JP2013516768A5 - - Google Patents

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JP2013516768A5
JP2013516768A5 JP2012547231A JP2012547231A JP2013516768A5 JP 2013516768 A5 JP2013516768 A5 JP 2013516768A5 JP 2012547231 A JP2012547231 A JP 2012547231A JP 2012547231 A JP2012547231 A JP 2012547231A JP 2013516768 A5 JP2013516768 A5 JP 2013516768A5
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Japan
Prior art keywords
main surface
polishing
polishing pad
polymer phase
polymer
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JP2012547231A
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JP6004941B2 (ja
JP2013516768A (ja
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Priority claimed from PCT/US2010/062204 external-priority patent/WO2011082155A2/en
Publication of JP2013516768A publication Critical patent/JP2013516768A/ja
Publication of JP2013516768A5 publication Critical patent/JP2013516768A5/ja
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Claims (6)

  1. 第一連続性ポリマー相と第二不連続性ポリマー相とを含む非平坦研磨パッドであって、前記研磨パッドは、第一主面と、前記第一主面とは反対側の第二主面と、前記第二主面に取り付けられた柔軟性層と、を有し、更に前記第一主面は、前記面の内部に延びる複数の溝を含む、非平坦研磨パッド。
  2. 第一主面と、前記第一主面とは反対側の第二主面と、を有するシート、及び、
    前記第一主面から前記第一主面に対して実質的に垂直な第一方向に沿って外向きに延びる複数の研磨要素、を含む研磨パッドであって、少なくとも一部の前記研磨要素は、前記シートと一体成形され、他の研磨要素の1つ以上に対する前記研磨要素の横の動きを制限するために横向きに接続されるが、前記研磨要素の研磨表面に対して実質的に垂直な軸においては可動性を維持し、前記複数の研磨要素の少なくとも一部は、第一連続性ポリマー相と第二不連続性ポリマー相とを含む、研磨パッド。
  3. 第一主面と、前記第一主面とは反対側の第二主面と、を有する支持層、及び、
    各研磨要素が、前記支持層に接着することにより、前記第一主面に取り付けられた複数の研磨要素、を含む研磨パッドであって、各研磨要素は、露出した研磨表面を有し、
    前記研磨要素は、前記支持層の前記第一主面から前記第一主面に対して実質的に垂直な第一方向に沿って延び、更に前記複数の研磨要素の少なくとも一部は第一連続性ポリマー相と第二不連続性ポリマー相とを含む、研磨パッド。
  4. 請求項1〜のいずれか一項に記載の研磨パッドの研磨表面に基材の表面を接触させる工程と、
    前記基材の前記表面を摩耗させるために前記研磨パッドを前記基材に対して相対的に移動させる工程と、を含む、研磨パッドの使用方法。
  5. 熱を適用しながら第一ポリマーを第二ポリマーと混合して流体成形組成物を形成する工程と、
    前記流体成形組成物を成形型に分注する工程と、
    前記流体成形組成物を冷却して、前記第一ポリマーを含む第一連続性ポリマー相と前記第二ポリマーを含む第二不連続性ポリマー相とを含む研磨パッドを形成する工程と、を含む請求項1又は2に記載の研磨パッドの製造方法であって、前記研磨パッドは、第一主表面と、第一主表面とは反対側の第二主表面と、を有する、方法。
  6. 第一ポリマーを含む第一連続性ポリマー相と、第二ポリマーを含む第二不連続性ポリマー相と、を含む複数の研磨要素を形成する工程と、
    第一主面とは反対側の第二主面を有する支持層の前記第一主面に前記研磨要素を接着して研磨パッドを形成する工程と、
    前記第一主面上に前記複数の研磨要素を有するパターンを形成する工程と、を含む、請求項に記載の研磨パッドの製造方法。
JP2012547231A 2009-12-30 2010-12-28 相分離したポリマーブレンドを含む研磨パッド並びにその製造及び使用方法 Active JP6004941B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US29117609P 2009-12-30 2009-12-30
US61/291,176 2009-12-30
PCT/US2010/062204 WO2011082155A2 (en) 2009-12-30 2010-12-28 Polishing pads including phase-separated polymer blend and method of making and using the same

Publications (3)

Publication Number Publication Date
JP2013516768A JP2013516768A (ja) 2013-05-13
JP2013516768A5 true JP2013516768A5 (ja) 2014-02-06
JP6004941B2 JP6004941B2 (ja) 2016-10-12

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JP2012547231A Active JP6004941B2 (ja) 2009-12-30 2010-12-28 相分離したポリマーブレンドを含む研磨パッド並びにその製造及び使用方法

Country Status (7)

Country Link
US (1) US9162340B2 (ja)
JP (1) JP6004941B2 (ja)
KR (1) KR20120125612A (ja)
CN (1) CN102686362A (ja)
SG (1) SG181678A1 (ja)
TW (1) TWI552832B (ja)
WO (1) WO2011082155A2 (ja)

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