WO2009043058A3 - Cmp pad conditioners with mosaic abrasive segments and associated methods - Google Patents

Cmp pad conditioners with mosaic abrasive segments and associated methods Download PDF

Info

Publication number
WO2009043058A3
WO2009043058A3 PCT/US2008/078208 US2008078208W WO2009043058A3 WO 2009043058 A3 WO2009043058 A3 WO 2009043058A3 US 2008078208 W US2008078208 W US 2008078208W WO 2009043058 A3 WO2009043058 A3 WO 2009043058A3
Authority
WO
Grant status
Application
Patent type
Prior art keywords
abrasive
cmp pad
mosaic
abrasive segments
associated methods
Prior art date
Application number
PCT/US2008/078208
Other languages
French (fr)
Other versions
WO2009043058A2 (en )
Inventor
Chien-Min Sung
Michael Sung
Original Assignee
Chien-Min Sung
Michael Sung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12Dressing tools; Holders therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/02Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools

Abstract

A CMP pad conditioner comprises a plurality of abrasive segments. Each abrasive segment includes a segment blank and an abrasive layer attached to the segment blank, the abrasive layer including a superhard abrasive material, A pad conditioner substrate is also provided. Each of the plurality of abrasive segments is permanently affixed to the pad conditioner substrate in an orientation that enables removal of material from a CMP pad by the abrasive layer as the pad conditioner and the CMP pad are moved relative to one another.
PCT/US2008/078208 2006-11-16 2008-09-29 Cmp pad conditioners with mosaic abrasive segments and associated methods WO2009043058A3 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
US97619807 true 2007-09-28 2007-09-28
US60/976,198 2007-09-28
US98768707 true 2007-11-13 2007-11-13
US60/987,687 2007-11-13
US98864307 true 2007-11-16 2007-11-16
US60/988,643 2007-11-16
US99296607 true 2007-12-06 2007-12-06
US60/992,966 2007-12-06
US12/168,110 2008-07-05
US12168110 US8398466B2 (en) 2006-11-16 2008-07-05 CMP pad conditioners with mosaic abrasive segments and associated methods

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200880118437 CN101878094A (en) 2007-09-28 2008-09-29 CMP pad conditioners with mosaic abrasive segments and associated methods

Publications (2)

Publication Number Publication Date
WO2009043058A2 true WO2009043058A2 (en) 2009-04-02
WO2009043058A3 true true WO2009043058A3 (en) 2009-10-15

Family

ID=40512135

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2008/078208 WO2009043058A3 (en) 2006-11-16 2008-09-29 Cmp pad conditioners with mosaic abrasive segments and associated methods

Country Status (3)

Country Link
KR (1) KR20100087297A (en)
CN (2) CN101878094A (en)
WO (1) WO2009043058A3 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9199357B2 (en) 1997-04-04 2015-12-01 Chien-Min Sung Brazed diamond tools and methods for making the same
US9463552B2 (en) 1997-04-04 2016-10-11 Chien-Min Sung Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9868100B2 (en) 1997-04-04 2018-01-16 Chien-Min Sung Brazed diamond tools and methods for making the same
US9409280B2 (en) 1997-04-04 2016-08-09 Chien-Min Sung Brazed diamond tools and methods for making the same
US9238207B2 (en) 1997-04-04 2016-01-19 Chien-Min Sung Brazed diamond tools and methods for making the same
US9221154B2 (en) 1997-04-04 2015-12-29 Chien-Min Sung Diamond tools and methods for making the same
US9724802B2 (en) 2005-05-16 2017-08-08 Chien-Min Sung CMP pad dressers having leveled tips and associated methods
US8393934B2 (en) 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US8678878B2 (en) 2009-09-29 2014-03-25 Chien-Min Sung System for evaluating and/or improving performance of a CMP pad dresser
US20110275288A1 (en) * 2010-05-10 2011-11-10 Chien-Min Sung Cmp pad dressers with hybridized conditioning and related methods
KR101237740B1 (en) * 2010-11-29 2013-02-26 이화다이아몬드공업 주식회사 Method for Manufacturing a High-functional Pad Conditioner for Chemical Mechanical Planarization and High-functional Pad Conditioner produced thereby
WO2012162430A3 (en) 2011-05-23 2013-03-28 Chien-Min Sung Cmp pad dresser having leveled tips and associated methods
US9138862B2 (en) 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
CN108177094A (en) 2012-08-02 2018-06-19 3M创新有限公司 Abrasive element precursor with precisely shaped features and method of making thereof
CN104858787B (en) * 2015-06-18 2017-04-12 浙江工商大学 An abrasive disc surface grinding mechanism from the growth of
CN107263342A (en) * 2017-06-07 2017-10-20 广州立启森科技有限公司 Brush wheel resin grinding disc for grinding printed circuit board and manufacturing method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003071718A (en) * 2001-08-30 2003-03-12 Nippon Steel Corp Cmp conditioner, method for arranging hard abrasive grain used in cmp conditioner and method for manufacturing cmp conditioner
US20030054746A1 (en) * 2001-08-13 2003-03-20 Josef Nussbaumer Grinding wheel
US6905571B2 (en) * 2002-10-28 2005-06-14 Elpida Memory, Inc. Wafer polishing method and wafer polishing apparatus in semiconductor fabrication equipment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030054746A1 (en) * 2001-08-13 2003-03-20 Josef Nussbaumer Grinding wheel
JP2003071718A (en) * 2001-08-30 2003-03-12 Nippon Steel Corp Cmp conditioner, method for arranging hard abrasive grain used in cmp conditioner and method for manufacturing cmp conditioner
US6905571B2 (en) * 2002-10-28 2005-06-14 Elpida Memory, Inc. Wafer polishing method and wafer polishing apparatus in semiconductor fabrication equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9199357B2 (en) 1997-04-04 2015-12-01 Chien-Min Sung Brazed diamond tools and methods for making the same
US9463552B2 (en) 1997-04-04 2016-10-11 Chien-Min Sung Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods

Also Published As

Publication number Publication date Type
KR20100087297A (en) 2010-08-04 application
WO2009043058A2 (en) 2009-04-02 application
CN104708539A (en) 2015-06-17 application
CN101878094A (en) 2010-11-03 application

Similar Documents

Publication Publication Date Title
WO2008102672A1 (en) Polishing slurry, method for manufacturing the polishing slurry, nitride crystalline material and method for polishing surface of the nitride crystalline material
WO2006130594A3 (en) Bandages with break lines
USD623976S1 (en) Watch dial
USD644346S1 (en) Stone inlay tile
USD700745S1 (en) Football helmet
GB2453023B (en) Ultra-hard composite constructions comprising high-density diamond surface
WO2008129905A1 (en) Roof panel and cab with the panel, and method of manufacturing cab
WO2008063599A3 (en) Superhard cutters and associated methods

Legal Events

Date Code Title Description
NENP Non-entry into the national phase in:

Ref country code: DE

ENP Entry into the national phase in:

Ref document number: 20107009287

Country of ref document: KR

Kind code of ref document: A

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08833583

Country of ref document: EP

Kind code of ref document: A2

122 Ep: pct application non-entry in european phase

Ref document number: 08833583

Country of ref document: EP

Kind code of ref document: A2