JP2008147314A - 洗浄装置及び方法、洗浄装置を有する露光装置 - Google Patents

洗浄装置及び方法、洗浄装置を有する露光装置 Download PDF

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Publication number
JP2008147314A
JP2008147314A JP2006331128A JP2006331128A JP2008147314A JP 2008147314 A JP2008147314 A JP 2008147314A JP 2006331128 A JP2006331128 A JP 2006331128A JP 2006331128 A JP2006331128 A JP 2006331128A JP 2008147314 A JP2008147314 A JP 2008147314A
Authority
JP
Japan
Prior art keywords
cleaning
substrate
mask
laser
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006331128A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008147314A5 (enExample
Inventor
Masaru Osawa
大 大沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2006331128A priority Critical patent/JP2008147314A/ja
Priority to US11/950,889 priority patent/US20090020137A1/en
Publication of JP2008147314A publication Critical patent/JP2008147314A/ja
Publication of JP2008147314A5 publication Critical patent/JP2008147314A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning In General (AREA)
JP2006331128A 2006-12-07 2006-12-07 洗浄装置及び方法、洗浄装置を有する露光装置 Withdrawn JP2008147314A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006331128A JP2008147314A (ja) 2006-12-07 2006-12-07 洗浄装置及び方法、洗浄装置を有する露光装置
US11/950,889 US20090020137A1 (en) 2006-12-07 2007-12-05 Cleaning apparatus and method, exposure apparatus having the cleaning apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006331128A JP2008147314A (ja) 2006-12-07 2006-12-07 洗浄装置及び方法、洗浄装置を有する露光装置

Publications (2)

Publication Number Publication Date
JP2008147314A true JP2008147314A (ja) 2008-06-26
JP2008147314A5 JP2008147314A5 (enExample) 2010-01-28

Family

ID=39607180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006331128A Withdrawn JP2008147314A (ja) 2006-12-07 2006-12-07 洗浄装置及び方法、洗浄装置を有する露光装置

Country Status (2)

Country Link
US (1) US20090020137A1 (enExample)
JP (1) JP2008147314A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012222355A (ja) * 2011-04-07 2012-11-12 Asml Netherlands Bv リソグラフィ装置、デバイス製造方法およびマスクを補正する方法
WO2014051121A1 (ja) * 2012-09-28 2014-04-03 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP2014090095A (ja) * 2012-10-30 2014-05-15 Dainippon Printing Co Ltd 反射型マスクの製造方法およびマスクブランクの製造方法
JP2017098302A (ja) * 2015-11-18 2017-06-01 浜松ホトニクス株式会社 電極のクリーニング方法および集積回路装置の製造方法
WO2025100680A1 (ko) * 2023-11-06 2025-05-15 주식회사 코윈디에스티 웨이퍼 클리너 장치

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100192973A1 (en) * 2009-01-19 2010-08-05 Yoshifumi Ueno Extreme ultraviolet light source apparatus and cleaning method
JP2010236088A (ja) * 2009-03-09 2010-10-21 Hitachi High-Technologies Corp マスク部材のクリーニング装置及びクリーニング方法並びに有機ｅｌディスプレイ
US8987632B2 (en) * 2009-10-09 2015-03-24 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Modification of surface energy via direct laser ablative surface patterning
CN102621823A (zh) * 2012-04-17 2012-08-01 中国科学院上海光学精密机械研究所 多光束并行激光直写装置及其直写方法
US9278374B2 (en) 2012-06-08 2016-03-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Modified surface having low adhesion properties to mitigate insect residue adhesion
JP6313585B2 (ja) * 2013-12-10 2018-04-18 キヤノン株式会社 露光装置及び物品の製造方法
DK201800236A1 (en) * 2018-05-25 2019-06-12 FLEXO WASH HOLDING ApS Cleaning Apparatus and Method for Laser Cleaning of a Printing Plate
EP3693796A1 (en) * 2019-02-08 2020-08-12 ASML Netherlands B.V. Lithographic apparatus and method of cleaning
CN110523715A (zh) * 2019-08-28 2019-12-03 中国人民解放军国防科技大学 一种铝合金反射镜表面超快激光清洗的方法及装置
CN112547698A (zh) * 2020-12-09 2021-03-26 云南电网有限责任公司临沧供电局 一种镜片在线激光清洗装置和方法
US11815821B2 (en) * 2021-03-19 2023-11-14 Taiwan Semiconductor Manufacturing Company, Ltd. Module vessel with scrubber gutters sized to prevent overflow
US11687012B2 (en) * 2021-06-25 2023-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Reduce mask defect impact by contamination decompose

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588885A (en) * 1984-02-07 1986-05-13 International Technical Associates Method of and apparatus for the removal of paint and the like from a substrate
DE3721940A1 (de) * 1987-07-02 1989-01-12 Ibm Deutschland Entfernen von partikeln von oberflaechen fester koerper durch laserbeschuss
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
US5099557A (en) * 1988-07-08 1992-03-31 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
US5821175A (en) * 1988-07-08 1998-10-13 Cauldron Limited Partnership Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface
US5643472A (en) * 1988-07-08 1997-07-01 Cauldron Limited Partnership Selective removal of material by irradiation
US5024968A (en) * 1988-07-08 1991-06-18 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
US6048588A (en) * 1988-07-08 2000-04-11 Cauldron Limited Partnership Method for enhancing chemisorption of material
TW284907B (en) * 1995-06-07 1996-09-01 Cauldron Lp Removal of material by polarized irradiation and back side application for radiation
US5720894A (en) * 1996-01-11 1998-02-24 The Regents Of The University Of California Ultrashort pulse high repetition rate laser system for biological tissue processing
JPH11224839A (ja) * 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
US6794602B2 (en) * 2001-10-18 2004-09-21 General Electric Company Method and apparatus for cleaning generator and turbine components
US6750423B2 (en) * 2001-10-25 2004-06-15 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method, laser irradiation apparatus, and method of manufacturing a semiconductor device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012222355A (ja) * 2011-04-07 2012-11-12 Asml Netherlands Bv リソグラフィ装置、デバイス製造方法およびマスクを補正する方法
US9417519B2 (en) 2011-04-07 2016-08-16 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and method of correcting a mask
USRE50571E1 (en) 2011-04-07 2025-09-02 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and method of correcting a mask
WO2014051121A1 (ja) * 2012-09-28 2014-04-03 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP2014090095A (ja) * 2012-10-30 2014-05-15 Dainippon Printing Co Ltd 反射型マスクの製造方法およびマスクブランクの製造方法
JP2017098302A (ja) * 2015-11-18 2017-06-01 浜松ホトニクス株式会社 電極のクリーニング方法および集積回路装置の製造方法
WO2025100680A1 (ko) * 2023-11-06 2025-05-15 주식회사 코윈디에스티 웨이퍼 클리너 장치

Also Published As

Publication number Publication date
US20090020137A1 (en) 2009-01-22

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