JP2011503870A5 - - Google Patents

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Publication number
JP2011503870A5
JP2011503870A5 JP2010533023A JP2010533023A JP2011503870A5 JP 2011503870 A5 JP2011503870 A5 JP 2011503870A5 JP 2010533023 A JP2010533023 A JP 2010533023A JP 2010533023 A JP2010533023 A JP 2010533023A JP 2011503870 A5 JP2011503870 A5 JP 2011503870A5
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JP
Japan
Prior art keywords
data
additional
radiation
projection apparatus
lithographic projection
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JP2010533023A
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English (en)
Japanese (ja)
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JP2011503870A (ja
JP5480151B2 (ja
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Priority claimed from PCT/NL2008/050708 external-priority patent/WO2009061196A1/en
Publication of JP2011503870A publication Critical patent/JP2011503870A/ja
Publication of JP2011503870A5 publication Critical patent/JP2011503870A5/ja
Application granted granted Critical
Publication of JP5480151B2 publication Critical patent/JP5480151B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010533023A 2007-11-08 2008-11-07 リソグラフィ投影装置および摂動因子を補償する方法 Expired - Fee Related JP5480151B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US99627707P 2007-11-08 2007-11-08
US60/996,277 2007-11-08
PCT/NL2008/050708 WO2009061196A1 (en) 2007-11-08 2008-11-07 Lithographic projection apparatus and method of compensating perturbation factors

Publications (3)

Publication Number Publication Date
JP2011503870A JP2011503870A (ja) 2011-01-27
JP2011503870A5 true JP2011503870A5 (enExample) 2011-12-22
JP5480151B2 JP5480151B2 (ja) 2014-04-23

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ID=40269627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010533023A Expired - Fee Related JP5480151B2 (ja) 2007-11-08 2008-11-07 リソグラフィ投影装置および摂動因子を補償する方法

Country Status (5)

Country Link
US (1) US8570489B2 (enExample)
JP (1) JP5480151B2 (enExample)
KR (1) KR101509553B1 (enExample)
CN (1) CN101849210B (enExample)
WO (1) WO2009061196A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201224678A (en) * 2010-11-04 2012-06-16 Orc Mfg Co Ltd Exposure device
DE102011006189A1 (de) * 2011-03-28 2012-06-06 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Belichten einer lichtempfindlichen Schicht
JP2014229802A (ja) * 2013-05-23 2014-12-08 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、リソグラフィシステム、及び物品の製造方法
US9977339B2 (en) * 2014-01-27 2018-05-22 Tokyo Electron Limited System and method for shifting critical dimensions of patterned films
US10459345B2 (en) * 2015-03-06 2019-10-29 Asml Netherlands B.V. Focus-dose co-optimization based on overlapping process window
WO2017011188A1 (en) 2015-07-13 2017-01-19 Applied Materials, Inc. Quarter wave light splitting

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035516A (ja) * 1983-08-08 1985-02-23 Hitachi Ltd 露光方法及び装置
JPS60107835A (ja) 1983-11-17 1985-06-13 Hitachi Ltd 投影露光装置
EP1255162A1 (en) * 2001-05-04 2002-11-06 ASML Netherlands B.V. Lithographic apparatus
EP1586946A3 (en) * 2004-04-14 2007-01-17 Carl Zeiss SMT AG Optical system of a microlithographic projection exposure apparatus
EP1619556A1 (en) * 2004-07-20 2006-01-25 Interuniversitair Micro-Elektronica Centrum Method and masks for reducing the impact of stray light during optical lithography
US20060044533A1 (en) * 2004-08-27 2006-03-02 Asmlholding N.V. System and method for reducing disturbances caused by movement in an immersion lithography system
US7199863B2 (en) * 2004-12-21 2007-04-03 Asml Netherlands B.V. Method of imaging using lithographic projection apparatus
US7209217B2 (en) * 2005-04-08 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing plural patterning devices
JP2007019098A (ja) * 2005-07-05 2007-01-25 Elpida Memory Inc 露光装置及び露光方法
JP4701030B2 (ja) * 2005-07-22 2011-06-15 キヤノン株式会社 露光装置、露光パラメータを設定する設定方法、露光方法、デバイス製造方法及びプログラム
JP2007281169A (ja) * 2006-04-06 2007-10-25 Nikon Corp 投影光学系、露光装置及び露光方法、並びにデバイス製造方法
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement

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