TW200643648A - Exposure apparatus and exposure method - Google Patents

Exposure apparatus and exposure method

Info

Publication number
TW200643648A
TW200643648A TW095107019A TW95107019A TW200643648A TW 200643648 A TW200643648 A TW 200643648A TW 095107019 A TW095107019 A TW 095107019A TW 95107019 A TW95107019 A TW 95107019A TW 200643648 A TW200643648 A TW 200643648A
Authority
TW
Taiwan
Prior art keywords
exposure
substrate
stage
units
exposure unit
Prior art date
Application number
TW095107019A
Other languages
Chinese (zh)
Other versions
TWI350946B (en
Inventor
Hiroki Tanikawa
Takeshi Tsuneyoshi
Masanori Tao
Toru Ito
Shinya Izumida
Original Assignee
Toray Eng Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Eng Co Ltd filed Critical Toray Eng Co Ltd
Publication of TW200643648A publication Critical patent/TW200643648A/en
Application granted granted Critical
Publication of TWI350946B publication Critical patent/TWI350946B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/708—Mark formation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laser Beam Processing (AREA)

Abstract

To provide an exposure apparatus and an exposure method for obtaining an exposure image of high quality in a short tact time in an inexpensive apparatus configuration. The apparatus is equipped with: a light source device 5; a stage 3 to mount a substrate K; a plurality of exposure units 7 which are disposed above the stage as relatively movable at a constant velocity with respect to the stage and are arranged, in a plan view, as different level from one another in the relative moving direction X to form an oblique line, and which have a configuration to irradiate a substrate with laser light to project a marking display 72M formed by respective DMDs 72; and switching means 65, 75 which change the laser light of the exposure units irradiating the substrate in an order from an exposure unit 7A which first passes over the substrate to an exposure unit 7C which passes last over the substrate, in each period when the stage and the exposure units relatively move against each other at a distance D1 from an exposure finish position P0 of one exposure unit in adjacent exposure units to an exposure start position P1 of the other exposure unit.
TW095107019A 2005-03-18 2006-03-02 Exposure apparatus and exposure method TW200643648A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005079425A JP4664102B2 (en) 2005-03-18 2005-03-18 Exposure apparatus and exposure method

Publications (2)

Publication Number Publication Date
TW200643648A true TW200643648A (en) 2006-12-16
TWI350946B TWI350946B (en) 2011-10-21

Family

ID=37002592

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095107019A TW200643648A (en) 2005-03-18 2006-03-02 Exposure apparatus and exposure method

Country Status (4)

Country Link
JP (1) JP4664102B2 (en)
KR (1) KR100908548B1 (en)
CN (1) CN100517076C (en)
TW (1) TW200643648A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4491444B2 (en) * 2005-11-04 2010-06-30 株式会社オーク製作所 Laser beam / ultraviolet irradiation peripheral exposure apparatus and method
JP4491445B2 (en) * 2005-11-04 2010-06-30 株式会社オーク製作所 Peripheral exposure apparatus and method
JP4533874B2 (en) * 2005-11-04 2010-09-01 株式会社オーク製作所 Laser beam exposure system
JP4491447B2 (en) * 2005-11-04 2010-06-30 株式会社オーク製作所 Laser beam / ultraviolet irradiation peripheral exposure apparatus and method
JP4491446B2 (en) * 2005-11-04 2010-06-30 株式会社オーク製作所 Peripheral exposure apparatus and method
CN100593469C (en) * 2007-02-12 2010-03-10 深圳市大族激光科技股份有限公司 Modularization exposure system
JP2011013512A (en) * 2009-07-03 2011-01-20 Orc Manufacturing Co Ltd Peripheral exposure apparatus
TWI454687B (en) * 2009-08-03 2014-10-01 Toray Eng Co Ltd Marking device and method
CN102514385B (en) * 2011-11-29 2015-04-15 深圳市华星光电技术有限公司 Identification code printing method and identification code printing device
JP5896459B2 (en) 2012-03-06 2016-03-30 東レエンジニアリング株式会社 Marking apparatus and method
CN109116593B (en) * 2018-08-02 2021-07-20 深圳市华星光电半导体显示技术有限公司 Method for exposing master plate

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08150485A (en) * 1994-11-28 1996-06-11 Komatsu Ltd Laser marking device
JPH08224675A (en) * 1995-02-22 1996-09-03 Toshiba Corp Device for forming marking pattern
JP4356161B2 (en) * 1999-12-20 2009-11-04 株式会社安川電機 Drawing device
KR100322621B1 (en) * 1999-12-31 2002-03-18 황인길 Device for marking identification using the athletic liquid crystal display
JP2001205462A (en) * 2000-01-26 2001-07-31 Nec Corp Laser marking device and method of laser marking
JP3321733B2 (en) * 2000-09-20 2002-09-09 東レエンジニアリング株式会社 Exposure equipment
JP3547418B2 (en) * 2001-10-25 2004-07-28 三菱商事株式会社 Method and apparatus for marking liquid crystal panel by laser beam
JP2003290939A (en) * 2002-03-28 2003-10-14 Sunx Ltd Laser marking device

Also Published As

Publication number Publication date
JP2006259515A (en) 2006-09-28
TWI350946B (en) 2011-10-21
CN1834789A (en) 2006-09-20
CN100517076C (en) 2009-07-22
JP4664102B2 (en) 2011-04-06
KR20060101337A (en) 2006-09-22
KR100908548B1 (en) 2009-07-20

Similar Documents

Publication Publication Date Title
TW200643648A (en) Exposure apparatus and exposure method
TW200707122A (en) Exposure method and apparatus
DE602007009729D1 (en) Method and apparatus for generating superimposed structures on a substrate
EP2199859A3 (en) Exposure apparatus, exposure method, and device producing method
TW200602813A (en) Lithographic apparatus and device manufacturing method
TW200745772A (en) Exposure apparatus and device manufacturing method
EP1612850A4 (en) Exposure apparatus and method for manufacturing device
WO2009035129A3 (en) Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
TW200731023A (en) System and method for compensating for radiation induced thermal distortions
SG114755A1 (en) Lithographic apparatus and device manufacturing method
EP1564593A3 (en) Exposure apparatus and exposure method
EP3093873A3 (en) Exposure apparatus, exposure method, and method for producing device
ATE489724T1 (en) EXPOSURE DEVICE AND METHOD FOR PRODUCING COMPONENTS
EP1770443A3 (en) Laser processing apparatus, exposure apparatus and exposure method
ATE453209T1 (en) EXPOSURE DEVICE AND COMPONENT PRODUCTION METHOD
TW200611079A (en) Lithographic apparatus, control system and device manufacturing method
TW200703456A (en) Pattern writing apparatus and block number determining method
TW200628996A (en) Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
ATE553407T1 (en) DEVICE AND METHOD FOR GENERATING AN IMAGE OF AN OBJECT
SG139682A1 (en) System and method to compensate for critical dimension non-uniformity in a lithography system
EP1705695A4 (en) Exposure apparatus and device producing method
TW200628998A (en) Lithographic apparatus and device manufacturing method
WO2008057523A3 (en) Method and apparatus for bidirectional control of the color and diffusion of a light beam
GB0509727D0 (en) Method and apparatus for scale manufacture
SG10201709477TA (en) Imprint apparatus, imprinting method, and method for manufacturing article