JP2008118062A5 - - Google Patents

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Publication number
JP2008118062A5
JP2008118062A5 JP2006302137A JP2006302137A JP2008118062A5 JP 2008118062 A5 JP2008118062 A5 JP 2008118062A5 JP 2006302137 A JP2006302137 A JP 2006302137A JP 2006302137 A JP2006302137 A JP 2006302137A JP 2008118062 A5 JP2008118062 A5 JP 2008118062A5
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JP
Japan
Prior art keywords
exposure
substrate
shutter
exposed
correction information
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006302137A
Other languages
English (en)
Japanese (ja)
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JP2008118062A (ja
JP5100088B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2006302137A priority Critical patent/JP5100088B2/ja
Priority claimed from JP2006302137A external-priority patent/JP5100088B2/ja
Priority to TW096141897A priority patent/TWI388937B/zh
Priority to US11/935,814 priority patent/US7936446B2/en
Priority to KR1020070112939A priority patent/KR100972240B1/ko
Publication of JP2008118062A publication Critical patent/JP2008118062A/ja
Publication of JP2008118062A5 publication Critical patent/JP2008118062A5/ja
Application granted granted Critical
Publication of JP5100088B2 publication Critical patent/JP5100088B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006302137A 2006-11-07 2006-11-07 露光装置及びデバイス製造方法 Active JP5100088B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006302137A JP5100088B2 (ja) 2006-11-07 2006-11-07 露光装置及びデバイス製造方法
TW096141897A TWI388937B (zh) 2006-11-07 2007-11-06 曝光設備及裝置製造方法
US11/935,814 US7936446B2 (en) 2006-11-07 2007-11-06 Exposure apparatus and device manufacturing method
KR1020070112939A KR100972240B1 (ko) 2006-11-07 2007-11-07 노광 장치 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006302137A JP5100088B2 (ja) 2006-11-07 2006-11-07 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008118062A JP2008118062A (ja) 2008-05-22
JP2008118062A5 true JP2008118062A5 (enExample) 2009-12-24
JP5100088B2 JP5100088B2 (ja) 2012-12-19

Family

ID=39359445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006302137A Active JP5100088B2 (ja) 2006-11-07 2006-11-07 露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US7936446B2 (enExample)
JP (1) JP5100088B2 (enExample)
KR (1) KR100972240B1 (enExample)
TW (1) TWI388937B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5173650B2 (ja) * 2008-07-29 2013-04-03 キヤノン株式会社 露光装置およびデバイス製造方法
KR101154779B1 (ko) * 2011-03-11 2012-06-18 하이디스 테크놀로지 주식회사 포토 리소그래피 방법
TWI436030B (zh) 2012-07-04 2014-05-01 Test Research Inc 三維量測系統
CN103528541B (zh) * 2012-07-04 2016-05-04 德律科技股份有限公司 三维测量系统
JP6861463B2 (ja) 2015-06-16 2021-04-21 キヤノン株式会社 露光装置及び物品の製造方法
KR102355296B1 (ko) * 2017-08-08 2022-01-25 삼성전자주식회사 반도체 메모리 장치 및 이의 제조를 위한 반도체 메모리 제조 장치
JP7352332B2 (ja) * 2018-05-14 2023-09-28 キヤノン株式会社 露光装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5771132A (en) * 1980-10-21 1982-05-01 Canon Inc Exposure controlling system
JPS6134252A (ja) 1984-07-20 1986-02-18 津田駒工業株式会社 織機における不良緯糸の自動引出方法と装置
JPH0555106A (ja) * 1991-08-28 1993-03-05 Canon Inc 露光量制御装置
JP2843895B2 (ja) * 1991-10-01 1999-01-06 キヤノン株式会社 露光装置
JP3103461B2 (ja) * 1993-06-29 2000-10-30 キヤノン株式会社 Ｘ線露光方法と装置、並びにデバイス製造方法
JPH06120103A (ja) * 1992-10-07 1994-04-28 Canon Inc 露光装置
JPH09320938A (ja) * 1996-05-29 1997-12-12 Nikon Corp 投影露光装置
JPH10284371A (ja) 1997-04-03 1998-10-23 Nikon Corp 露光方法及び装置
KR100616293B1 (ko) * 1999-11-11 2006-08-28 동경 엘렉트론 주식회사 기판처리장치 및 기판처리방법
JP2005252161A (ja) * 2004-03-08 2005-09-15 Powerchip Semiconductor Corp フォトリソグラフィーシステム及び関連方法
JP5025250B2 (ja) * 2006-12-15 2012-09-12 キヤノン株式会社 露光装置及びデバイス製造方法
JP5173650B2 (ja) * 2008-07-29 2013-04-03 キヤノン株式会社 露光装置およびデバイス製造方法

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