JP2013532835A5 - - Google Patents

Download PDF

Info

Publication number
JP2013532835A5
JP2013532835A5 JP2013522289A JP2013522289A JP2013532835A5 JP 2013532835 A5 JP2013532835 A5 JP 2013532835A5 JP 2013522289 A JP2013522289 A JP 2013522289A JP 2013522289 A JP2013522289 A JP 2013522289A JP 2013532835 A5 JP2013532835 A5 JP 2013532835A5
Authority
JP
Japan
Prior art keywords
ion source
light
sample material
wavelength
onto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013522289A
Other languages
English (en)
Japanese (ja)
Other versions
JP5848765B2 (ja
JP2013532835A (ja
Filing date
Publication date
Priority claimed from GB1013015.1A external-priority patent/GB2486628B/en
Application filed filed Critical
Publication of JP2013532835A publication Critical patent/JP2013532835A/ja
Publication of JP2013532835A5 publication Critical patent/JP2013532835A5/ja
Application granted granted Critical
Publication of JP5848765B2 publication Critical patent/JP5848765B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013522289A 2010-08-02 2011-07-28 イオン源の少なくとも一つの表面をクリーニングする方法及び装置 Active JP5848765B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB1013015.1 2010-08-02
GB1013015.1A GB2486628B (en) 2010-08-02 2010-08-02 Methods and apparatuses for cleaning at least one surface of an ion source
PCT/GB2011/001139 WO2012017190A1 (en) 2010-08-02 2011-07-28 Methods and apparatuses for cleaning at least one surface of an ion source

Publications (3)

Publication Number Publication Date
JP2013532835A JP2013532835A (ja) 2013-08-19
JP2013532835A5 true JP2013532835A5 (enExample) 2014-08-14
JP5848765B2 JP5848765B2 (ja) 2016-01-27

Family

ID=42799504

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013522289A Active JP5848765B2 (ja) 2010-08-02 2011-07-28 イオン源の少なくとも一つの表面をクリーニングする方法及び装置

Country Status (6)

Country Link
US (1) US9468953B2 (enExample)
EP (1) EP2601671B1 (enExample)
JP (1) JP5848765B2 (enExample)
CN (1) CN103053006B (enExample)
GB (1) GB2486628B (enExample)
WO (1) WO2012017190A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140002639A1 (en) * 2011-03-25 2014-01-02 Joseph M. Cheben Autonomous Detection of Chemical Plumes
JP6316041B2 (ja) * 2014-03-18 2018-04-25 株式会社東芝 スパッタ中性粒子質量分析装置
GB2530768B (en) * 2014-10-01 2019-07-17 Kratos Analytical Ltd Method and apparatuses relating to cleaning an ion source
DE102016101908B4 (de) 2016-02-03 2017-11-02 Dengler Tubetec Gmbh Vorrichtung und Verfahren zum Biegen von Rohren
CN105728398A (zh) * 2016-04-15 2016-07-06 淮安信息职业技术学院 一种自动飞行光伏阵列表面清洁机器人
EP3567625A1 (en) * 2018-05-09 2019-11-13 Helmholtz Zentrum München - Deutsches Forschungszentrum für Gesundheit und Umwelt (GmbH) Device and method for mass spectroscopic analysis of particles
GB201809901D0 (en) 2018-06-15 2018-08-01 Ascend Diagnostics Ltd Improvements in and relating to mass spectrometers
CN112397371A (zh) * 2020-11-24 2021-02-23 中国地质科学院岩溶地质研究所 一种Sercon质谱离子源加热器
CN112605069B (zh) * 2020-12-15 2021-11-02 暨南大学 一种用于清洁质谱仪离子源极片的自动清洗装置
CN112676270B (zh) * 2020-12-24 2022-02-08 暨南大学 一种质谱仪器极片清洗装置及清洗质谱仪器极片的方法
CN117225818A (zh) * 2023-09-19 2023-12-15 安图实验仪器(郑州)有限公司 质谱仪离子源的清洁方法
CN222129718U (zh) * 2024-04-10 2024-12-10 江门市富卓家居用品有限公司 一种折叠置物篮及置物架

