JP2007027419A5 - - Google Patents

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Publication number
JP2007027419A5
JP2007027419A5 JP2005207528A JP2005207528A JP2007027419A5 JP 2007027419 A5 JP2007027419 A5 JP 2007027419A5 JP 2005207528 A JP2005207528 A JP 2005207528A JP 2005207528 A JP2005207528 A JP 2005207528A JP 2007027419 A5 JP2007027419 A5 JP 2007027419A5
Authority
JP
Japan
Prior art keywords
pattern
exposure apparatus
laser beam
original
irradiating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005207528A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007027419A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005207528A priority Critical patent/JP2007027419A/ja
Priority claimed from JP2005207528A external-priority patent/JP2007027419A/ja
Priority to US11/457,168 priority patent/US7379151B2/en
Publication of JP2007027419A publication Critical patent/JP2007027419A/ja
Publication of JP2007027419A5 publication Critical patent/JP2007027419A5/ja
Withdrawn legal-status Critical Current

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JP2005207528A 2005-07-15 2005-07-15 露光装置 Withdrawn JP2007027419A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005207528A JP2007027419A (ja) 2005-07-15 2005-07-15 露光装置
US11/457,168 US7379151B2 (en) 2005-07-15 2006-07-13 Exposure apparatus comprising cleaning apparatus for cleaning mask with laser beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005207528A JP2007027419A (ja) 2005-07-15 2005-07-15 露光装置

Publications (2)

Publication Number Publication Date
JP2007027419A JP2007027419A (ja) 2007-02-01
JP2007027419A5 true JP2007027419A5 (enExample) 2008-08-28

Family

ID=37661359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005207528A Withdrawn JP2007027419A (ja) 2005-07-15 2005-07-15 露光装置

Country Status (2)

Country Link
US (1) US7379151B2 (enExample)
JP (1) JP2007027419A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005144487A (ja) * 2003-11-13 2005-06-09 Seiko Epson Corp レーザ加工装置及びレーザ加工方法
US20070256703A1 (en) * 2006-05-03 2007-11-08 Asahi Glass Company, Limited Method for removing contaminant from surface of glass substrate
ATE539041T1 (de) * 2007-08-16 2012-01-15 Asahi Glass Co Ltd Verfahren zur entfernung von oberflächenverunreinigungen auf einem glassubstrats
DE102009045008A1 (de) * 2008-10-15 2010-04-29 Carl Zeiss Smt Ag EUV-Lithographievorrichtung und Verfahren zum Bearbeiten einer Maske
JP2012004158A (ja) * 2010-06-14 2012-01-05 Nikon Corp 洗浄方法、洗浄装置、露光方法、露光装置およびデバイス製造方法。
US9607833B2 (en) * 2015-01-30 2017-03-28 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for photomask particle detection
US11600484B2 (en) * 2019-08-22 2023-03-07 Taiwan Semiconductor Manufacturing Company Ltd. Cleaning method, semiconductor manufacturing method and a system thereof
US11687012B2 (en) 2021-06-25 2023-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Reduce mask defect impact by contamination decompose
DE102021120747B4 (de) * 2021-08-10 2024-07-11 Carl Zeiss Sms Ltd. Verfahren zur Entfernung eines Partikels von einem Maskensystem

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3721940A1 (de) * 1987-07-02 1989-01-12 Ibm Deutschland Entfernen von partikeln von oberflaechen fester koerper durch laserbeschuss
JPS6412526U (enExample) 1987-07-13 1989-01-23
US5161059A (en) * 1987-09-21 1992-11-03 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
US5024968A (en) * 1988-07-08 1991-06-18 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
EP1429190B1 (en) * 2002-12-10 2012-05-09 Canon Kabushiki Kaisha Exposure apparatus and method
US20040248043A1 (en) * 2003-06-03 2004-12-09 Nikon Corporation Exposure method, exposure apparatus and device manufacturing method

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