JP2009300798A5 - - Google Patents

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Publication number
JP2009300798A5
JP2009300798A5 JP2008156015A JP2008156015A JP2009300798A5 JP 2009300798 A5 JP2009300798 A5 JP 2009300798A5 JP 2008156015 A JP2008156015 A JP 2008156015A JP 2008156015 A JP2008156015 A JP 2008156015A JP 2009300798 A5 JP2009300798 A5 JP 2009300798A5
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JP
Japan
Prior art keywords
substrate
original
stage
mark
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008156015A
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English (en)
Japanese (ja)
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JP2009300798A (ja
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Publication date
Application filed filed Critical
Priority to JP2008156015A priority Critical patent/JP2009300798A/ja
Priority claimed from JP2008156015A external-priority patent/JP2009300798A/ja
Publication of JP2009300798A publication Critical patent/JP2009300798A/ja
Publication of JP2009300798A5 publication Critical patent/JP2009300798A5/ja
Pending legal-status Critical Current

Links

JP2008156015A 2008-06-13 2008-06-13 露光装置およびデバイス製造方法 Pending JP2009300798A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008156015A JP2009300798A (ja) 2008-06-13 2008-06-13 露光装置およびデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008156015A JP2009300798A (ja) 2008-06-13 2008-06-13 露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2009300798A JP2009300798A (ja) 2009-12-24
JP2009300798A5 true JP2009300798A5 (enExample) 2011-07-28

Family

ID=41547754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008156015A Pending JP2009300798A (ja) 2008-06-13 2008-06-13 露光装置およびデバイス製造方法

Country Status (1)

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JP (1) JP2009300798A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6329435B2 (ja) * 2014-05-27 2018-05-23 キヤノン株式会社 計測装置、リソグラフィ装置、物品の製造方法、及び計測方法
JP6584170B2 (ja) * 2015-07-02 2019-10-02 キヤノン株式会社 検出装置、リソグラフィ装置、物品の製造方法、および検出方法
US10514617B2 (en) * 2015-09-30 2019-12-24 Nikon Corporation Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3531894B2 (ja) * 1996-09-13 2004-05-31 キヤノン株式会社 投影露光装置
JPH10125594A (ja) * 1996-10-22 1998-05-15 Nikon Corp ステージ制御装置及び露光装置
JP3548428B2 (ja) * 1998-07-03 2004-07-28 キヤノン株式会社 位置計測装置及びそれを用いたデバイスの製造方法
JP2000347741A (ja) * 1999-06-07 2000-12-15 Nikon Corp ステージ制御装置、ステージ装置、及び露光装置

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