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01204426A (ja) 1988-02-10 1989-08-17 Nec Corp 固体表面清浄化方法およびその装置
GB2236186B (en) * 1989-08-22 1994-01-05 Finnigan Mat Gmbh Process and device for laser desorption of analyte molecular ions, especially of biomolecules
JPH07318552A (ja) * 1994-05-27 1995-12-08 Hitachi Ltd ガスクロマトグラフ質量分析計およびガスクロマトグラフ
US5654545A (en) * 1995-09-19 1997-08-05 Bruker-Franzen Analytik Gmbh Mass resolution in time-of-flight mass spectrometers with reflectors
FR2752386B1 (fr) * 1996-08-14 1998-09-11 Commissariat Energie Atomique Procede de nettoyage ou de decontamination d'un objet au moyen d'un faisceau laser ultraviolet et dispositif pour sa mise en oeuvre
JP3596397B2 (ja) 1999-12-28 2004-12-02 ウシオ電機株式会社 乾式洗浄装置
US6500268B1 (en) * 2000-08-18 2002-12-31 Silicon Genesis Corporation Dry cleaning method
GB0021902D0 (en) * 2000-09-06 2000-10-25 Kratos Analytical Ltd Ion optics system for TOF mass spectrometer
US7274015B2 (en) * 2001-08-08 2007-09-25 Sionex Corporation Capacitive discharge plasma ion source
US7405397B2 (en) 2002-03-28 2008-07-29 Mds Sciex Inc. Laser desorption ion source with ion guide coupling for ion mass spectroscopy
JP4161608B2 (ja) * 2002-04-15 2008-10-08 株式会社日立製作所 危険物探知装置
GB2398923B (en) 2003-01-15 2005-11-30 Bruker Daltonik Gmbh Method and device for cleaning desorption ion sources
JP3795023B2 (ja) * 2003-03-04 2006-07-12 三菱重工業株式会社 飛行時間型質量分析装置
US6762405B1 (en) 2003-05-30 2004-07-13 Photonics Industries International, Inc. Matrix assisted laser ionization system
US6953928B2 (en) 2003-10-31 2005-10-11 Applera Corporation Ion source and methods for MALDI mass spectrometry
US6958480B1 (en) 2004-06-25 2005-10-25 The Regents Of The University Of California Sample desorption/ionization from mesoporous silica
JP2008506268A (ja) 2004-07-09 2008-02-28 アクリオン・テクノロジーズ・インコーポレーテッド 減圧下照射による処理方法及び装置
DE102005054605B4 (de) 2005-11-16 2010-09-30 Bruker Daltonik Gmbh Automatische Reinigung von Ionenquellen
US20070284541A1 (en) 2006-06-08 2007-12-13 Vane Ronald A Oxidative cleaning method and apparatus for electron microscopes using UV excitation in a oxygen radical source
DE102008008634B4 (de) 2008-02-12 2011-07-07 Bruker Daltonik GmbH, 28359 Automatische Reinigung von MALDI-Ionenquellen
DE102008001812B4 (de) * 2008-05-15 2013-05-29 Carl Zeiss Microscopy Gmbh Positioniereinrichtung für ein Teilchenstrahlgerät

Similar Documents

Publication Publication Date Title
JP2013532835A5 (enExample)
JP2007127653A5 (enExample)
JP5848765B2 (ja) イオン源の少なくとも一つの表面をクリーニングする方法及び装置
TWI273753B (en) Laser processing apparatus and method using polygon mirror
TW200949458A (en) Lithographic apparatus, device manufacutring method, cleaning system and method for cleaning a patterning device
JP2010158686A (ja) レーザ加工用光学装置、レーザ加工装置およびレーザ加工方法
WO2009104886A3 (ko) 레이저 가공장치
JP2008545479A5 (enExample)
JP2001057298A5 (enExample)
EP1783816A3 (en) Apparatus for combined laser focusing and spot imaging
WO2008044924A3 (en) Cleaning method, apparatus and cleaning system
KR20140143812A (ko) 레이저 어닐 장치 및 레이저 어닐 방법
JP2012528357A5 (enExample)
TW200734070A (en) Method for removing a coating from a substrate using a defocused laser beam
JP2011039290A5 (enExample)
JP2020537817A (ja) 仮ボンディングされた基板スタックを分離させるための装置および方法
WO2018074106A1 (ja) レーザリフトオフ装置及びレーザリフトオフ方法
JP7130783B2 (ja) 光をアブレーションすることによって洗浄を改善したイオン源
CN106164776B (zh) 用于清洁对象的装置
CN108351601A (zh) 具有涂覆于圆柱形对称元件上的靶材料的基于等离子体的光源
JP2008147314A5 (enExample)
EP1717638A3 (en) Extreme UV radiation exposure apparatus and extreme UV radiation source
WO2011016427A1 (ja) エネルギー付与装置およびエネルギー付与方法
TWI747635B (zh) 光掩模表膜殘膠移除
CN107107127B (zh) 关于清洁离子源的方法和装置