KR20170119745A (ko) 2017-10-27
CN103237920A (zh) 2013-08-07
KR20130064819A (ko) 2013-06-18
US20230383126A1 (en) 2023-11-30
KR101790206B1 (ko) 2017-10-25
EP2625307A2 (en) 2013-08-14

Similar Documents

Publication Publication Date Title
KR101512579B1 (ko) 내마모성 코팅, 물건 및 방법
KR102018241B1 (ko) 코팅된 물품 및 화학적 기상증착방법
US10731247B2 (en) Coated article
US20150030885A1 (en) Coated article and chemical vapor deposition process
US20150064376A1 (en) Coated automotive article
US9340880B2 (en) Semiconductor fabrication process
EP2988327A1 (en) Semiconductor fabrication process
US20160289585A1 (en) Thermal chemical vapor deposition coated product and process of using a thermal vapor deposition coated product

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

Patent event date: 20130506

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination
PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20140808

Patent event code: PE09021S01D

A107 Divisional application of patent
PA0104 Divisional application for international application

Comment text: Divisional Application for International Patent

Patent event code: PA01041R01D

Patent event date: 20141110

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20150327

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20150409

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20150409

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
FPAY Annual fee payment

Payment date: 20190308

Year of fee payment: 5

PR1001 Payment of annual fee

Payment date: 20190308

Start annual number: 5

End annual number: 5

PR1001 Payment of annual fee

Payment date: 20200408

Start annual number: 6

End annual number: 6

PR1001 Payment of annual fee

Payment date: 20210407

Start annual number: 7

End annual number: 7

PR1001 Payment of annual fee

Payment date: 20230330

Start annual number: 9

End annual number: 9