JP2010181861A5 - - Google Patents

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Publication number
JP2010181861A5
JP2010181861A5 JP2009229734A JP2009229734A JP2010181861A5 JP 2010181861 A5 JP2010181861 A5 JP 2010181861A5 JP 2009229734 A JP2009229734 A JP 2009229734A JP 2009229734 A JP2009229734 A JP 2009229734A JP 2010181861 A5 JP2010181861 A5 JP 2010181861A5
Authority
JP
Japan
Prior art keywords
optical system
projection optical
shutter
exposure apparatus
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009229734A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010181861A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009229734A priority Critical patent/JP2010181861A/ja
Priority claimed from JP2009229734A external-priority patent/JP2010181861A/ja
Priority to KR1020090131424A priority patent/KR20100081927A/ko
Priority to US12/652,985 priority patent/US8363207B2/en
Publication of JP2010181861A publication Critical patent/JP2010181861A/ja
Publication of JP2010181861A5 publication Critical patent/JP2010181861A5/ja
Priority to KR1020130029056A priority patent/KR20130032893A/ko
Pending legal-status Critical Current

Links

JP2009229734A 2009-01-06 2009-10-01 露光装置、及びそれを用いたデバイスの製造方法 Pending JP2010181861A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009229734A JP2010181861A (ja) 2009-01-06 2009-10-01 露光装置、及びそれを用いたデバイスの製造方法
KR1020090131424A KR20100081927A (ko) 2009-01-06 2009-12-28 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법
US12/652,985 US8363207B2 (en) 2009-01-06 2010-01-06 Exposure apparatus, and method of manufacturing device using same
KR1020130029056A KR20130032893A (ko) 2009-01-06 2013-03-19 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009001015 2009-01-06
JP2009229734A JP2010181861A (ja) 2009-01-06 2009-10-01 露光装置、及びそれを用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2010181861A JP2010181861A (ja) 2010-08-19
JP2010181861A5 true JP2010181861A5 (enExample) 2012-11-15

Family

ID=42311918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009229734A Pending JP2010181861A (ja) 2009-01-06 2009-10-01 露光装置、及びそれを用いたデバイスの製造方法

Country Status (3)

Country Link
US (1) US8363207B2 (enExample)
JP (1) JP2010181861A (enExample)
KR (2) KR20100081927A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9235134B2 (en) * 2010-08-16 2016-01-12 Micron Technology, Inc. Lens heating compensation in photolithography
JP2012234110A (ja) * 2011-05-09 2012-11-29 Canon Inc 露光装置、およびそれを用いたデバイスの製造方法
CN102411264B (zh) * 2011-11-22 2014-07-16 上海华力微电子有限公司 光刻机投影物镜温度均衡装置及均衡方法
CN204406005U (zh) * 2015-02-28 2015-06-17 成都京东方光电科技有限公司 光取向设备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63266821A (ja) * 1987-04-24 1988-11-02 Nippon Telegr & Teleph Corp <Ntt> 紫外線露光装置
JP2682067B2 (ja) * 1988-10-17 1997-11-26 株式会社ニコン 露光装置及び露光方法
JPH03222405A (ja) 1990-01-29 1991-10-01 Hitachi Ltd 露光装置およびそれに用いられる空露光方法
US6078380A (en) * 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
US5677757A (en) * 1994-03-29 1997-10-14 Nikon Corporation Projection exposure apparatus
US5995263A (en) * 1993-11-12 1999-11-30 Nikon Corporation Projection exposure apparatus
JP3552221B2 (ja) * 1995-09-11 2004-08-11 株式会社ニコン 投影露光装置
JPH09199384A (ja) * 1996-01-23 1997-07-31 Nec Kyushu Ltd 露光装置及び露光方法
JP2001351850A (ja) 2000-06-08 2001-12-21 Canon Inc 半導体製造装置および半導体デバイス製造方法
JP3341767B2 (ja) * 2001-10-10 2002-11-05 株式会社ニコン 投影露光装置及び方法、並びに回路素子形成方法

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