JP2004289120A5 - - Google Patents

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Publication number
JP2004289120A5
JP2004289120A5 JP2003393098A JP2003393098A JP2004289120A5 JP 2004289120 A5 JP2004289120 A5 JP 2004289120A5 JP 2003393098 A JP2003393098 A JP 2003393098A JP 2003393098 A JP2003393098 A JP 2003393098A JP 2004289120 A5 JP2004289120 A5 JP 2004289120A5
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JP
Japan
Prior art keywords
projection apparatus
lithographic projection
electrode
negative potential
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003393098A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004289120A (ja
JP4058404B2 (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2004289120A publication Critical patent/JP2004289120A/ja
Publication of JP2004289120A5 publication Critical patent/JP2004289120A5/ja
Application granted granted Critical
Publication of JP4058404B2 publication Critical patent/JP4058404B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003393098A 2002-10-18 2003-10-20 リソグラフィ投影装置およびリソグラフィ工程により集積構造を製造する方法 Expired - Fee Related JP4058404B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02079329 2002-10-18

Publications (3)

Publication Number Publication Date
JP2004289120A JP2004289120A (ja) 2004-10-14
JP2004289120A5 true JP2004289120A5 (enExample) 2005-05-26
JP4058404B2 JP4058404B2 (ja) 2008-03-12

Family

ID=32668752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003393098A Expired - Fee Related JP4058404B2 (ja) 2002-10-18 2003-10-20 リソグラフィ投影装置およびリソグラフィ工程により集積構造を製造する方法

Country Status (7)

Country Link
US (1) US6791665B2 (enExample)
JP (1) JP4058404B2 (enExample)
KR (1) KR100544357B1 (enExample)
CN (1) CN1327296C (enExample)
DE (1) DE60323584D1 (enExample)
SG (1) SG115575A1 (enExample)
TW (1) TWI294995B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US7135692B2 (en) * 2003-12-04 2006-11-14 Asml Netherlands B.V. Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
US7800079B2 (en) * 2003-12-22 2010-09-21 Asml Netherlands B.V. Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7405417B2 (en) * 2005-12-20 2008-07-29 Asml Netherlands B.V. Lithographic apparatus having a monitoring device for detecting contamination
US7629594B2 (en) * 2006-10-10 2009-12-08 Asml Netherlands B.V. Lithographic apparatus, and device manufacturing method
US7825390B2 (en) * 2007-02-14 2010-11-02 Asml Netherlands B.V. Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
JP2010257998A (ja) * 2007-11-26 2010-11-11 Nikon Corp 反射投影光学系、露光装置、及びデバイスの製造方法
NL1036769A1 (nl) * 2008-04-23 2009-10-26 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device.
DE102013218748A1 (de) * 2013-09-18 2014-10-02 Carl Zeiss Smt Gmbh Optisches Bauelement
EP3953766A1 (en) * 2019-04-09 2022-02-16 Kulicke & Soffa Liteq B.V. Lithographic systems and methods of operating the same
KR102829107B1 (ko) * 2019-05-02 2025-07-07 삼성전자주식회사 Euv 노광 장치 및 그를 이용한 반도체 소자의 제조 방법
CN115210970B (zh) * 2020-03-03 2025-09-12 西默有限公司 用于光源的控制系统
JP6844798B1 (ja) * 2020-05-26 2021-03-17 レーザーテック株式会社 光学装置、及び光学装置の汚染防止方法
CN118265951A (zh) * 2021-11-25 2024-06-28 Asml荷兰有限公司 一种光学装置、照射系统、投影系统、euv辐射源、光刻设备、污染沉积防止方法以及光学部件翻新方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP2000100685A (ja) 1998-09-17 2000-04-07 Nikon Corp 露光装置及び該装置を用いた露光方法
CA2349912A1 (en) * 2000-07-07 2002-01-07 Heidelberger Druckmaschinen Aktiengesellschaft Setting an image on a printing plate using ultrashort laser pulses
EP1182510B1 (en) 2000-08-25 2006-04-12 ASML Netherlands B.V. Lithographic projection apparatus
US6781673B2 (en) * 2000-08-25 2004-08-24 Asml Netherlands B.V. Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby
GB0031194D0 (en) 2000-12-21 2001-01-31 Eastman Kodak Co Processing photographic material
EP1223468B1 (en) * 2001-01-10 2008-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
DE10138284A1 (de) 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren

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