JP2008147314A5 - - Google Patents

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Publication number
JP2008147314A5
JP2008147314A5 JP2006331128A JP2006331128A JP2008147314A5 JP 2008147314 A5 JP2008147314 A5 JP 2008147314A5 JP 2006331128 A JP2006331128 A JP 2006331128A JP 2006331128 A JP2006331128 A JP 2006331128A JP 2008147314 A5 JP2008147314 A5 JP 2008147314A5
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JP
Japan
Prior art keywords
substrate
cleaning
laser light
pulse width
separation time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006331128A
Other languages
English (en)
Japanese (ja)
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JP2008147314A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006331128A priority Critical patent/JP2008147314A/ja
Priority claimed from JP2006331128A external-priority patent/JP2008147314A/ja
Priority to US11/950,889 priority patent/US20090020137A1/en
Publication of JP2008147314A publication Critical patent/JP2008147314A/ja
Publication of JP2008147314A5 publication Critical patent/JP2008147314A5/ja
Withdrawn legal-status Critical Current

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JP2006331128A 2006-12-07 2006-12-07 洗浄装置及び方法、洗浄装置を有する露光装置 Withdrawn JP2008147314A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006331128A JP2008147314A (ja) 2006-12-07 2006-12-07 洗浄装置及び方法、洗浄装置を有する露光装置
US11/950,889 US20090020137A1 (en) 2006-12-07 2007-12-05 Cleaning apparatus and method, exposure apparatus having the cleaning apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006331128A JP2008147314A (ja) 2006-12-07 2006-12-07 洗浄装置及び方法、洗浄装置を有する露光装置

Publications (2)

Publication Number Publication Date
JP2008147314A JP2008147314A (ja) 2008-06-26
JP2008147314A5 true JP2008147314A5 (enExample) 2010-01-28

Family

ID=39607180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006331128A Withdrawn JP2008147314A (ja) 2006-12-07 2006-12-07 洗浄装置及び方法、洗浄装置を有する露光装置

Country Status (2)

Country Link
US (1) US20090020137A1 (enExample)
JP (1) JP2008147314A (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100192973A1 (en) * 2009-01-19 2010-08-05 Yoshifumi Ueno Extreme ultraviolet light source apparatus and cleaning method
JP2010236088A (ja) * 2009-03-09 2010-10-21 Hitachi High-Technologies Corp マスク部材のクリーニング装置及びクリーニング方法並びに有機ｅｌディスプレイ
US8987632B2 (en) * 2009-10-09 2015-03-24 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Modification of surface energy via direct laser ablative surface patterning
NL2008335A (en) * 2011-04-07 2012-10-09 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and method of correcting a mask.
CN102621823A (zh) * 2012-04-17 2012-08-01 中国科学院上海光学精密机械研究所 多光束并行激光直写装置及其直写方法
US9278374B2 (en) 2012-06-08 2016-03-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Modified surface having low adhesion properties to mitigate insect residue adhesion
WO2014051121A1 (ja) * 2012-09-28 2014-04-03 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP5943306B2 (ja) * 2012-10-30 2016-07-05 大日本印刷株式会社 反射型マスクの製造方法およびマスクブランクの製造方法
JP6313585B2 (ja) * 2013-12-10 2018-04-18 キヤノン株式会社 露光装置及び物品の製造方法
JP6619625B2 (ja) * 2015-11-18 2019-12-11 浜松ホトニクス株式会社 電極のクリーニング方法および集積回路装置の製造方法
DK201800236A1 (en) * 2018-05-25 2019-06-12 FLEXO WASH HOLDING ApS Cleaning Apparatus and Method for Laser Cleaning of a Printing Plate
EP3693796A1 (en) * 2019-02-08 2020-08-12 ASML Netherlands B.V. Lithographic apparatus and method of cleaning
CN110523715A (zh) * 2019-08-28 2019-12-03 中国人民解放军国防科技大学 一种铝合金反射镜表面超快激光清洗的方法及装置
CN112547698A (zh) * 2020-12-09 2021-03-26 云南电网有限责任公司临沧供电局 一种镜片在线激光清洗装置和方法
US11815821B2 (en) * 2021-03-19 2023-11-14 Taiwan Semiconductor Manufacturing Company, Ltd. Module vessel with scrubber gutters sized to prevent overflow
US11687012B2 (en) * 2021-06-25 2023-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Reduce mask defect impact by contamination decompose
WO2025100680A1 (ko) * 2023-11-06 2025-05-15 주식회사 코윈디에스티 웨이퍼 클리너 장치

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588885A (en) * 1984-02-07 1986-05-13 International Technical Associates Method of and apparatus for the removal of paint and the like from a substrate
DE3721940A1 (de) * 1987-07-02 1989-01-12 Ibm Deutschland Entfernen von partikeln von oberflaechen fester koerper durch laserbeschuss
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
US5099557A (en) * 1988-07-08 1992-03-31 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
US5821175A (en) * 1988-07-08 1998-10-13 Cauldron Limited Partnership Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface
US5643472A (en) * 1988-07-08 1997-07-01 Cauldron Limited Partnership Selective removal of material by irradiation
US5024968A (en) * 1988-07-08 1991-06-18 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
US6048588A (en) * 1988-07-08 2000-04-11 Cauldron Limited Partnership Method for enhancing chemisorption of material
TW284907B (en) * 1995-06-07 1996-09-01 Cauldron Lp Removal of material by polarized irradiation and back side application for radiation
US5720894A (en) * 1996-01-11 1998-02-24 The Regents Of The University Of California Ultrashort pulse high repetition rate laser system for biological tissue processing
JPH11224839A (ja) * 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
US6794602B2 (en) * 2001-10-18 2004-09-21 General Electric Company Method and apparatus for cleaning generator and turbine components
US6750423B2 (en) * 2001-10-25 2004-06-15 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method, laser irradiation apparatus, and method of manufacturing a semiconductor device

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