JP2014220471A5 - - Google Patents

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Publication number
JP2014220471A5
JP2014220471A5 JP2013100693A JP2013100693A JP2014220471A5 JP 2014220471 A5 JP2014220471 A5 JP 2014220471A5 JP 2013100693 A JP2013100693 A JP 2013100693A JP 2013100693 A JP2013100693 A JP 2013100693A JP 2014220471 A5 JP2014220471 A5 JP 2014220471A5
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JP
Japan
Prior art keywords
substrate
heating
resist
resist film
heating source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013100693A
Other languages
English (en)
Japanese (ja)
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JP6020344B2 (ja
JP2014220471A (ja
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Publication date
Application filed filed Critical
Priority to JP2013100693A priority Critical patent/JP6020344B2/ja
Priority claimed from JP2013100693A external-priority patent/JP6020344B2/ja
Priority to TW103115809A priority patent/TWI607490B/zh
Priority to US14/889,564 priority patent/US10459339B2/en
Priority to PCT/JP2014/062384 priority patent/WO2014181837A1/ja
Publication of JP2014220471A publication Critical patent/JP2014220471A/ja
Publication of JP2014220471A5 publication Critical patent/JP2014220471A5/ja
Application granted granted Critical
Publication of JP6020344B2 publication Critical patent/JP6020344B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013100693A 2013-05-10 2013-05-10 レジストパターン形成方法、塗布、現像装置、記憶媒体 Active JP6020344B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013100693A JP6020344B2 (ja) 2013-05-10 2013-05-10 レジストパターン形成方法、塗布、現像装置、記憶媒体
TW103115809A TWI607490B (zh) 2013-05-10 2014-05-02 Photoresist pattern forming method, coating, developing device, memory medium
US14/889,564 US10459339B2 (en) 2013-05-10 2014-05-08 Resist pattern forming method, coating and developing apparatus and storage medium
PCT/JP2014/062384 WO2014181837A1 (ja) 2013-05-10 2014-05-08 レジストパターン形成方法、塗布、現像装置及び記憶媒体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013100693A JP6020344B2 (ja) 2013-05-10 2013-05-10 レジストパターン形成方法、塗布、現像装置、記憶媒体

Publications (3)

Publication Number Publication Date
JP2014220471A JP2014220471A (ja) 2014-11-20
JP2014220471A5 true JP2014220471A5 (enExample) 2015-07-02
JP6020344B2 JP6020344B2 (ja) 2016-11-02

Family

ID=51867314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013100693A Active JP6020344B2 (ja) 2013-05-10 2013-05-10 レジストパターン形成方法、塗布、現像装置、記憶媒体

Country Status (4)

Country Link
US (1) US10459339B2 (enExample)
JP (1) JP6020344B2 (enExample)
TW (1) TWI607490B (enExample)
WO (1) WO2014181837A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7124277B2 (ja) * 2016-12-13 2022-08-24 東京エレクトロン株式会社 光処理装置及び基板処理装置
KR102513167B1 (ko) * 2018-06-15 2023-03-23 매슨 테크놀로지 인크 워크피스의 노광 후 베이크 공정을 위한 방법 및 장치
US12305174B2 (en) 2018-09-04 2025-05-20 Universidad De La Republica Genetically modified bacteria producing three DNA repair enzymes and method for the evaluation of DNA repair activity
US20230152705A1 (en) * 2021-11-17 2023-05-18 Tokyo Electron Limited UV Treatment of EUV Resists

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02230252A (ja) * 1989-03-03 1990-09-12 Nec Corp パターン形成方法
JP2682437B2 (ja) * 1994-04-22 1997-11-26 日本電気株式会社 露光方法およびその装置
JP2004327688A (ja) * 2003-04-24 2004-11-18 Nippon Telegr & Teleph Corp <Ntt> レジスト現像方法及びレジスト現像装置
JP4804332B2 (ja) * 2006-12-22 2011-11-02 東京エレクトロン株式会社 ベーキング装置及び基板処理装置
JP4788610B2 (ja) 2007-01-17 2011-10-05 東京エレクトロン株式会社 加熱装置、塗布、現像装置、加熱方法及び記憶媒体
JP5290129B2 (ja) * 2008-12-25 2013-09-18 信越化学工業株式会社 化学増幅ポジ型レジスト組成物及びレジストパターン形成方法
JP4853536B2 (ja) * 2009-03-13 2012-01-11 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP2011099956A (ja) * 2009-11-05 2011-05-19 Toppan Printing Co Ltd レジストのベーク方法及びベーク装置
JP5107372B2 (ja) * 2010-02-04 2012-12-26 東京エレクトロン株式会社 熱処理装置、塗布現像処理システム、熱処理方法、塗布現像処理方法及びその熱処理方法又は塗布現像処理方法を実行させるためのプログラムを記録した記録媒体
JP2011204774A (ja) * 2010-03-24 2011-10-13 Toshiba Corp パターン形成方法および脱水装置
JP5964567B2 (ja) * 2011-09-26 2016-08-03 株式会社Screenホールディングス 熱処理方法および熱処理装置

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